• Journal of the Korean Institute of Telematics and Electronics A
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• v.33A no.2
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• pp.131-139
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• 1996

Inthis apper wa analyzed the channel-hot-electron programming characteristics of the single-poly EEPROM with different control gate and drain structures. The single-poly EEPROM uses the p$^{+}$/n$^{+}$-diffusion in the n-well as a control gate instead of the second poly-silicon. The program and erase characteristics of the single-poly EEPROM were verified using the two-dimensional device simulator, MEDICI. The single-poly EEPROM was fabricated using 0.8$\mu$m ASIC CMOS process, and its CHE programming characteristics were measured using HP4155 parameteric analyzer and HP8110 pulse gnerator. Especially we investigated the CHE programming characteristics of the single-poly EEPROM with the p$^{+}$-diffusion or n$^{+}$-diffusion in the n-well as a control gate and the LDD or single-drain structure. The single-poly EEPROM with p$^{+}$-diffusion in the n-well as a control gate and single-drain structure was programmed to about VT$\thickapprox$5V with VDS=6V, VCG=12V(1ms pulse width).th).

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2008.06a
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• pp.249-250
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• 2008

In this paper, we propose the single polycrystalline silicon flash EEPROM IC with a new structure which does not need the high voltage switching circuit. The design of high voltage switching circuits which are needed for the data program and erase, has been an obstacle to develop the single-poly EEPROM. Therefore, we has proposed the new cell structure which uses the low voltage switching circuits and has designed the full chip. A new single-poly EEPROM cell is designed and the full chip including the control block, the analog block, row decoder block, and the datapath block is designed. And the each block is verified by using the computer simulation. In addition, the full chip layout is performed.

• Proceedings of the IEEK Conference
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• 1998.06a
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• pp.425-428
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• 1998

In this work, single-poly EEPROM has been designed and fabricated by using standard 0.8.mu.m CMOS process. The initial threshold voltage was aobut 0.8V but it increased ot about 6.5V after programming at Vds=11.5V and Vcg=6.5V. After erasing devices at Vs=14.2V, the threshold voltage decreased to about 1.5V. The programming time and erasing trime wree about 6ms. and 100ms. respectively. The erasing time can be reduced by applying a series of shorter erase pulse s instead of a long single erase pulse.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.19 no.7
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• pp.601-604
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• 2006

In this paper, we propose the single poly-Si Flash EEPROM device with a new structure which does not need the high voltage switching circuits. The device was designed, fabricated and characterized. From the measurement results, it was found that the program, the erase and the read operations worked properly. The threshold voltage was 3.1 V after the program in which the control gate and the drain were biased with 12 V and 7 V for $100{\mu}S$, respectively. And it was 0.4 V after the erase in which the control gate was grounded and the drain were biased with 11 V for $200{\mu}S$. On the other hand, it was found that the program and the erase speeds were significantly dependent on the capacitive coupling ratio between the control gate and the floating gate. The larger the capacitive coupling ratio, the higher the speeds, but the target the area per cell. The optimum structure of the cell should be chosen with the consideration of the trade-offs.

• Journal of Electrical Engineering and information Science
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• v.3 no.3
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• pp.391-395
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• 1998

The impact of LDD structure on the single-poly EEPROMs is investigated in this paper. The single-poly EEPROMs are fabricated using the 0.8$\mu\textrm{m}$ CMOS ASIC process. The single-poly EEPROMs with LDD structure have slower program and erase speeds, but the drain and gate stresses and the endurance characteristics of these devices are much better than those of the single-poly EEPROMs with single-drain structure. The single-poly EEPROMs with LDD structure do not require the process modifications and need no additional masks, hence can be used for microprocessors and logic circuits with low-density and low-cost embedded EEPROMs.

• Journal of the Korean Institute of Telematics and Electronics D
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• v.36D no.6
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• pp.21-27
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• 1999

In this work, single-poly EEPROM was designed and fabricated by using standard $0.8{\mu}m$ CMOS process. From the results of programming and erasing characteristics, it was found that the programming time was smaller than 10ms and the erasing time was about 100ms. To reduce the erasing time, several erasing methods were performed. The S/D erasing method was used to improve the endurance characteristics which was degraded due to electron trapping in programming and erasing cycles. By using the S/D erasing method, the more improved endurance characteristics then conventional one was obtained.

• The Transactions of the Korean Institute of Electrical Engineers D
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• v.53 no.6
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• pp.425-432
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• 2004

In this paper, we introduce the analog memory fabricated in a 0.35${\mu}{\textrm}{m}$ single poly standard CMOS process. We measured the programming characteristics of the analog memory cell such as linearity, reliability etc. Finally, we found that the characteristics of the programming of the cell depend on the magnitude and the width of the programming pulse, and that the accuracy of the programming within 10mV is feasible under the optimal condition. In order to standardize the characteristics of the cell, we have investigated numbers of cells. Thus we have used a program named Labview and a data acquisition board to accumulate the data related to the programming characteristics automatically.

• The Journal of Korea Institute of Information, Electronics, and Communication Technology
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• v.13 no.1
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• pp.48-57
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• 2020

MCU used in applications such as wireless chargers and USB type-C require MTP memory with a small cell size and a small additional process mask. Conventional double poly EEPROM cells are small in size, but additional processing masks of about 3 to 5 sheets are required, and FN tunneling type single poly EEPROM cells have a large cell size. In this paper, a 110nm MTP cell using a vertical PIP capacitor is proposed. The erase operation of the proposed MTP cell uses FN tunneling between FG and EG, and the program operation uses CHEI injection method, which reduces the MTP cell size to 1.09㎛2 by sharing the PW of the MTP cell array. Meanwhile, MTP memory IP required for applications such as USB type-C needs to operate over a wide voltage range of 2.5V to 5.5V. However, the pumping current of the VPP charge pump is the lowest when the VCC voltage is the minimum 2.5V, while the ripple voltage is large when the VCC voltage is 5.5V. Therefore, in this paper, the VPP ripple voltage is reduced to within 0.19V through SPICE simulation because the pumping current is suppressed to 474.6㎂ even when VCC is increased by controlling the number of charge pumps turned on by using the VCC detector circuit.

• The Journal of the Korea institute of electronic communication sciences
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• v.7 no.5
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• pp.1061-1066
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• 2012

A digital memory has been widely used as a device for storing information due to its reliable, fast and relatively simple control circuit. However, the storage of the digital memory will be limited by the inablility to make smaller linewidths. One way to dramatically increase the storeage capability of the memory is to change the type of stored data from digital to analog. The analog memory fabricated in a standard single poly 0.6um CMOS process has been developed. Single cell and adjacent circuit block for programming have been designed and characterized. Applications include low-density non-volatile memory, control of redundancy in SRAM and DRAM memories, ID or security code registers, and image and sound memory.

• Journal of IKEEE
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• v.28 no.1
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• pp.78-89
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• 2024

PMIC chips based on a BCD process used in automotive semiconductors require multi-time programmable (MTP) intellectual property (IP) that does not require additional masks to trim analog circuits. In this paper, MTP cell size was reduced by about 18.4% by using MTP cells using PMOS capacitors (PCAPs) instead of NMOS capacitors (NCAPs) in MTP cells, which are single poly EEPROM cells with two transistors and one MOS capacitor for small-area MTP IP design. In addition, from the perspective of MTP IP circuit design, the two-stage voltage shifter circuit is applied to the CG drive circuit and TG drive circuit of MTP IP design, and in order to reduce the area of the DC-DC converter circuit, the VPP (=7.75V), VNN (=-7.75V) and VNNL (=-2.5V) charge pump circuits using the charge pumping method are placed separately for each charge pump.