• 제목/요약/키워드: process margin

검색결과 385건 처리시간 0.02초

홀 확장된 판재의 에지마진 변화에 따른 피로특성 연구 (A Study on fatigue Properties with Different Edge Margin for Hole Expansion Plate)

  • 이준현;이동석;이환우
    • 대한기계학회논문집A
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    • 제26권11호
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    • pp.2383-2389
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    • 2002
  • This paper describes an experimental study on fatigue life extension by using cold working process in fastener hole of aircraft structure. Cold working process was applied for A12024-7351 specimens by considering the effect of edge margin on fatigue life. It is generally recognized that cold working process offers a protective zone around fastener hole of aluminum aircraft structure due to the residual compressive stresses which lead to retardation of crack growth. Thus this process provides the beneficial effect of increasing the fatigue life of the component. there by decreasing maintenance costs. It has also been successfully incorporated into damage tolerance and structural integrity programs. Cold working specimens were tested at constant amplitude peak cyclic stresses. Fatigue life of cold working specimen compared with that of specimen fabricated with base material. The increase of fatigue life for cold working specimen is discussed by both considering the effect of residual compressive stresses measured by X-ray diffraction technique and quantitative effect of edge margin.

AttPSM을 사용하는 Metal Layer 리토그라피공정의 Overlay와 Side-lobe현상 방지 (Overlay And Side-lobe Suppression in AttPSM Lithography Process for An Metal Layer)

  • 이미영;이흥주
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2002년도 하계학술대회 논문집
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    • pp.18-21
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    • 2002
  • As the mask design rules get smaller, the probability of the process failure becomes higher due to the narrow overlay margin between the contact and metal interconnect layers. To obtain the minimum process margin, a tabbing and cutting method is applied with the rule based optical proximity correction to the metal layer, so that the protection to bridge problems caused by the insufficient space margin between the metal layers can be accomplished. The side-lobe phenomenon from the attenuated phase shift mask with the tight design nile is analyzed through the aerial image simulation for test patterns with variation of the process parameters such as numerical aperture, transmission rate, and partial coherence. The corrected patterns are finally generated by the rules extracted from the side-lobe simulation.

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AttPSM metal layer 리토그라피공정의 side-lobe억제를 위한 Rule-based OPC (Rule-based OPC for Side-lobe Suppression in The AttPSM Metal Layer Lithography Process)

  • 이미영;이홍주;성영섭;김훈
    • 대한전자공학회:학술대회논문집
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    • 대한전자공학회 2002년도 하계종합학술대회 논문집(2)
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    • pp.209-212
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    • 2002
  • As the mask design rules get smaller, the probability of the process failure becomes higher doc to the narrow overlay margin between the contact and metal interconnect layers. To obtain the minimum process margin, a tabbing and cutting method Is applied with the rule based optical\ulcorner proximity correction to the metal layer, so that the protection to bridge problems caused by the insufficient space margin between the metal layers can be accomplished. The side-lobe phenomenon from the attenuated phase shift mask with the tight design rule is analyzed through the aerial image simulation for test patterns with variation of the process parameters such as numerical aperture, transmission rate, and partial coherence. The corrected patterns are finally generated by the rules extracted from the side-lobe simulation.

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Three New Species of Kelleria (Copepoda: Poecilostomatoida: Kelleriidae) from Korea

  • Kim, Il-Hoi
    • Animal Systematics, Evolution and Diversity
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    • 제22권1호
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    • pp.1-11
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    • 2006
  • Three new species of Kelleria are described based on the females from the invertebrate burrows in the Port Seogwipo, Jeju Island, Korea. These species possess in common no process on the inner margin of the free segment of leg 5. Kelleria grandisetiger n. sp. possesses a large seta on lateral sides of the genital double-somite and a small thumb-like process near base of the free segment of leg 5. Kelleria undecidentata n. sp. possesses the elongated free segment of leg 5 which is more than four times as long as wide and 11 teeth on the distal margin of the second maxillary segment. Kelleria portiviva n. sp. possesses one seta and one distinct spine on the distal margin of the free segment of leg 5, ten or 11 teeth on the distal margin of the second maxillary segment, and a tuft of spinules on the convex outer comer of mandible.

신규원전 여유도 관리 방안 연구 (A Study on the method of Margin Management for New Nuclear Power Plant)

  • 박유진
    • 한국건축시공학회:학술대회논문집
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    • 한국건축시공학회 2018년도 춘계 학술논문 발표대회
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    • pp.151-152
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    • 2018
  • In the domestic nuclear power industry, concern about safety of nuclear power plants is continuously increased with the Fukushima nuclear power plant accident. In order to enhance the safety of nuclear power plants, it is important to ensure that the power plants are operating with proper margin within the original design bases. Margin management is the process of ensuring that the NPP designer and operator are aware of the physical and operating limits, and potential and probability of failure, for each component in the plant. All components are subject to margin considerations, but the most important components by scope and attention are those related to safety-related systems and NPP safe shutdown.

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AVEVA Marine 강재마진의 선모델링 자동반영을 위한 인공지능 모델링 시스템 개발 (Development of Artificial Intelligence Modeling System for Automated Application of Steel Margin in Early Modeling Process using AVEVA Marine)

  • 김남훈;박용석;김정호;김연용;천종진;최형순
    • 대한조선학회 특별논문집
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    • 대한조선학회 2013년도 특별논문집
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    • pp.35-41
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    • 2013
  • Nowadays, automated modeling system for steel margin based on interactive user interface has been developed and applied to the production design stage. The system could increase design efficiency and minimize human error owing to recent CAD technique. However, there has been no approach to the pre-nesting design stage at all in early modeling process especially where ship model should be handled at more than two design stages using AVEVA Marine. A designer of the design stage needs artificial intelligence system beyond modeling automation when 3D model must be prepared in early modeling process using AVEVA Marine because they have focused on 2D nesting traditionally. In addition, they have a hard time figuring out the model prepared in previous design stage and modifying the model for steel purchase size in early modeling process. In this paper, artificial intelligence modeling system for automated application of steel margin in early modeling process using AVEVA Marine is developed in order to apply to the pre-nesting design stage that can detect effective segments before a calculation to find if a segment locates near block butt boundaries by filtering noise segments among lines, curves and surface intersections based on IT big data analysis.

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0.18${\mu}{\textrm}{m}$이하 metal layer 사진공정에서의 overlay 보정 (Overlay correction in sub-0.18${\mu}{\textrm}{m}$ metal layer photolithography process)

  • 이미영;이홍주
    • 한국산학기술학회:학술대회논문집
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    • 한국산학기술학회 2002년도 춘계학술발표논문집
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    • pp.106-108
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    • 2002
  • 반도체 physical layout design rule이 작아짐에 따라 Proximity effect와 overlay가 Pattern 구현에 크게 영향을 미치고 있다. Metal layer와 contact의 부족한 overlay margin으로 overlay 불량이 발생하고, 감소한 space margin으로 인해 bridge와 같은 문제가 나타난다. 따라서, resolution을 향상시키고, 최소한의 overlay margin을 확보함으로써 미세 pattern의 구현을 가능하게 한다. 이를 위해 OPC와 attPSM 같은 분해능향상기술이 사용된다. 그러나 attPSM의 사용은 원하지 않는 pattern이 생성되는 sidelobe와 같은 문제가 발생한다. 따라서 serial image simulation올 통해 추출한 rule을 rule-based correction에 적용하여 sidelobe현상을 방지한다. 그리고 overlay margin 부족으로 나타나는 문제는 metal layer와 contact overlap되는 영역의 line edge를 확장하고, rule checking을 통해 최소한의 space margin을 확보하여 해결한다 따라서 overlay error를 rule-based correction을 사용하여 효과적으로 방지한다.

위상변위 극자외선 마스크의 흡수체 패턴의 기울기에 대한 오차허용도 향상 (Improved Margin of Absorber Pattern Sidewall Angle Using Phase Shifting Extreme Ultraviolet Mask)

  • 장용주;김정식;홍성철;안진호
    • 반도체디스플레이기술학회지
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    • 제15권2호
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    • pp.32-37
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    • 2016
  • Sidewall angle (SWA) of an absorber stack in extreme ultraviolet lithography mask is considered to be $90^{\circ}$ ideally, however, it is difficult to obtain $90^{\circ}$ SWA because absorber profile is changed by complicated etching process. As the imaging performance of the mask can be varied with this SWA of the absorber stack, more complicated optical proximity correction is required to compensate for the variation of imaging performance. In this study, phase shift mask (PSM) is suggested to reduce the variation of imaging performance due to SWA change by modifying mask material and structure. Variations of imaging performance and lithography process margin depending on SWA were evaluated through aerial image and developed resist simulations to confirm the advantages of PSM over the binary intensity mask (BIM). The results show that the variations of normalized image log slope and critical dimension bias depending on SWA are reduced with PSM compared to BIM. Process margin for exposure dose and focus was also improved with PSM.

Gain-phase margin specified PI speed control of a PM synchronous motor

  • Kim G.S.;Youn M.J.
    • 전력전자학회:학술대회논문집
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    • 전력전자학회 2003년도 춘계전력전자학술대회 논문집(2)
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    • pp.994-997
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    • 2003
  • Simple tuning formulae are derived to design a Pl controller to meet the gain and phase margin specifications. These formulae are suitable for the auto-tuning of a process where the robustness should be guaranteed. The auto-tuned PI controller is examined for the speed regulation of a PM synchronous motor.

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An Adaptively Segmented Forward Problem Based Non-Blind Deconvolution Technique for Analyzing SRAM Margin Variation Effects

  • Somha, Worawit;Yamauchi, Hiroyuki
    • JSTS:Journal of Semiconductor Technology and Science
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    • 제14권4호
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    • pp.365-375
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    • 2014
  • This paper proposes an abnormal V-shaped-error-free non-blind deconvolution technique featuring an adaptively segmented forward-problem based iterative deconvolution (ASDCN) process. Unlike the algebraic based inverse operations, this eliminates any operations of differential and division by zero to successfully circumvent the issue on the abnormal V-shaped error. This effectiveness has been demonstrated for the first time with applying to a real analysis for the effects of the Random Telegraph Noise (RTN) and/or Random Dopant Fluctuation (RDF) on the overall SRAM margin variations. It has been shown that the proposed ASDCN technique can reduce its relative errors of RTN deconvolution by $10^{13}$ to $10^{15}$ fold, which are good enough for avoiding the abnormal ringing errors in the RTN deconvolution process. This enables to suppress the cdf error of the convolution of the RTN with the RDF (i.e., fail-bit-count error) to $1/10^{10}$ error for the conventional algorithm.