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Electrical and Optical Characteristics of Inductively Coupled Plasma by Ar Gas Pressure and Rf Power

Ar 가스 압력과 RF 전력에 따른 유도결합형 플라즈마의 전기적 및 광학적 특성

  • 최용성 (원광대학교 전기전자 및 정보공학부) ;
  • 허인성 (원광대학교 전자재료공학) ;
  • 이영환 (원광대학교 전자재료공학) ;
  • 박대희 (원광대학교 전기전자 및 정보공학부)
  • Published : 2004.05.01

Abstract

In this paper, the electrical and emission properties of electrodeless fluorescent lamp were discussed using the inductively coupled plasma (ICP) with the variation of argon gas pressure and RF power. The RF output was applied to the antenna in the range of 5∼50 W at 13.56 MHz. The internal plasma voltage of the chamber and the probe current were measured while varying the supply voltage to the Langmuir probe in the range of -100V∼+100V. When the pressure of argon gas was increased, electric current was decreased. There was a significant electric current increase from 10 to 30 W. Also, when the RF power was increased, electron density was increased. Also, the emission spectrum, Ar- I lins, luminance were investigated. At this time, the input parameter for ICP RF plasma, Ar gas pressure and RF power were applied in the range of 10∼60 mTorr, 10∼300 W, respectively. This implies that this method can be used to find an optimal RF power for efficient light illumination in an electrodeless fluorescent lamp.

Keywords

References

  1. プラズマ 工學 林泉
  2. プラズマ 基礎工學 堤井信力
  3. 석사학위 논문 플라즈마 온도 측정에 관한 연구 박철웅
  4. 박사학위 논문 음극 재질에 따른 직류 플라즈마 시스템의 글로우 방전 특성 및 진단에 관한 연구 엄무수
  5. 대한전기학회지 v.49C no.11 무전극 황방전등에서 고압 이원자 황의 자체역전 효과 추장희;구성근;박기준;이영우
  6. New Physics v.39 no.3 Argon 유도결합 플라즈마의 광학적, 전기적 특성에 대한 연구 김영철;이정우;조영석
  7. プラズマ 工學 林泉
  8. Conference Record of the 1994 IEEE v.3 Measurements of inductively coupled RF fluorescent lamp lumen properties F.Whitney
  9. J. Vac. Sci. Tech. v.B9 High-dendity plasma mode of an inductively coupled radio frequency discharge J.Amorim;H.S.Maciel;J.P.Sudano
  10. Rev. Sci. Instrum. v.70 no.3 The Langnmuir probe as diagnostic of the electron component within low temperature laser ablated plasma plums I.Weaver;G.W.Martin;W.G.Graham;T.Morrow;C.L.S.Lewis https://doi.org/10.1063/1.1149672
  11. 전기전자재료학회논문지 v.9 플라즈마 파라메타 측정용 고속 Langmuir 프로브 구동회로 실현 및 적용 신중흥;고태언;김두환;박정후
  12. 전기전자재료학회논문지 v.11 유도결합형 플라즈마 원을 이용한 고선택비 산화막 식각에 관한 연구 이수부;박헌건;이석현