• 대한전기학회논문지:전기물성ㆍ응용부문C
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• 제49권9호
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• pp.523-526
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• 2000

A dual gate trench emitter IGBT structure is proposed and studied numerically using the device simulator MEDICI. The on-state forward voltage drop latch-up current density turn-off time and breakdown voltage of the proposed structure are compared with those of the conventional DMOS-IGBT and trench gate IGBT structures. The proposed structure forms an additional channel and increases collector current level resulting in reduction of on -state forward voltage drop. In addition the trench emitter increases latch-up current density by 148% in comparison with that for the conventional DMOS-IGBT and by 83% compared with that for the trench gate IGBT without degradation in breakdown voltage when the half trench gate width(Tgw) and trench emitter depth(Ted) are fixed at $1.5\mum\; and\; 2\mum$, respectively

• 한국조명전기설비학회:학술대회논문집
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• 한국조명전기설비학회 2008년도 춘계학술대회 논문집
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• pp.151-154
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• 2008

The field emission lamps have the advantages to their cold cathode-characteristic and the eco-friendly, We realized that the dual emitter system showed very simple structure which gate and cathode electrodes are formed on the same glass surface. In this paper, we reported the properties of dual emitters depended on variation of gate width and spacing for optimum panel structure. In combination of dual emitter structure and bi-polar driving, electron beam spreads more than normal gate structure or diode structure, and emission uniformity increased in dual emitter structure at 5"-diagonal.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2009년도 하계학술대회 논문집
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• pp.454-455
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• 2009

Selective emitter structure have an important research subject for crystalline silicon solar cells because it is used in production for high efficiency solar cells. A selective emitter structure with highly doped regions underneath the metal contacts is widely known to be one of the most promising high-efficiency solution in solar cell processing. Since most of the selective emitter processes require expensive extra masking and double steps process. Formation of selective emitters is not cost effective. One method that satisfies these requirements is the method of screen-printing with a phosphorus doping paste. In this paper we researched two groups of selective emitter structure process. One was using dopant paste, and the other was using solid source, in order to compare their uniformity, sheet resistance and performance condition time.

• 한국진공학회지
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• 제9권2호
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• pp.167-171
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• 2000

AlGaAs/GaAs HBT의 동작특성에 미치는 에미터 구조의 영향을 조사하였다. 에미터의 크기 변화에 의해 차단주파수와 최대공진주파수가 변화하였으며, 이는 에미터 구조에 따라 저항과 접합용량이 변하기 때문이다. 또한 에미터의 주변길이와 접합면적도 HBT의 고주파 특성에 영향을 미치는 것을 알 수 있다.

• 한국전기전자재료학회논문지
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• 제33권2호
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• pp.83-87
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• 2020

In this letter, we propose and analyze a new asymmetric structure that can be used for next-generation power semiconductor devices. We compare and analyze the electrical characteristics of the proposed device with respect to those of symmetric devices. The proposed device has a p-emitter on the right side of the cell. The peak electric field is reduced by the shielding effect caused by the p-emitter structure. Consequently, the breakdown voltage is increased. The proposed asymmetric structure has an approximately 100% higher Baliga's figure of merit (~94.22 MW/㎠) than the symmetric structure (~46.93 MW/㎠), and the breakdown voltage of the device increases by approximately 70%.

• 한국전기전자재료학회논문지
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• 제16권11호
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• pp.1023-1028
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• 2003

The field emission characteristics are studied by simulation for carbon nanotube triode structures with a strip-shaped emitter and a gate hole aligned with it. Two structures, one with double-edge and the other with single edge are analyzed. They show good emission characteristics. Emissions of electrons are concentrated on the edges of emitter and the emitted current increases as the distance between emitter and gate decreases. For single-edged emitter, the emitted electrons form a narow strip-shaped beam which has a good directionality. These triode structures have advantages in that they can be easily fabricated and aligned for assembly.

• 전기전자학회논문지
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• 제25권2호
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• pp.371-375
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• 2021

본 논문에서는 고전압과 고온에서 사용할 수 있는 SiC 기반의 LIGBT 구조를 제시한다. 낮은 전류 특성을 향상시키기 위해 Gate를 중심으로 대칭되는 Dual-Emitter가 삽입된 것이 특징이다. 제안된 소자의 특성 검증을 위하여 Sentaurus TCAD simulation을 이용하여 시뮬레이션을 진행하였고 일반적인 LIGBT와 비교 연구를 진행하였다. 뿐만 아니라, 소수캐리어에 의한 전기적 특성을 검증하기 위해 N-drift 영역의 길이에 대하여 변수를 지정하여 Split을 진행하였다. 시뮬레이션 분석 결과, 제안된 Dual-Emitter 구조는 기존의 LIGBT보다 동일한 전압에서 높은 전류가 흐르는 것을 확인하였다.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2001년도 하계학술대회 논문집
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• pp.347-350
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• 2001

A typical Mold method is to form a gate electrode, a gate oxide, and emitter tip after fabrication of mold shape using wet-etching of Si substrate. In this study, however, new Mold method using a side wall space structure is used in order to make sharper emitter tip with a gate electrode. Using LPCVD(low pressure chemical vapor deposition), a gate oxide and electrode layer are formed on a Si substrate, and then BPSG(Boro phospher silicate glass) thin film is deposited. After, the BPSG thin film is flowed into a mold as high temperature in order to form a sharp mold structure. Next TiN thin film is deposited as a emitter tip substance. The unfinished device with a glass substrate is bonded by anodic bonding techniques to transfer the emitters to a glass substrate, and Si substrate is etched using KOH-deionized water solution. Finally, we made sharp field emitter array with gate electrode on the glass substrate.

• 한국신재생에너지학회:학술대회논문집
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• 한국신재생에너지학회 2010년도 춘계학술대회 초록집
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• pp.91.2-91.2
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• 2010

The use of plated front contact for metallization of silicon solar cell may alternative technologies as a screen printed and silver paste contact. This technologies should allow the formation of contact with low contact resistivity a high line conductivity and also reduction of shading losses. The better performance of Ni/Cu contacts is attributed to the reduced series resistance due to better contact conductivity of Ni with Si and subsequent electroplating of Cu on Ni. The ability to pattern narrower grid lines for reduced light shading combined with the lower resistance of a metal silicide contact and improved conductivity of plated deposit. This improves the FF as the series resistance is deduced. This is very much required in the case of low concentrator solar cells in which the series resistance is one of the important and dominant parameter that affect the cell performance. A selective emitter structure with highly dopes regions underneath the metal contacts, is widely known to be one of the most promising high-efficiency solution in solar cell processing. This paper using selective emitter structure technique, fabricated Ni/Cu plating metallization cell with a cell efficiency of 17.19%.

• 전기전자학회논문지
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• 제15권2호
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• pp.164-170
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• 2011

본 논문에서는 기존 LIGBT의 컬렉터와 에미터 사이에 추가적으로 에미터를 형성한 이중-에미터 구조의 LIGBT를 제안한다. 이중-에미터 LIGBT 구조는 추가된 에미터에 의해 향상된 래치-업 전류밀도, 순방향 전압강하와 빠른 턴-온 시간을 갖는다. 시뮬레이션 결과 이중-에미터 LIGBT 구조는 기존 LIGBT 구조보다 향상된 순방향 전압강하(1.05V), 높은 래치-업 전류($2.5{\times}10^3\;A/{\mu}m^2$), 빠른 턴-온 시간(7.4us)을 가짐을 확인 한다.