• Title/Summary/Keyword: Window layer

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Tapered Etching of Field Oxide with Various Angle using TEOS (다양한 기울기를 갖는 TEOS 필드 산화막의 경사식각)

  • 김상기;박일용;구진근;김종대
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.15 no.10
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    • pp.844-850
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    • 2002
  • Linearly graded profiles on the field area oxide are frequently used in power integrated circuits to reduce the surface electric field when power devices are operated in forward or reverse blocking modes. It is shown here that tapered windows can be made using the difference of etch rates between the bottom and the top layer of TEOS film. Annealed TEOS films are etched at a lower rate than the TEOS film without annealing Process. The fast etching layer results in window walls having slopes in the range of 25$^{\circ}$∼ 80$^{\circ}$ with respect to the wafer surface. Taper etching technique by annealing the TEOS film applies to high voltage LDMOS, which is compatible with CMOS process, due to the minimum changes in both of design rules and thermal budget.

Wind Deflector Design of Spoiler Sunroof by Boundary Theory (경계층 이론에 의한 스포일러 선루프의 윈드 디플렉터 설계)

  • Cho, Hyun-Deog
    • Journal of the Korean Society of Manufacturing Process Engineers
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    • v.5 no.3
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    • pp.17-22
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    • 2006
  • Sunroof is getting widely used in automobiles since it maintains, compare to window, better air circulation as well as less noise while driving in high speed. In this study, we consider an electronic control type spoiler sunroof which slides backward after tilting a rear part of a glass. Installing a wind deflector on the sunroof reduces noise much more effectively. The height of the wind deflector is designed using a boundary theory related to incompressible air layer. The developed wind deflector is investigated experimentally by measuring a wind noise. When the height of the wind deflector is designed by a fixed type, the sunroof maintains a very quiet interior noise over a certain driving speed, nevertheless it produces relatively loud noise in low driving speed.

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A study on the strengthening of Sodalime glass using ion exchange method (이온강화법을 이용한 소다라임 글라스 강화에 관한 연구)

  • Ahn, H.W.;Oh, J.H.;Kweon, S.G.;Choi, S.D.
    • Journal of the Korean Society of Manufacturing Process Engineers
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    • v.13 no.6
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    • pp.145-151
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    • 2014
  • The glass used for mobile display windows is required to have high strength. Chemical strengthening by means of ion exchange is widely used glass. The depth of the layer and the compressed stress are affected by tempering temperature and time. The purpose of this study is to investigate the range of DOL and CS, which to less breakage during reliability tests such as the ball drop test, hole drop test, 3-point bending test, drop test, and tumble test with Soda-lime Glass.

A study on the Protection/Restoration of High speed Ethernet in Optics Layer (Ethernet 기반 가입자망의 보호 및 절체에 대한 연구)

  • 신상배;조성대;박영일
    • The Journal of Korean Institute of Communications and Information Sciences
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    • v.27 no.10C
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    • pp.933-936
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    • 2002
  • One of the problems of a Gigabit-Ethernet system for installation in telecom networks is its relative low reliability compared with SONET, the major telecom network system, which restores from fault within 50 msec. In this study, an optics layer protection for the Gigabit-Ethernet system is proposed. It monitors optical signal quality by comparing the signal level with a calibrated window, and switchs fibers within a time comparable to SONET.

ALD법과 PAALD법을 이용한 Cu 확산방지막용 TaN 박막의 특성 비교 및 분석

  • 나경일;박세종;부성은;정우철;이정희
    • Proceedings of the Korean Society Of Semiconductor Equipment Technology
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    • 2003.05a
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    • pp.106-111
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    • 2003
  • Tantalum nitride(TaN) films were deposited by atomic layer deposition(ALD) and plasma assisted atomic layer deposition(PAALD). The deposition of the TaN thin film has been performed using pentakis (ethylmethlyamino) tantalum (PEMAT) and ammonia($NH_3$) as precursors at temperature of $250^{\circ}C$, where the temperature was proven to be ALD window for TaN deposition from our previous experiments. The PAALD deposited TaN film shows better physical properties than thermal ALD deposited TaN film, due to its higher density$(~11.59 g/\textrm{cm}^3$) and lower carbon(~ 3 atomic %) and oxygen(~ 4 atomic %) concentration of impurities.

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Charge trapping characteristics of the zinc oxide (ZnO) layer for metal-oxide semiconductor capacitor structure with room temperature

  • Pyo, Ju-Yeong;Jo, Won-Ju
    • Proceedings of the Korean Vacuum Society Conference
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    • 2016.02a
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    • pp.310-310
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    • 2016
  • 최근 NAND flash memory는 높은 집적성과 데이터의 비휘발성, 낮은 소비전력, 간단한 입, 출력 등의 장점들로 인해 핸드폰, MP3, USB 등의 휴대용 저장 장치 및 노트북 시장에서 많이 이용되어 왔다. 특히, 최근에는 smart watch, wearable device등과 같은 차세대 디스플레이 소자에 대한 관심이 증가함에 따라 유연하고 투명한 메모리 소자에 대한 연구가 다양하게 진행되고 있다. 대표적인 플래시 메모리 소자의 구조로 charge trapping type flash memory (CTF)가 있다. CTF 메모리 소자는 trap layer의 trap site를 이용하여 메모리 동작을 하는 소자이다. 하지만 작은 window의 크기, trap site의 열화로 인해 메모리 특성이 나빠지는 문제점 등이 있다. 따라서 최근, trap layer에 다양한 물질을 적용하여 CTF 소자의 문제점을 해결하고자 하는 연구들이 진행되고 있다. 특히, 산화물 반도체인 zinc oxide (ZnO)를 trap layer로 하는 CTF 메모리 소자가 최근 몇몇 보고 되었다. 산화물 반도체인 ZnO는 n-type 반도체이며, shallow와 deep trap site를 동시에 가지고 있는 독특한 물질이다. 이 특성으로 인해 메모리 소자의 programming 시에는 deep trap site에 charging이 일어나고, erasing 시에는 shallow trap site에 캐리어들이 쉽게 공급되면서 deep trap site에 갇혀있던 charge가 쉽게 de-trapped 된다는 장점을 가지고 있다. 따라서, 본 실험에서는 산화물 반도체인 ZnO를 trap layer로 하는 CTF 소자의 메모리 특성을 확인하기 위해 간단한 구조인 metal-oxide capacitor (MOSCAP)구조로 제작하여 메모리 특성을 평가하였다. 먼저, RCA cleaning 처리된 n-Si bulk 기판 위에 tunnel layer인 SiO2 5 nm를 rf sputter로 증착한 후 furnace 장비를 이용하여 forming gas annealing을 $450^{\circ}C$에서 실시하였다. 그 후 ZnO를 20 nm, SiO2를 30 nm rf sputter로 증착한 후, 상부전극을 E-beam evaporator 장비를 사용하여 Al 150 nm를 증착하였다. 제작된 소자의 신뢰성 및 내구성 평가를 위해 상온에서 retention과 endurance 측정을 진행하였다. 상온에서의 endurance 측정결과 1000 cycles에서 약 19.08%의 charge loss를 보였으며, Retention 측정결과, 10년 후 약 33.57%의 charge loss를 보여 좋은 메모리 특성을 가지는 것을 확인하였다. 본 실험 결과를 바탕으로, 차세대 메모리 시장에서 trap layer 물질로 산화물 반도체를 사용하는 CTF의 연구 및 계발, 활용가치가 높을 것으로 기대된다.

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Study of ZnS/CIGS Hetero-interface for Cd-free CIGS Solar Cells (Cd-free 태양전지를 위한 ZnS/CIGS 이종접합 특성 향상 연구)

  • Shin, Donghyeop;Kim, Jihye;Go, Youngmin;Yun, Jaeho;Ahn, Byungtae
    • 한국신재생에너지학회:학술대회논문집
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    • 2011.05a
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    • pp.106.1-106.1
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    • 2011
  • The Cu(In,Ga)Se2 (CIGS) thin film solar cells have been achieved until almost 20% efficiency by NREL. These solar cells include chemically deposited CdS as buffer layer between CIGS absorber layer and ZnO window layer. Although CIGS solar cells with CdS buffer layer show excellent performance, the short wavelength response of CIGS solar cell is limited by narrow CdS band gap of about 2.42 eV. Taking into consideration the environmental aspect, the toxic Cd element should be replaced by a different material. Among Cd-free candidate materials, the CIGS thin film solar cells with ZnS buffer layer seem to be promising with 17.2%(module by showa shell K.K.), 18.6%(small area by NREL). However, ZnS/CIGS solar cells still show lower performance than CdS/CIGS solar cells. There are several reported reasons to reduce the efficiency of ZnS/CIGS solar cells. Nakada reported ZnS thin film had many defects such as stacking faults, pin-holes, so that crytallinity of ZnS thin film is poor, compared to CdS thin film. Additionally, it was known that the hetero-interface between ZnS and CIGS layer made unfavorable band alignment. The unfavorable band alignment hinders electron transport at the heteo-interface. In this study, we focused on growing defect-free ZnS thin film and for favorable band alignment of ZnS/CIGS, bandgap of ZnS and CIGS, valece band structure of ZnS/CIGS were modified. Finally, we verified the photovoltaic properties of ZnS/CIGS solar cells.

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Analysis and Design of High-Brightness LEDs (고휘도 LED의 구조 해석 및 설계)

  • 이성재;송석원
    • Journal of the Korean Institute of Telematics and Electronics D
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    • v.35D no.6
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    • pp.79-91
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    • 1998
  • Design principles for high-brightness ligh-temitting diodes have been derived by using escape cone concepts. Based on the design principles, some important high-brightness LED structures developed thus far have been reviewed and, in addition, their external coupling efficiencies have also been estimated. In AlGaAs or InGaAIP LEDs, in which photon absorption in the ohmic electrodes is known to be serious, photon shielding by the electrodes is minimized by using window layer (WL) as well as transparent substrate (TS) leading to significantly improved light-emitting efficiency. However, in InGaN LEDs emitting blue to green lights, the photon absorption in ohmic contact to wide bandgap GaN may be negligible and therefore, photon shielding by the electrodes would not lead to as significant problems as in conventional In AIGaAs or InGaAIP LEDs.

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Adaptive Congestion Control Scheme of TCP for Supporting ACM in Satellite PEP System (위성 PEP시스템에서 ACM 지원을 위한 적응형 TCP 혼잡제어기법)

  • Park, ManKyu;Kang, Dongbae;Oh, DeockGil
    • Journal of Satellite, Information and Communications
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    • v.8 no.1
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    • pp.1-7
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    • 2013
  • Currently satellite communication systems usually use the ACM(Adaptive Coding and Modulation) to extend the link availability and to increase the bandwidth efficiency. However, when ACM system is used for satellite communications, we should carefully consider TCP congestion control to avoid network congestions. Because MODCODs in ACM are changed to make a packet more robust according to satellite wireless link conditions, bandwidth of satellite forward link is also changed. Whereas TCP has a severe problem to control the congestion window for the changed bandwidth, then packet overflow can be experienced at MAC or PHY interface buffers. This is a reason that TCP in transport layer does not recognize a change of bandwidth capability form MAC or PHY layer. To overcome this problem, we propose the adaptive congestion control scheme of TCP for supporting ACM in Satellite PEP (Performance Enhancing Proxy) systems. Simulation results by using ns-2 show that our proposed scheme can be efficiently adapted to the changed bandwidth and TCP congestion window size, and can be useful to improve TCP performance.

Preparation of ZrO2 and SBT Thin Films for MFIS Structure and Electrical Properties (ZrO2 완충층과 SBT박막을 이용한 MFIS 구조의 제조 및 전기적 특성)

  • Kim, Min-Cheol;Jung, Woo-Suk;Son, Young-Guk
    • Journal of the Korean Ceramic Society
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    • v.39 no.4
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    • pp.377-385
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    • 2002
  • The possibility of $ZrO_2$ thin film as insulator for Metal-Ferroelectric-Insulator-Semiconductor(MFIS) structure was investgated. $SrBi_2Ta_2O_9$ and $SrBi_2Ta_2O_9$(SBT) thin films were deposited on P-type Si(111) wafer by R. F. magnetron sputtering method. The electrical properties of MFIS gate were relatively improved by inserting the $ZrO_2$ buffer layer. The window memory increased from 0.5 to 2.2V in the applied gate voltage range of 3-9V when the thickness of SBT film increased from 160 to 220nm with 20nm thick $ZrO_2$. The maximum value of window memory is 2.2V in Pt/SBT(160nm)/$ZrO_2$(20nm)/Si structure with the optimum thickness of $ZrO_2$. These memory windows are sufficient for practical application of NDRO-FRAM operating at low voltage.