• 한국표면공학회지
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• 제48권1호
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• pp.7-10
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• 2015

Recently, oxide TFTs has attracted a lot of interests due to their outstanding properties such as excellent environmental stability, high mobility, wide-band gap energy and high transparency, and investigated through the method using vacuum system and wet solution. In the case of the method using wet solution, process is very simple, however, annealing process should be included. In this study, to overcome the problem of annealing process, atmospheric pressure plasma was used for annealing, and the electrical characteristics such as on/off ration and mobility of device were investigated.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
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• pp.128.1-128.1
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• 2016

Nitrided-metal gates on the high-${\kappa}$ dielectric material are widely studied because of their use for sub-20nm semiconductor devices and the academic interest for the evanescent states at the Si/insulator interface. Issues in these systems with the Si substrate are the electron mobility degradation and the reliability problems caused from N defects that permeates between the Si and the $SiO_2$ buffer layer interface from the nitrided-gate during the gate deposition process. Previous studies proposed the N defect structures with the gap states at the Si band gap region. However, recent experimental data shows the possibility of the most stable structure without any N defect state between the bulk Si valence band maximum (VBM) and conduction band minimum (CBM). In this talk, we present a new type of the N defect structure and the electronic structure of the proposed structure by using the first-principles calculation. We find that the pair structure of N atoms at the $Si/SiO_2$ interface has the lowest energy among the structures considered. In the electronic structure, the N pair changes the eigenvalue of the silicon-induced gap state (SIGS) that is spatially localized at the interface and energetically located just above the bulk VBM. With increase of the number of N defects, the SIGS gradually disappears in the bulk Si gap region, as a result, the system gap is increased by the N defect. We find that the SIGS shift with the N defect mainly originates from the change of the kinetic energy part of the eigenstate by the reduction of the SIGS modulation for the incorporated N defect.

• 진공이야기
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• 제3권1호
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• pp.9-15
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• 2016

Molybdenum disulfide ($MoS_2$), which has 0.65 nm-thick atomic layer, can be easily separated layer by layer due to weak van der Waals interactions in out-of-plane direction. ($MoS_2$), has a good potential in nanoelectronics, because it has high electrical mobility and On/Off ratio. Its band gap energy changes from indirect to direct band gap energy as it goes from bulk to monolayer. Therefore, atomically thin ($MoS_2$), is widely studied in academic and engineering fields. Here, we introduce the research of atomically thin $MoS_2$ and discuss the research directions.

• Transactions on Electrical and Electronic Materials
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• 제12권4호
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• pp.140-143
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• 2011

The growth and characterization of $In_{0.5}Ga_{0.5}As/In_{0.5}Al_{0.5}As$ narrow-gap inverted high electron mobility transistor structures, developed as a candidate material for spin-injection devices, are presented in this study. We have grown samples possessing surface $In_{0.5}Ga_{0.5}As$ channels of different thicknesses (30 nm and 60 nm) both with and without a thin 3 nm $In_{0.5}Ga_{0.5}As$ cap layer by using molecular beam epitaxy. We then investigated the in-plane transport properties as well as the Rashba spin-orbit coupling constant of the two-dimensional electron gas confined at the heterojunction interface.

• 대한전자공학회:학술대회논문집
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• 대한전자공학회 1998년도 하계종합학술대회논문집
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• pp.327-330
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• 1998

In this theory, we explained the impossibility of the motion or miving of the hole that has been recognized to be a carrier, by giving some fundamental reasons. We treated energy gap and impurity concentration, in p- and n-type region, as functions of the mobility that is one of te factors which determine current quantity, and analyzed the primary electron theory as a carrier by introducing 2 hypotheses.

• 로봇학회논문지
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• 제15권2호
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• pp.160-168
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• 2020

There exists a popular belief that the elderly are more conservative than the younger people in acceptability of new technology. This study explores whether the generation gap in technology acceptance exists in the case of using telepresence robots, which project the presence and mobility of remote operator, for the universal purpose of social participation rather than for specific applications. Two groups of senior citizens and undergraduate students in their twenties personally experienced the telepresence robots operation and conducted a survey on how they perceived the social participation of a remote operator mediated by telepresence robot and to what extent the remote operator deserve equal rights to be treated as if one really exists in the local environment. The results show that the elderly have higher expectation on the role and functions of telepresence robots, and more favorable in principle for a remote operator to exercise equal rights by operating telepresence robot. It suggests that the stereotypes, the elderly lag behind younger generation in accepting new technology, is unlikely to fit into the telepresence robot market, for the elderly have more favor and support using telepresence robots as an universal avatar for social participation.

• 한국안전학회지
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• 제11권3호
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• pp.81-88
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• 1996

In order to investigate the electrical properties of transformer oils for large power, the characteristics of AC and Impulse breakdown in gap length of 1.0~2.5mm and that of volume resistivity were researched in temperature range of 20~$100^{\circ}C$. An geometrical capacitance of electrode with coaxial cylindrical shape for measuring the volume resistivity was 16pF, and highmegohm meter with model no. VMG-1000 was used, and also the applied voltage were DC 100, 250 and 500V. In the dependance of breakdown characteristics due to electrode gap length, it was confirmed that breakdown voltage was nearly uniform by volume effect according to the increase of gap. In the characteristics for AC breakdown, the dielectric strength was increased to $90^{\circ}C$ but decreased over $90^{\circ}C$, and also in case of impulse breakdown, it was increased to 7$0^{\circ}C$ and at dated $70^{\circ}C$ over in temperature range. The calculated mobility of oils in the characteristics for impulse breakdown were about $10^{-5}$~$10^{-4}cm^2/V{\cdot}S$, and the value of volume resistivity was almost invariable in low temperature range, regardless of voltage by the stable thermal properties, and it indicated a peak at $50^{\circ}C$ and had a sudden change to decrease over that temperature, and also the value of volume resistivity in 250V/mm at $80^{\circ}C$ is suitable for the International electrical standards, it was confirmed.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2007년도 하계학술대회 논문집 Vol.8
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• pp.99-100
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• 2007

ZnO films on $Al_2O_3$ substrates were grown using a pulsed laser deposition method. Through photoluminescence (PL) and X-ray diffraction (XRD) measurements, the optimum growth conditions for the ZnO growth were established. The results of the XRD measurements indicate that ZnO films were strongly oriented to the c-axis of the hexagonal structure and epitaxially crystallized under constraints created by the substrate. The full width half maximum for a theta curve of the (0002) peak was $0.201^{\circ}$. Also, from the PL measurements, the grown ZnO films were observed to give free exciton behaviour, which indicates a high quality of the epilayer. The Hall mobility and carrier density of the ZnO films at 293 K were estimated to be $299\;cm^2/V\;s$ and $8.27\;{\times}\;10^{16}\;cm^{-3}$, respectively. The absorption spectra revealed that the temperature dependance of the optical band gap on the ZnO films was $E_g(T)\;=\;3.439\;eV\;-\;(5.30\;{\times}\;10^{-4}\;ev/K)T^2(367\;+\;T)$.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2007년도 하계학술대회 논문집 Vol.8
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• pp.121-122
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• 2007

Single crystal $CuAlSe_2$ layers were grown on thoroughly etched sem-insulating GaAs(l00) substrate at $410^{\circ}C$ with hot wall epitaxy (HWE) system by evaporating $CuAlSe_2$ source at $680^{\circ}C$. The crystalline structure of the single crystal thin films was investigated by the photoluminescence and double crystal X-ray diffraction (DCXD). The carrier density and mobility of single crystal $CuAlSe_2$ thin films measured with Hall effect by van der Pauw method are $9.24{\times}l0^{16}\;cm^{-3}$ and $295\;cm^2/V{\cdot}s$ at 293K, respectively. The temperature dependence of the energy band gap of the $CuAlSe_2$ obtained from the absorption spectra was well described by the Varshni's relation, $E_g(T)\;=\;2.8382\;eV\;-\;(8.68\;{\times}\;10^{-4}\;eV/K)T^2/(T\;+\;155\;K)$.

• 전기전자학회논문지
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• 제24권2호
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• pp.592-597
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• 2020

SiC는 Si에 비해서 Breakdown field가 10배 높고, Energy gap이 3배 높기 때문에 높은 Breakdown voltage를 갖는 우수한 전력 MOSFET을 제작할 수 있다. 하지만 낮은 Mobility로 인한 높은 On저항을 갖기 때문에 이를 낮추기 위해서 Trench MOSFET이 제안되었지만 동시에 BV가 감소한다는 문제점을 갖는다. 본 논문에서는 1200V급 Trench MOSFET 설계를 목적으로 하며, 이를 해결하기 위해서 BV와 Ron에 대한 중요한 변수인 Epi 깊이, Trench 깊이, Trench 깊이에서 Epi 깊이까지의 거리에 대한 Split을 진행하여 최대 전계, BV, Ron의 신뢰성 특성을 비교 분석하였다. Epi 깊이가 증가할수록, Trench 깊이가 감소할수록, Trench 깊이에서 Epi 깊이가 감소할수록 최대 전계 감소, BV 증가, Ron 증가를 확인하였다. 모든 결과는 Sentaurus TCAD를 통해 Simulation 되었다.