• Title/Summary/Keyword: RF voltage

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The RF performance degradation in Bulk DTMOS due to Hot Carrier effect (Hot Carrier 현상에 의한 Bulk DTMOS의 RF성능 저하)

  • Park Jang-Woo;Lee Byoung-Jin;Yu Jong-Gun;Park Jong-Tae
    • Journal of the Institute of Electronics Engineers of Korea SD
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    • v.42 no.2 s.332
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    • pp.9-14
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    • 2005
  • This paper reports the hot carrier induced RF performance degradation of bulk dynamic threshold voltage MOSFET (B-DTMOS) compared with bulk MOSFET (B-MOS). In the normal and moderate mode operations, the degradations of cut-off frequency $(f_{T})$ and minimum noise figure $(F_{min})$ of B-DTMOS are less significant than those of B-MOS devices. Our experimental results show that the RF performance degradation is more significant than the U performance degradation after hot carrier stressing. Also, the degradation characteristics of RF power Performance of B-DTMOS due to hot carrier effects are measured for the first time.

A Study on RF Large-Signal Model for High Resistivity SOI MOS Varactor (High Resistivity SOI MOS 버랙터를 위한 RF 대신호 모델 연구)

  • Hong, Seoyoung;Lee, Seonghearn
    • Journal of the Institute of Electronics and Information Engineers
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    • v.53 no.9
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    • pp.49-53
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    • 2016
  • A new large-signal model including the voltage-dependent extrinsic gate capacitance for RF channel distribution effect is developed for a high resistivity(HR) silicon-on-insulator(SOI) RF accumulation-mode MOS varactor. The data of voltage-dependent parameters are extracted by using accurate S-parameter optimization, and empirical model equations are constructed by data fitting process. The RF accuracy of this new model is validated by observing excellent agreements between modeled and measured Y11-parameter data in the wide voltage range up to 20 GHz.

Electrical and Optical Characteristics of Inductively Coupled Plasma by Ar Gas Pressure and Rf Power (Ar 가스 압력과 RF 전력에 따른 유도결합형 플라즈마의 전기적 및 광학적 특성)

  • 최용성;허인성;이영환;박대희
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.17 no.5
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    • pp.560-566
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    • 2004
  • In this paper, the electrical and emission properties of electrodeless fluorescent lamp were discussed using the inductively coupled plasma (ICP) with the variation of argon gas pressure and RF power. The RF output was applied to the antenna in the range of 5∼50 W at 13.56 MHz. The internal plasma voltage of the chamber and the probe current were measured while varying the supply voltage to the Langmuir probe in the range of -100V∼+100V. When the pressure of argon gas was increased, electric current was decreased. There was a significant electric current increase from 10 to 30 W. Also, when the RF power was increased, electron density was increased. Also, the emission spectrum, Ar- I lins, luminance were investigated. At this time, the input parameter for ICP RF plasma, Ar gas pressure and RF power were applied in the range of 10∼60 mTorr, 10∼300 W, respectively. This implies that this method can be used to find an optimal RF power for efficient light illumination in an electrodeless fluorescent lamp.

RF protection technique of antenna tuning switch in all-off condition (전차단 상태에서 동작하는 안테나 튜닝스위치의 RF 보호기술)

  • Jhon, Heesauk;Lee, Sanghun
    • Journal of the Korea Institute of Information and Communication Engineering
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    • v.26 no.10
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    • pp.1567-1570
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    • 2022
  • This paper, we presents a RF protection technique of antenna switch by improving the power handling capability in worst case environment mode for mobile phone applications without critical payment of circuit performances such as insertion loss, isolation and ACBV (AC breakdown voltage). By applying a additional capacitive path located in front of the antenna in cell-phone, it performs the effective reduction of input power in high voltage standing wave ratio (VSWR) condition. Under the all-path off condition which causes a high VSWR, it achieved 37.7dBm power handling level as high as 5.7dB compared to that of conventional one at 2GHz. In addition, insertion loss and isolation performances were 0.31dB and 42.72dB at 2 GHz, respectively which were almost similar to that of the conventional circuit. The proposed antenna switch was fabricated in 130nm CMOS SOI technology.

A 1.8GHz Low Voltage CMOS RF Down-Conversion Mixer (1.8GHz 대역의 저전압용 CMOS RF하향변환 믹서 설계)

  • 김희진;이순섭;김수원
    • Proceedings of the IEEK Conference
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    • 2000.06e
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    • pp.61-64
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    • 2000
  • This paper describes a RF Down-Conversion Mixer for mobile communication systems. This circuit achieves low voltage operation and low power consumption by reducing stacked devices of conventional gilbert cell mixer. In order to reduce stacked devices, we use source-follower structure. The proposed RF Down-Conversion mixer operates up to 1.85GHz at 1.5V power supply with 0.25um CMOS technology and consumes 2.2mA.

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Integrated Photonic RF Phase Shifter Using an Electrooptic Polymer Modulator (전기광학폴리머 변조기틀 이용한 집적광학적 RF 위상변환기)

  • 이상신
    • Korean Journal of Optics and Photonics
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    • v.15 no.3
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    • pp.274-277
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    • 2004
  • An integrated photonic radio frequency (RF) phase shifter has been proposed and fabricated using a nested dual Mach-Zehnder modulator configuration in a new electro-optic polymer. The fabricated device shows a continuous voltage control of the RF signal phase. A near-linear phase shift exceeding 108$^{\circ}$was obtained for a 16-GHz microwave signal by tuning the do control voltage over a 7.8- $V_{pp}$ range.e.

Reliability Evaluation of RF Power Amplifier for Wireless Transmitter

  • Choi, Jin-Ho
    • Journal of information and communication convergence engineering
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    • v.6 no.2
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    • pp.154-157
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    • 2008
  • A class-E RF(Radio Frequency) power amplifier for wireless application is designed using standard CMOS technology. To drive the class-E power amplifier, a class-F RF power amplifier is used and the reliability characteristics are studied with a class-E load network. The reliability characteristic is improved when a finite-DC feed inductor is used instead of an RF choke with the load. After one year of operating, when the load is an RF choke the output current and voltage of the power amplifier decrease about 17% compared to initial values. But when the load is a finite DC-feed inductor the output current and voltage decrease 9.7%. The S-parameter such as input reflection coefficient(S11) and the forward transmission scattering parameter(S21) is simulated with the stress time. In a finite DC-feed inductor the characteristics of S-parameter are changed slightly compared to an RF-choke inductor. From the simulation results, the class-E power amplifier with a finite DC-feed inductor shows superior reliability characteristics compared to power amplifier using an RF choke.

Implementation of a Low Actuation Voltage SPDT MEMS RF Switch Applied PZT Cantilever Actuator and Micro Seesaw Structure (PZT 캔틸레버 구동기와 마이크로 시소구조를 적용한 저전압 SPDT MEMS RF 스위치 구현)

  • Lee, Dae-Sung;Kim, Won-Hyo;Jung, Seok-Won;Cho, Nam-Kyu;Sung, Woo-Kyeong;Park, Hyo-Derk
    • Proceedings of the IEEK Conference
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    • 2005.11a
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    • pp.147-150
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    • 2005
  • Low actuation voltage and no contact stiction are the important factors to apply MEMS RF switches to mobile devices. Conventional electrostatic MEMS RF switches require several tens of voltages for actuation. In this paper we propose PAS MEMS RF switch which adopt PZT actuators and seesaw cantilevers to meet the above requirements. The fundamental structures of PAS MEMS switch were designed, optimized, and fabricated. Through the developed processes PAS SPDT MEMS RF switches were successfully fabricated on 4" wafers and they showed good electrical properties. The driving voltage was less than 5 volts. And the insertion loss was -0.5dB and the isolation was 35dB at 5GHz. The switching speed was about 5kHz. So these MEMS RF switches can be applicable to mobile communication devices or wireless multi-media devices at lower than 6GHz.

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An Injection-Locked Based Voltage Boost-up Rectifier for Wireless RF Power Harvesting Applications

  • Lee, Ji-Hoon;Jung, Won-Jae;Park, Jun-Seok
    • Journal of Electrical Engineering and Technology
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    • v.13 no.6
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    • pp.2441-2446
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    • 2018
  • This paper presents a radio frequency-to-direct current (RF-to-DC) converter for special RF power harvesting application at 915 MHz. The major featured components of the proposed RF-to-DC converter is the combination of a cross-coupled rectifier and an active diode: first, the cross-coupled rectifier boosts the input voltage to desired level, and an active diode blocks the reverse current, respectively. A prototype was implemented using $0.18{\mu}m$ CMOS technology, and the performance was proven from the fact that the targeted RF harvesting system's full-operation with higher power efficiency; even if the system's input power gets lower (e.g., from nominal 0 to min. -12 dBm), the proposed RF-to-DC converter constantly provides 1.47 V, which is exactly the voltage level to drive follow up system components like DC-to-DC converter and so on. And, maximum power conversion efficiency is 82 % calculated from the 0 dBm input power, 2.3 mA load current.

Electrical Variable Capacitor based on Symmetrical Switch Structure for RF Plasma System (대칭적인 스위치 구조 기반 RF 플라즈마 시스템 적용 전기적 가변 커패시터)

  • Min, Juhwa;Chae, Beomseok;Kim, Hyunbae;Suh, Yongsug
    • The Transactions of the Korean Institute of Power Electronics
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    • v.24 no.3
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    • pp.161-168
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    • 2019
  • This study introduces a new topology to decrease the voltage stress experienced by a 13.56 MHz electrical variable capacitor (EVC) circuit with an asymmetrical switch structure applied to the impedance matching circuit of a radio frequency (RF) plasma system. The method adopts a symmetrical switch structure instead of an asymmetrical one in each of the capacitor's leg in the EVC circuit. The proposed topology successfully reduces voltage stress in the EVC circuit due to the symmetrical charging and discharging mode. This topology can also be applied to the impedance matching circuit of a high-power and high-frequency RF etching system. The target features of the proposed circuit topology are investigated via simulation and experiment. Voltage stress on the switch of the EVC circuit is successfully reduced by more than 40%.