• Title/Summary/Keyword: Ti-Cr-Si-N

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Microstructure of Ti-Cr-Si-N Coatings Deposited by a Hybrid System of Arc ion Plating and Sputtering Techniques (하이브리드 코팅시스템에 의해 제조된 Ti-Cr-Si-N 박막의 미세구조 및 기계적 특성연구)

  • Kang Dong Shik;Jeon Jin Woo;Song Pung Keun;Kim Kwang Ho
    • Journal of the Korean institute of surface engineering
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    • v.38 no.3
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    • pp.95-99
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    • 2005
  • Quaternary Ti-Cr-Si-N coatings were synthesized onto steel substrates (SKD 11) using a hybrid method of arc ion plating (AIP) and sputtering techniques. For the Syntheses of Ti-Cr-Si-N coatings, the Ti-Cr-N coating process was performed substantially by a multi-cathodic AIP technique rising Cr and Ti targets, and Si was added by sputtering Si target during Ti-Cr-N deposition. In this work, comparative studies on microstructure and evaluation of mechanical properties between Ti-Cr-N and Ti-Cr-Si-N coatings were conducted. As the Si was incorporated into Ti-Cr-N coatings, the Ti-Cr-Si-N coatings showed largely increased hardness value of approximately 42 GPa than one of 28 GPa for Ti-Cr-N coatings. The average friction coefficient of Ti-Cr-N coatings largely decreased from 0.7 to 0.35 with increasing Si content up to 20 at. $\%$. In addition, wear behavior of Ti-Cr-N coatings against steel ball was much improved with Si addition due to the surface smoothening effect and tribe-chemical reaction.

High Temperature Oxidation of TiN, Ti(C,N), TiAlSiN, TiZrAlN, TiAlCrSiN Thin Films (TiN, Ti(C,N), TiAlSiN, TiZrAlN, TiAlCrSiN 박막의 고온산화)

  • Kim, Min-Jeong;Park, Sun-Yong;Lee, Dong-Bok
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2014.11a
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    • pp.192-192
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    • 2014
  • TiN, Ti(C,N), TiAlSiN, TiZrAlN, TiAlCrSiN 박막을 제조한 후, 이 들의 고온산화 특성을 SEM, EPMA, TGA, TEM, AES 등을 이용하여 조사하고, 산화기구를 제안하였다. 산화속도, 생성되는 산화물의 종류와 분포는 박막의 조성, 산화온도, 산화시간에 따라 변하였다.

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High temperature oxidation of TiAlCrSiN thin films (TiAlCrSiN 박막의 고온산화)

  • Hwang, Yeon-Sang;Kim, Min-Jeong;Kim, Seul-Gi;Bong, Seong-Jun;Won, Seong-Bin;Lee, Dong-Bok
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2012.05a
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    • pp.161-161
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    • 2012
  • 결정질 TiCrN과 AlSiN 나노층이 교대로 구성하는 나노 다층 TiAlCrSiN 박막은 음극 아크 플라즈마 증착법에 의해 증착되었다. 나노 다층 TiAlCrSiN 박막의 산화특성들은 $600{\sim}1000^{\circ}C$사이에서 대기 중 최대 70시간동안 연구 되었다. 형성된 산화물들은 주로 $Cr_2O_3$, ${\alpha}-Al_2O_3$, $SiO_2$ 그리고 rutile-$TiO_2$들로 구성되었다. 나노 다층 TiAlCrSiN 박막이 산화하는 동안, 가장 바깥쪽의 $TiO_2$층은 Ti 이온의 외부확산에 의해, 외부 $Al_2O_3$층은 Al이온의 외부확산에 의해 형성되었다. 동시에, 내부($Al_2O_3$, $Cr_2O_3$) 혼합층과 가장 안쪽의 $TiO_2$층은 산소이온의 내부확산에 의해 형성되었다.

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Effects of Alloying Elements on the Pitting Behavior of Ti-Al Intermetallic Compounds (TiAl 금속간화헙물의 공식거동에 미치는 합금원소의 영향)

  • 이호종;최한철
    • Journal of the Korean institute of surface engineering
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    • v.31 no.3
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    • pp.157-164
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    • 1998
  • Effects of alloying elements on the pitting behavior of Ti-Al intermetalic compounds in the electrolytic soution containing Cl- were investigated through electrochemical tets and corrosion morphologies. Corrosion potential increased in the case of Cr addition to Ti-48%Al, whereas it decreased in the case of Si and B addition. The simultaneous addition of Cr and Si increased passive current density and decrosion corrosion potential. The passive current density of N addtion was higher than that of B addition in H2SO4 solution. With the addition of alloying elements, The pitting resistance decreased in order of TiAl>TiAlSi>TiAlN>TiAlB>TiAlCr and whin siumultaneous addition, it decreased in order of TiAlCrSi>TiAlCrBN>TiAlCrrN. The surface merohology after pitting test showed that the TiAl coataining Si had for fewer pits than that containing Cr and N simultaneously.

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High-temperature Oxidation of the TiAlCrSiN Film (TiAlCrSiN 박막의 고온 산화 부식)

  • Lee, Dong-Bok;Kim, Min-Jeong;Abro, M.A.;Yadav, P.;Shi, Y.
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2016.11a
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    • pp.107-107
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    • 2016
  • TiCrAlSiN films were developed in order to improve the high-temperature oxidation resistance, corrosion resistance, and mechanical properties of conventional TiN films that are widely used as hard films to protect and increase the lifetime and performance of cutting tools or die molds. In this study, a nano-multilayered TiAlCrSiN film was deposited by cathodic arc plasma deposition. It displayed relatively good oxidation resistance at $700-900^{\circ}C$, owing to the formation protective oxides of $Al_2O_3$, $Cr_2O_3$, and $SiO_2$, and semiprotective $TiO_2$. At $1000^{\circ}C$, the increased temperature led to the formation of the imperfect oxide scale that consisted primarily of the outer ($TiO_2$,$Al_2O_3$)-mixed scale and inner ($TiO_2$, $Al_2O_3$, $Cr_2O_3$)-mixed scale.

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Characteristics of TiAlCrSiN coating to improve mold life for high temperature liquid molding (고온 액상 성형용 금형 수명 향상을 위한 TiAlCrSiN 코팅의 특성)

  • Yeo, Ki-Ho;Park, Eun-Soo;Lee, Han-Chan
    • Journal of the Korean institute of surface engineering
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    • v.54 no.5
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    • pp.285-293
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    • 2021
  • High-entropy TiAlCrSiN nano-composite coating was designed to improve mold life for high temperature liquid molding. Alloy design, powder fabrication and single alloying target fabrication for the high-entropy nano-composite coating were carried out. Using the single alloying target, an arc ion plating method was applied to prepare a TiAlCrSiN nano-composite coating had a 30 nm TiAlCrSiN layers are deposited layer by layer, and form about 4 ㎛-thickness of multi-layered coating. TiAlCrSiN nano-composite coating had a high hardness of about 39.9 GPa and a low coefficient of friction of less than about 0.47 in a dry environment. In addition, there was no change in the structure of the coating after the dissolution loss test in the molten metal at a temperature of about 1100 degrees.

Interfacial Structure of Inconel/$Si_3N_4$ Joint Using Ag-Cu-Ti Brazing Metal (Ag-Cu-Ti Brazing 금속을 이용한 Inconel/$Si_3N_4$ 접합의 계면구조)

  • 정창주;장복기;문종하;강경인
    • Journal of the Korean Ceramic Society
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    • v.33 no.12
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    • pp.1421-1425
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    • 1996
  • Sintered Si3N4 and Inconel composed of Ni(58-63%) Cr(21-25%) Al(1-17%) Mn(<1%) fe(balance) were pressurelessly joined by using Ag-Cu-Ti brazing filler metal at 950℃ and 1200℃ under N2 gas atmosphere of 1atm and their interfacial structures were investigated. In case that the reaction temperature was low as 950℃ its interfacial structure was "Inconel metal/Ti-rich phase layer/brazing filler metal layer/Si3N4 " Ti used as reactive metal existed in between inconel steel and brazing metal and moved to the interface of between brazing filler metal nd Si3N4 according as reaction temperature increased up to 1200℃. The interfacial structure of inconel steel-Si3N4 reacted at 1200℃ was ' inconel metal/Ni-rich phase layer containing of Fe. Cr and Si/Cu-rich phase layer containing of Mn and Si/Si3N4 " Cr Mn, Ni and Fe diffused to the interface of between brazing filler metal and Si3N4 and reacted with Si3N4 The most reactive components of ingredients of inconel metal were Cr and Mn. On the other hand Ti added as reactive components to Ag-Cu eutectic segregated into Ni-rich phase layer,.

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The Study on the properties of CrTiAlN Thin Films with Si Contents Variation by Cathodic Arc Ion Plating (아크이온플레이팅법에 의한 CrTiAlSiN 박막의 Si 함량 변화에 따른 특성 연구)

  • Jo, Yong-Gi;Yu, Gwang-Chun;Jeong, Dong-Geun
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2012.11a
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    • pp.110-110
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    • 2012
  • 아크이온플레이팅법과 스퍼터링법을 이용하여 금형의 보호코팅으로서 CrTiAlSiN 박막을 합성하였다. 연구는 CrTiAlN 피막에 Si이 첨가됨에 따른 농도변화가 피막의 경도 및 내열성에 미치는 영향을 조사하였다. Si 함유량 변화에 따른 특성의 변화에 대해 XRD, TGA, 경도분석, 윤활성의 분석을 통해 조사하였으며, 함성된 피막은 기존 CrN 박막 대비 내열성이 우수하게 향상되었으며 경도의 향상과 낮은 윤활성을 보였다.

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TiAl-N 코팅의 내식성에 미치는 4원계 원소 영향에 관한 연구

  • Jeong, Deok-Hyeong;Lee, Seon-Yeong;Sin, Seung-Yong;Mun, Gyeong-Il
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.02a
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    • pp.396-396
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    • 2012
  • 산업 분야에서 TiN, CrN, CrAl-N, TiAl-N과 같은 Hard 코팅들은 기계적 특성이 우수하여 절삭 공구, 기계 부품분야에서 많이 사용되고 있다. 최근 연구 동향을 살펴보면 기존에 하나 또는 두가지 합금상태의 Hard 코팅을 넘어서 제3원소, 제4원소를 첨가하여 미세 구조적 변화를 통해 기존의 우수한 특성에 고온안정성, 내식성, 내산화성 등 다양한 기능성을 부여하는 다기능성 연구가 활발히 진행 중이다. 본 연구에서는 마그네트론 스퍼터를 이용하여 고경도 코팅인 Ti-Al계열에 Si, Cu, Cr, B을 첨가함에 따른 내식특성을 확인해보았다. 성분이 균일한 코팅을 만들기 위해 Ti-Al, Ti-Al-Si, Ti-Al-Cu, Ti-Al-Cr, Ti-Al-B 단일합금타겟을 제조하여 실험을 진행하였다. 기본 물성을 확인하기 위해 경도 측정과 SEM XRD 등을 분석하였다. 내식성 평가는 동전위 테스트와 염수분무 테스트를 진행하였고 전해질은 염수와 동일한 5%-NaCl로 진행하였다. 그 결과 Ti-Al-Cr이 내식성에 강한 것으로 나타났고 염수분무 실험에서도 1200시간 이상 지속되는 성과를 보였다.

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Microstructural Characterization of TiCrAlSiN Thin Films Deposited with Various Bias Voltages (Bias voltgae에 따른 TiCrAlSiN 코팅막의 미세구조 분석)

  • Lee, Jae-Uk;Lee, Jeong-Yong;Vinh, P.V.;Kim, Seon-Gyu
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2007.04a
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    • pp.122-123
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    • 2007
  • Bias voltage를 달리하여 cathodic arc plasma 방법으로 Si 기판 위에 성장시킨 TiCrAlSiN 코팅막의 미세구조를 투과전자현미경으로 관찰하였다. -200 V에서 0 V로 bias voltage가 변화함에 따라 'nano-multilayered' 구조가 무너지면서 '주상형(columnar)'구조로 코팅막의 미세구조가 변함을 알 수 있었고, EDS line scan을 통해 multilayer의 화학적 조성 변화를 확인하였다.

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