Proceedings of the Korean Institute of Surface Engineering Conference (한국표면공학회:학술대회논문집)
- 2016.11a
- /
- Pages.107-107
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- 2016
High-temperature Oxidation of the TiAlCrSiN Film
TiAlCrSiN 박막의 고온 산화 부식
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Lee, Dong-Bok
;
-
Kim, Min-Jeong
;
- Abro, M.A. ;
- Yadav, P. ;
- Shi, Y.
- Published : 2016.11.17
Abstract
TiCrAlSiN films were developed in order to improve the high-temperature oxidation resistance, corrosion resistance, and mechanical properties of conventional TiN films that are widely used as hard films to protect and increase the lifetime and performance of cutting tools or die molds. In this study, a nano-multilayered TiAlCrSiN film was deposited by cathodic arc plasma deposition. It displayed relatively good oxidation resistance at
Keywords