• 한국진공학회지
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• 제20권2호
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• pp.93-99
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• 2011

금속 전극 위에 유기물 채널을 증착하여 만드는 바닥 전극 구조의 유기물 박막 트랜지스터에서 전극 표면이 거친 정도에 따라 전하 주입이 어떻게 달라지는지 조사했다. 금 전극을 실리콘 기판에 증착하고, 가열하여 금 전극 표면을 거칠게 만들었다. 그리고 펜터신과 상부 전극으로 사용할 금 전극을 차례대로 증착하여 금 전극/펜터신/금 전극 구조를 만들었다. 펜터신 증착 초기에는 거친 금 전극 위에서 펜터신 증착핵이 더 많이 보였지만, 막이 두꺼워지면 가열되지 않은 전극과 가열로 거칠어진 전극에서 펜터신 표면 모양에 차이가 거의 없었다. 온도를 바꾸면서 측정한 전류-전압 곡선은 바닥 전극의 표면이 거칠수록 바닥계면의 전위장벽이 높음을 보여주었다. 이 현상은 금속 표면이 거칠수록 일함수가 낮아지며 펜터신과 거친 전극 표면의 경계에 전하 트랩이 더 많기 때문으로 생각된다.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 1997년도 추계학술대회 논문집
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• pp.364-368
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• 1997

We have investigated Pt and RuO$_2$as a bottom electrode for a device application of PZT thin film. The bottom electrodes were prepared by using an RF magnetron sputtering method. We studied some of the property influencing factors such as substrate temperature, gas flow rate, and RF power. An oxygen partial pressure from 0 to 50% was investigated. The results show that only Ru metal was grown without supp1ying any O$_2$gas. Both Ru and RuO$_2$phases were formed for O$_2$partial pressure between 10∼40%. A Pure RuO$_2$ phase was obtained with O$_2$partial pressure of 50%. A substrate temperature from room temperature to 400$^{\circ}C$ was investigated with XRD for the film crystallinity examination. The substrate temperature influenced the surface morphology and the resistivity of Pt and RuO$_2$as well as the film crystal structure. From the various considerations, we recommend the substrate temperature of 300$^{\circ}C$ for the bottom electrode growth. Because PZT film growth on top of bottom electrode requires a temperature process higher than 500$^{\circ}C$, bottom electrode properties were investigated as a function of post anneal temperature. As post anneal temperature was increased, the resistivity of Pt and RuO$_2$was decreased. However, almost no change was observed in resistivity for an anneal temperature higher than 700$^{\circ}C$. From the studies on resistivity and surface morphology, we recommend a post anneal temperature less than 600$^{\circ}C$.

• 대한전기학회논문지:전기물성ㆍ응용부문C
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• 제48권5호
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• pp.319-325
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• 1999

Direct current(d.c.)leakage current voltage characteristics of radio-frequencymagnetron sputtered BaTa\sub 2\O\sub 6\ film capacitors with aluminum(A1) top and indium tin oxide (ITO) bottom electrodes have been investigatedas a function of applied field and temperature. In order to study surfacetreatment effect on the electrical characteristics of as-deposited film weperformed exposure of oxygen plasma on $BaTa_2O_6$ surface. d. c.current-voltage (I-V), bipolar pulse charge-voltage (Q-V), d. c. current-time (I-t) andcapacitance-frequency (C-f) analysis were performed on films. All ofthe films exhibita low leakage current, a high breakdown field strength (3MV/cm-4.5MV/cm), and high dielectric constant (20-30). From the temperature dependence of leakage current,we can conclude that the dominant conduction mechanism is ascribed toSchottky emission at high electric field (>1MV/cm) and hopping conduction at lowelectric field (<1MV/cm). According to our results, the oxide plasma surfacetreatmenton as-deposited $BaTa_2O_6$ resulted in lowering interfacebarrier height and thus, leakage current when a negative voltage applied to the A1 electrode. This can be explained by reduction of surface contamination via etching surface and filling defects such as oxygen vacancies.

• 센서학회지
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• 제8권3호
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• pp.226-231
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• 1999

초전성효과를 나타내는 P(VDF/TrFE) 필름을 이용하여 초전형 적외선 센서를 제작하였다. 필름의 VDF와 TrFE의 질량비는 75/25 이며 두께 $25\;{\mu}m$의 분극처리된 것을 사용하였다. 상부전극과 바닥전극의 디자인을 새로이 하여 인체검지용 초전형 적외선 센서로서 더욱 더 간단한 제조공정과 접속방법을 적용하였다. 상부전극과 바닥전극은 알루미늄을 각각 진공 증착시켰으며 $5.5{\sim}14\;{\mu}m$의 적외선 영역대에 반응시키기 위해 필터가 부착된 TO-5에 하우징 하였다. 제작된 적외선 센서는 적외선원 $13{\times}10^{-6}\;W/cm^2$에 대하여 $9.62{\times}10^5\;V/W$의 높은 전압감도를 나타내었으며 NEP (noise equivalent power) 는 $3.95{\times}10^{-7}\;W$, 그리고 specific detectivity $D^*$는 $5.06{\times}10^5\;cm/W$를 나타내었다.

• 한국전기전자재료학회논문지
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• 제22권2호
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• pp.101-106
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• 2009

In this paper, Thin films of $HfO_2$/Hf were deposited on p-type wafer by Atomic Layer Deposition (ALD). We studied the electrical and material characteristics of $HfO_2$/Hf/Si MOS capacitor depending on thickness of Hf metal layer. $HfO_2$ films were deposited using TEMAH and $O_3$ at $350^{\circ}C$. Samples were then annealed using furnace heating to $500^{\circ}C$. Round-type MOS capacitors have been fabricated on Si substrates with $2000\;{\AA}$-thick Pt top electrodes. The composition rate of the dielectric material was analyzed using TEM (Transmission Electron Microscopy), XRD (X-ray Diffraction) and XPS (X-ray Photoelectron Spectroscopy). Also the capacitance-voltage (C-V), conductance-voltage (G-V), and current-voltage (I-V) characteristics were measured. We calculated the density of oxide trap charges and interface trap charges in our MOS device. At the interface between $HfO_2$ and Si, both Hf-Si and Hf-Si-O bonds were observed, instead of Si-O bond. The sandwiched Hf metal layer suppressed the growing of $SiO_x$ layer so that $HfSi_xO_y$ layer was achieved. And finally, the generation of both oxide trap charge and interface trap charge in $HfO_2$ film was reduced effectively by using Hf metal layer.

• 한국운동역학회지
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• 제13권1호
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• pp.95-108
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• 2003

The purposes of this study were to analyze the muscle activities and the characteristics of muscle recruiting patterns of upper trunk for Ssirum dutguri technique using three top-ranked elite Ssirum players. The EMG technique was used to record muscle activities of both right and left sides of latissimus dorsi, biceps brachii, and erector spinae. Six surface electrodes were placed on the surface of the selected muscles and one ground electrode was also attached on the back of neck(C7). One video camera was also used to record the Ssirum motion to define 4 events and 3 phases for further analysis. The raw EMG data were filtered with band pass filter (50-400 Hz) to remove artifacts and then low pass filtered (4 Hz) to find the linear envelope which resemble muscle tension curve. This filtered EMG data were normalized to MVIC for the purpose of comparion between the subjects. The results were indicated that each subject with different physical characteristics showed very different muscle activity patterns. Although Ssirum dutguri is considered as foot technique the player grasped opponent's satba(belt) with both hands when they play. Because of this reason, activities of upper trunk muscles were relatively high. However, direct comparison between upper and lower body muscles was not possible due to the lack of the data in present study. Interestingly, all threes subjects showed that erector spinae muscle activity was comparatively higher than those of latissimus dorsi and biceps brachii. This implies to reinforce back muscle as a routine of training to improve performance or to prevent back injury.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2000년도 제18회 학술발표회 논문개요집
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• pp.80-80
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• 2000

Surface acoustic wave (SAW) devices have become more important as mobile telecommunication systems need h호-frrequency, low-loss, and down-sized components. Higher-frequency SAW divices can be more sasily realized by developing new h호-SAW-velocity materials. The ZnO/diamond/Si multilasyer structure is one of the most promising material components for GHz-band SAW filters because of its SAW velocity above 10,000 m/sec. Silicon carbide is also a potential candidate material for high frequency, high power and radiation resistive electronic devices due to its superior mechanical, thermal and electronic properties. However, high price of commercialized 6- or 4H-SiC single crystalline wafer is an obstacle to apply SiC to high frequency SAW devices. In this study, single crystalline 3C-SiC thin films were grown on Si (100) by MOCVD using bis-trimethylsilymethane (BTMSM, C7H20Si7) organosilicon precursor. The 3C-SiC film properties were investigated using SEM, TEM, and high resolution XRD. The FWHM of 3C-SiC (200) peak was obtained 0.37 degree. To investigate the SAW propagation characteristics of the 3C-SiC films, SAW filters were fabricated using interdigital transducer electrodes on the top of ZnO/3C-SiC/Si(100), which were used to excite surface acoustic waves. SAW velocities were calculated from the frequency-response measurements of SAW filters. A generalized SAW mode. The hard 3C-SiC thin films stiffened Si substrate so that the velocities of fundamental and the 1st mode increased up to 5,100 m/s and 9,140 m/s, respectively.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2004년도 하계학술대회 논문집 Vol.5 No.2
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• pp.697-700
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• 2004

The SBT$(Sr_{0.8}Bi_{2.4}Ta_2O_9)$ thin films for semiconductor device were deposited on Pt-coated $Pt/TiO_2/SiO_2Si$ wafer by RF magnetron sputtering method at $400[^{\circ}C]$ and annealed at the temperature range from $600[^{\circ}C]$ to $850[^{\circ}C]$. The top electrodes(Pt) were deposited on SBT thin film by DC sputtering method. The crystallinity of SBT thin films were increased with increase of annealing temperature in the temperature range of $600[{\circ}C]\sim850[^{\circ}C]$. The annealing temperature properties were to be most excellent in the case of annealed SBT thin film at $750^{\circ}C]$. And, the maximum remanent polarization$(2P_r)$ and the coercive electric field$(E_c)$ at annealing temperature of $750[^{\circ}C]$ obtained about $11.60[{\mu}C/cm^2]$ and 48[kV/cm], respectively. Specially, it was seen that fatigue properties does not change in $10^{10}$ switching cycle.

• 한국정보통신학회논문지
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• 제11권2호
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• pp.344-348
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• 2007

본 논문에서 높은 투과율을 가질 수 있는 PVA (Patterned Vertical Aligned) 액정 셀의 전극 구조를 제안하였다. 제안한 전극 구조의 결과를 확인하기 위해서 광학적 특성과 그리고 디렉터 모양의 계산은 'TechWiz LCD'라는 상용 시뮬레이터를 사용하였다. 보통 PVA 액정 셀의 투과율은 전극의 모양과 셀갭에 의해 크게 영향을 받는다. 본 논문에서 제안한 전극 구조의 게이트 라인과 데이터 라인 사이의 거리는 기존의 PVA 셀과 같다. 대신 전극의 끝단 (edge) 지역에서의 광손실을 줄이기 위하여 상층부 전극과 하층부 전극의 모양을 수정하였다. 결과를 비교하기 위하여 기존의 PVA 액정 셀과 제안한 PVA 액정 셀의 투과율을 비교하였다. 그 결과, 제안된 구조에 의해서 전극부근에서 발생하는 광학적 손실이 감소되는 것을 확인 할 수 있었다.

• 마이크로전자및패키징학회지
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• 제29권1호
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• pp.43-47
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• 2022

본 연구에서는 보일러 등에 적용을 하기 위하여 물속에 담군 채 가열할 수 있는 친환경 박막형 히터에 대한 결과를 보고한다. 장수명을 확보하기 위하여 소재 안정성이 높은 Mo 박막(40 nm)을 마그네트론 스퍼터법을 이용하여 Glass 기판상에 증착하였으며 후속 공정 진행 시 Mo 박막의 부식을 방지하기 위하여 상부에 ZnO 박막 (60 nm)을 형성하였다. 이후 투명 접착성을 가지는 PVB (Polyvinyl Butyral)를 이용하여 ZnO 박막 상부에 또 다른 Glass기판을 올려두고 열풍건조기 내에서 150℃의 온도에서 2시간동안 PVB를 경화시키며 접착시켜 Glass/Mo/ZnO/Glass 구조의 수중 히터를 완성하였다. 이렇게 제작한 발열체를 수중에 담근 후 발열 시 물의 온도가 2분 내 50℃까지 상승되는 것을 확인하였으며 미미한 수준의 저항증가가 발생하며 구조적 안정성 또한 확보되었다. 인가 전압의 세기에 따라 발열체의 온도가 제어되기 때문에 보일러에 적용할 때 사용자가 설정하는 온도를 용이하게 제어할 수 있을 것이라 기대된다. 마지막으로, 본 연구에서 제작한 박막형 히터는 반투명의 특성을 가져 심미성을 부여할 수 있어 제품의 부가가치를 더욱 높일 수 있을 것으로 기대된다.