• Bulletin of the Korean Chemical Society
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• 제35권12호
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• pp.3482-3488
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• 2014

Matrix-induced mass bias and its effect on the accuracy of isotope ratio measurements have been examined for a quadrupole-based inductively coupled plasma-mass spectrometer (Q ICP-MS). Matrix-induced mass bias effect was directly proportional to % mass difference, and its magnitude varied for element and nebulizer flow rate. For a given element and conditions in a day, the effect was consistent. The isotope ratio of Cd106/Cd114 under $200{\mu}g\;g^{-1}$ U matrix deviated from the natural value significantly by 3.5%. When Cd 111 and Cd114 were used for the quantification of Cd with isotope dilution (ID) method, the average of differences between the calculated and measured concentrations was -0.034% for samples without matrix ($0.076{\mu}g\;g^{-1}$ to $0.21{\mu}g\;g^{-1}$ for the period of 6 months). However, the error was as large as 1.5% for samples with $200{\mu}g\;g^{-1}$ U. The error in ID caused by matrix could be larger when larger mass difference isotopes are used.

• 한국정보시스템학회지:정보시스템연구
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• 제27권2호
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• pp.221-245
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• 2018

Purpose This study aims to investigate the factors that influence switching intention of Smart Appliances. We focuses on Push-Pull-Mooring theory and status quo bias as factors related to switching behavior. Design/methodology/approach This study developed an model to explain the switching intention of Smart Appliances and conducted structural equation modeling with AMOS22.0. To test the proposed hypotheses, we collected 319 survey responses from smart appliances's users. Findings The results indicated that low usefulness and low ease of use had an effect on the switching intention of smart appliances. The results also indicated that attractiveness of the alternative and social norms had an effect on the switching intention of smart appliances. Lastly, The difference between the relation of push effect and switching intention and the relation of pull effect and switching intention was found to be due to the level of status quo bias. The academic and managerial implications were discussed based on the results of empirical analysis.

• 한국의류학회지
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• 제28권6호
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• pp.776-783
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• 2004

The purpose of this study was to identify the reasonable gathering conditions as consider of effect of gathering and variation of silhouette made by gathering conditions. The experimental design consists of four factorial design: (1) three kinds of different weight and different thickness fabrics (2) three kinds of different stitch densities (3) five kinds of different ratio of gathers (4) three kinds of different angles. Therefore one hundred thirty five (135) samples were made. Data analysis utilize SPSS WIN 10.0 Package. The results of this study were as follows: 1. In the aspect of fabrics, it is shown the visual propriety that it is as thin as the small stitch, and as thick as the big stitch. 2. As stitch densities, it shows the different stabilized nodes. 3. In the aspect of ratio of gathers, it is shown the visual propriety that a few was small stitches, which help formations of nodes, and a lot were big stitches, which help increased the effect of gather. 4. In the aspect of angle of bias, the drape appearance was excellent as a sample of cutting by 0 angle(0$^{\circ}$) of bias. The big stitches that help formations of stabilized nodes, and a case of cutting by 45 angle(45$^{\circ}$) of bias was small stitch.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 1998년도 추계학술대회 논문집
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• pp.141-144
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• 1998

The electrical characteristics of poly-Si TFT's with offset structure by negative bias stress are systematically investigated as a function of offset length. The changes of electrical characteristics, V$\_$th/, off-current, on/off ratio, in the offset structured poly-Si TFT's are smaller than that of the conventional structured poly-Si TFT's under the stress condition (V$\_$ds/=20V, V$\_$gs/=-20V). It is found that the hot carrier effect by negative bias stress is suppressed by the offset structured poly-Si TFT's because the local electric field near the drain region is decreased by offset region.

• 한국재료학회지
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• 제13권7호
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• pp.415-419
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• 2003

Carbon nanotubes were formed on silicon substrate using microwave plasma-enhanced chemical vapor deposition method. The possibility of carbon nanotubes formation was related to the thickness of nickel catalyst. The growth behavior of carbon nanotubes under the identical thickness of nickel catalyst was strongly dependent on the magnitude of the applied bias voltage. High negative bias voltage (-400 V) gave the vertically well-aligned carbon nanotubes. The vertically well-aligned carbon nanotubes have the multi-walled structure with nickel catalyst at the end position of the nanotubes.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2008년도 추계학술대회 논문집 Vol.21
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• pp.302-303
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• 2008

Nominally undoped (intrinsic) ZnO thin films were deposited by magnetron sputtering system with utilization of substrate bias on silicon at $450^{\circ}C$. Oxygen gas was selected as sputtering gas. The deposited thins were evaluated with X-ray diffraction (XRD) for their microstructure analysis and Hall effect in Van der Pauw configuration for their electrical property. The XRD shows that the magnitude and polarity of substrate bias significantly influence the microstructure and electrical properties.

• Journal of Magnetics
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• 제10권4호
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• pp.133-136
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• 2005

The NiMn/NiFe bilayer structure which was short time annealed in order to induce unidirectional anisotropy were studied as a function of annealing temperature. The maximum exchange bias field of NiMn/NiFe bilayer was presented at $250^{\circ}C$ after short time annealing process with no external field. The appearance of exchange bias was due to phase transformation of NiMn layer. In plane angular dependence of a resonance field distribution which measured by FMR was analysed as a combined effect of unidirectional anisotropy and uniaxial anisotropy. The resonance field and the line width from FMR measurement were also analysed with annealing temperature.

• The Journal of Asian Finance, Economics and Business
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• 제9권10호
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• pp.97-104
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• 2022

The purpose of the existing work is to inspect the impact of knowledge management on organizational performance. Business experts now appreciate how important knowledge management is for organizational performance. Earlier studies have investigated the research model with causal linkages, however, only a few of them have considered sample-selecting bias problems when analyzing the model of knowledge management on organizational performance. The number of 312 executives related to knowledge management from 312 enterprises that have been approved with quality management systems offered suitable responses for analyses. The data was employed to investigate the effect of knowledge management on organizational performance, considering sample-selecting bias. The empirical outcomes indicate that sample-selecting bias exists in the causal impact of knowledge management on organizational performance. The empirical findings are helpful to scholars of knowledge management as well as business executives by giving an insight into the casual effect of knowledge management on organizational performance with the intervention of sample-selecting bias. The acceptance of knowledge management should be tailored to improve competitive advantages that will lead to better organizational performance.

• 한국진공학회지
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• 제7권2호
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• pp.94-103
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• 1998

HFCVD(Hot Filament Chemical Vapor Deposition)방법을 이용한 다이아몬드의 핵 생성과 성장에 있어서, 인가한 직류 bias를 변수로 하여 핵생성 밀도와 증착율의 변화를 조 사하였다. 반응압력 20torr, 메탄농도 1.0%, Filament 온도 $2100^{\circ}C$ 그리고 Substrate 온도 $980^{\circ}C$에서 증착 단계를 핵생성기와 성장기로 구분하고 각 단계마다 bias의 방향과 크기를 다르게 인가하면서 다이아몬드 박막을 증착시켰다. Negative bias는 핵생성기에는 핵생성을 촉진시키지만 성장기에도 계속 인가하면 결정입자의 지속적인 성장을 방해하고 결정 구조를 비다이아몬드 성분으로 변화시키는 작용을 하여 박막의 morphology에 좋지 않은 영향을 주 었다. Positive bias는 핵생성기와 성장기에서 모두 $CH_4$의 분해를 촉진시킨 결과 증착율의 향상을 가져왔다. 따라서 다이아몬드 박막의 증착시 핵생성기에서는 negative bias를 인가하 고 성장기에는 positive bias를 인가하는 것이 핵생성 밀도와 증착율의 향상에 효과적인 것 으로 조사되었다.

• 한국표면공학회:학술대회논문집
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• 한국표면공학회 1999년도 추계학술발표회 초록집
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• pp.73-75
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• 1999