• Proceedings of the KIEE Conference
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• 1989.07a
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• pp.426-428
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• 1989

As a first phase of plasma study intended for semiconductor processing research, we have studied the discharge phenomena. In particular, we have obtained a specific formula for the breakdown voltage as a function of the neutral state pressure of reactive gases. Our experimental results with H2,O2,Ar,CF4 seem ro verify this formula. In addition we find the voltage levels for various gases in the descending order of CF4>O2=Ar>H2 in high pressure region, while H2>CF4>O2>Ar in low pressure region. When H2 and CF4 were mixed, we observe the overall voltage dominated by the gas with lower breakdown volotage.

• Proceedings of the IEEK Conference
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• 2008.06a
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• pp.503-504
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• 2008

ZnO thin films were deposited on glass and plastic substrates at different $Ar/O_2$ gas flow ratio in RF magnetron sputtering system. To investigate structural and optical properties of ZnO thin films, X-ray Diffactometer and UV-Vis Spectrometer were performed, respectively. The obtained films showed a preferred orientation the c-axis perpendicular to the substrate and transmittance above 80 % in visible range.

• Journal of IKEEE
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• v.22 no.2
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• pp.356-361
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• 2018

We investigated a hydrogen gas sensor which is available in a high temperature atmosphere. The hydrogen sensors were fabricated into a metal-oxide-semiconductor (MOS) structure made of $Pd/Ta_2O_5/SiC$, and the thin tantalum oxide ($Ta_2O_5$) layer was fabricated by rapid thermal oxidation (RTO). In the experiment, we made three types of sensors with different palladium (Pd) patterns to evaluate the effect of Pd electrode on response characteristics. As the result, the response characteristics in capacitance were improved further when the filled area of the Pd electrode became larger.

• Journal of the Korean Chemical Society
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• v.15 no.6
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• pp.330-347
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• 1971

Catalytic effects of metallic salts on the combustion of diesel fuel oil have been studied. In the case of organometallic salt, the active species are the metallic oxides resulted from combustion of the salts. The oxides act only on the residual solid carbon produced from the fuel oil combustion. The catalytic activity can be explained with the semiconductor theory just as in the case of the gas phase reaction. The chemical rate constant of the combustion of carbon, the soot from diesel fuel oil, is found to be $k_c=1.1{\times}10^4\;exp$ (-16,600/T) below $800^{\circ}K$. By addition of metallic oxides, the rate constant increases remarkably. This work has substantiated the belief that the effect of the metallic salts on the fuel oil combustion can conveniently be studied by checking directly the effect of the corresponding metallic oxide on the soot carbon.

• Journal of the Korean Institute of Telematics and Electronics D
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• v.35D no.7
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• pp.79-87
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• 1998

Nitrided oxides which have been investigated as alternative gate oxide for metal-oxide-semiconductor field effect devices were grown by two-step process using N$_{2}$O gas, and were chaacterized via a fowler-nordheim tunneling(FNT) electron injection technique. Electrical characteristics of nitrided gate oxides were superior to that of control oxides.Further, the FNT electron injection into the nitrided gate oxides reveals that gate oxides degrade more both if electrons were foreced to inject from the gate metal and if thicker nitrided gate oxides were used in the thickness range of 90~130.angs.. Models are suggested to explain these phenomena.

• Proceedings of the KSME Conference
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• 2008.11a
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• pp.585-589
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• 2008

This study is performed to analyze the fluid flow about 150mm shower heads of semiconductor device. Under the air pressure, the ideal gas of moving fluid is injected as 5m/s velocity into inlet of shower heads and the flow distribution in shower heads is measured according to pitch of plasma distribution device. As results, the maximum and minimum value of fluid velocity are investigated with their position. The velocity values at outlet are also studied. From two experiment using the plasma distribution device, the results of CFD are compared with the experimental results. That results shows stable flow of fluid in that case of corrected design from CFD.

• 한국정보디스플레이학회:학술대회논문집
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• 2002.08a
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• pp.876-879
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• 2002

A novel driving technology of PDP, which enables to decrease the sustain voltage of conventional technology by half without lowering the gas discharging voltage. This technology, realizable without much increased cost of the semiconductor devices, gives a significant improvement in the power efficiency, essential for the design of a drive circuit for PDP. A comparative analysis and experimental results are presented to show the validity of the proposed driving technology.

• Proceedings of the KIEE Conference
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• 2002.07c
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• pp.1460-1462
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• 2002

The test methods on materials of electrical power cable are used in accordance with 25 specifications of IEC, ASTM, ICEA, KS and KEPCO Spec. The validation of test methods were checked and stablished by solving the problems occurred during the test. These tests are flammability, degree of acidity of gases, amount of halogen acid gas, smoke density, oxygen index, amount of ion in semiconductor, void, amber, contaminant and water tree, crosslinked density. Then the performance of power cable made by A, B, C and D company were evaluated and compared.

• Proceedings of the Korean Society for Noise and Vibration Engineering Conference
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• 2006.05a
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• pp.1313-1316
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• 2006

Demands of high volume dry vacuum pumps on the domestic semiconductor and LCD industries are rapidly increasing as the size of wafers and LCD is increasing. This study introduces a new experimental setup for testing the reliability of vacuum pumps. The test system was designed to measure the acoustic pressure and mechanical vibration levels simultaneously. It is shown that the test system enables the analysis and evaluation of the performance of dry pumps under the different gas-load conditions. Detailed experimental result are shown to enable us to examine the characteristics and performance of dry pumps.

• Proceedings of the Korean Vacuum Society Conference
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• 2012.02a
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• pp.499-499
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• 2012

This study was evaluated on etcher of capacitive coupled plasmas with OES (Optical Emission Spectroscopy) and impedance by VI probe that are widely used for process control and monitoring at semiconductor industry. The experiment was operated at conventional Ar and C4F8 plasma with variable change such as pressure and addition of gas (Atmospheric Leak: N2 and O2), RF, pressure, that are highly possible to impact wafer yield during wafer process, in order to observe OES and VI Probe signals. The sensitivity change on OES and Impedance by Vi probe was analyzed by statistical method to determine healthy of process. The main goal of this study is to understand unwanted tool performance to eventually improve productive capability. It is important for process engineers to actively adjust tool parameter before any serious problem occurs.