• Title/Summary/Keyword: a-SiOC:H

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Impact of Absorber Thickness on Bifacial Performance Characteristics of Semitransparent Amorphous Silicon Thin-Film Solar Cells (광흡수층 두께에 따른 투광형 비정질 실리콘 박막 태양전지의 양면발전 성능특성)

  • Seo, Yeong Hun;Lee, Ahruem;Shin, Min Jeong;Cho, Ara;Ahn, Seungkyu;Park, Joo Hyung;Yoo, Jinsu;Choi, Bo-Hun;Cho, Jun-Sik
    • Current Photovoltaic Research
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    • v.7 no.4
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    • pp.97-102
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    • 2019
  • Bifacial and semitransparent hydrogenated amorphous silicon (a-Si:H) thin-film solar cells in p-i-n configuration were prepared with front and rear transparent conducting oxide (TCO) electrodes using plasma-enhanced chemical vapor deposition method. Fluorine-doped tin oxide and tin-doped indium oxide films were used as front and rear TCO contacts, respectively. Film thickness of intrinsic a-Si:H absorber layers were controlled from 150 nm to 450 nm by changing deposition time. The dependence of performance characteristics of solar cells on the front and rear illumination direction were investigated. For front illumination, gradual increase in the short-circuit current density (JSC) from 10.59 mA/㎠ to 14.19 mA/㎠ was obtained, whereas slight decreases from 0.83 V to 0.81 V for the open-circuit voltage (VOC) and from 68.43% to 65.75% for fill factor (FF) were observed. The average optical transmittance in the wavelength region of 380 ~ 780 nm of the solar cells decreased gradually from 22.76% to 15.67% as the absorber thickness was changed from 150 nm to 450 nm. In case of the solar cells under rear illumination condition, the JSC increased from 10.81 to 12.64 mA/㎠ and the FF deceased from 66.63% to 61.85%, while the VOC values were maintained at 0.80 V with increasing the absorber thickness from 150 nm to 450 nm. By optimizing the deposition parameters, a high-quality bifacial and semitransparent a-Si:H solar cell with 350 nm-thick i-a-Si:H absorber layer exhibited the conversion efficiencies of 7.69% for front illumination and 6.40% for rear illumination, and average visible optical transmittance of 17.20%.

Multinuclear Solid-state NMR Investigation of Nanoporous Silica Prepared by Sol-gel Polymerization Using Sodium Silicate

  • Kim, Sun-Ha;Han, Oc-Hee;Kim, Jong-Kil;Lee, Kwang-Ho
    • Bulletin of the Korean Chemical Society
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    • v.32 no.10
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    • pp.3644-3649
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    • 2011
  • Multinuclear solid-state nuclear magnetic resonance (NMR) experiments were performed to investigate the local structure changes of nanoporous silica during hydrothermal treatment and surface modification with 3-aminopropyltriethoxysilane (3-APTES). The nanoporous silica was prepared by sol-gel polymerization using inexpensive sodium silicate as a silica precursor. Using $^1H$ magic angle spinning (MAS) NMR spectra, the hydroxyl groups, which play an important role in surface reactions, were probed. Various silicon sites such as $Q^2$, $Q^3$, $Q^4$, $T^2$, and $T^3$ were identified with $^{29}Si$ cross polarization (CP) MAS NMR spectra and quantified with $^{29}Si$ MAS NMR spectra. The results indicated that about 25% of the silica surface was modified. $^1H$ and $^{29}Si$ NMR data proved that the hydrothermal treatment induced dehydration and dehyroxylation. The $^{13}C$ CP MAS and $^1H$ MAS NMR spectra of 3-APTES attached on the surface of nanoporous silica revealed that the amines of the 3-aminopropyl groups were in the chemical state of ${NH_3}^+$ rather than $NH_2$.

A Formation of the $Fluorocarbonated-SiO_2$ Films on Si(100) ASubstrate by $O_2/FTES-High$ Density Plasma CVD

  • Oh, Kyoung-Suk;Kang, Min-Sung;Lee, Kwang-Man;Kim, Duk-Soo;Kim, Doo-Chul;Choi, Chi-Kyu;Yun, Seak-Min;Chang, Hong-Young
    • Journal of the Korean Vacuum Society
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    • v.7 no.s1
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    • pp.106-117
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    • 1998
  • Fluorocarbonated-SiO2 films were deposited on p-type Si(100) substrate using FSi$(OC_2H_5)_3$ (FTES), and $O_2$ mixture gases by a helicon plasms source. High density $O_2$/FTES/Ar plasma of ~$10^{12} \textrm{cm}^{-3}$ is obtained at low pressure (<3mTorr) with RF power above 900 W in the helicon plasma source. Optical emission spectroscopy (OES) is used to study the relation between the relative densities of the radicals and the film properties. The FTES and $O_2$ gases are greatly dissociated at the helicon mode that is launched at the above threshold plasma density. FTIR and XPS spectra shows that the film has Si-F, and C-F bonds during the formation process of the film which may lower the dielectric constant greatly. The relative dielectric constant, leakage current density, and dielectric breakdown voltage are about 2.8, $8\times10^{-9}\textrm{A/cm}^2$, and > 12 MV/cm, respectively.

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Silica Coating on Polymethylmethacrylate by Sol-Gel Process (졸-겔공정에 의해 Polymethylmethacrylate위에 실리카 코팅)

  • 이상근;양천회
    • Journal of the Korean Society of Safety
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    • v.12 no.4
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    • pp.79-85
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    • 1997
  • In order to improve the surface characteristics of polymethylmethacrylate(PMMA), oxide thin film coatings were applied using the sol-gel dip-coating technique. The $Si(OC_2H_5)_4$, tetra-ethyl-ortho-silicate(TEOS) was used as a starting material for $SiO_2$ coating. The hardness of the alkoxy-derived oxide-coated PMMA was increased from 190 MPa for non-coated PMMA with increasing film thickness. By optimizing the heating conditions and the hydrolysis conditions, a maximum apparent hardness obtained In the present study was achieved 310 MPa using the withdrawal velocity of 5cm/min and heat treatment at $90^{\circ}C$ for 5 hours, which is about 1.6 times larger than that of uncoated PMMA.

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Microstructures and Thermal Properties of Polycaprolactone/Epoxy Resin/SiO2 Hybrids

  • He, Lihua;Liu, Pinggui;Ding, Heyan
    • Journal of Adhesion and Interface
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    • v.7 no.4
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    • pp.32-38
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    • 2006
  • A series of organic-inorganic hybrids, PCL/EP/$SiO_2$, involving epoxy resin and triethoxysilane-terminated polycaprolactone elastomer (PCL-TESi) were prepared via polymerization of diglycidyl ether of bisphenol A (DGEBA) with amine curing agent KB-2 and sol-gel process of PCL-TESi. The curing reactions were started from the initially homogeneous mixture of DGEBA, KB-2 and the PCL-TESi. The organicinorganic hybrids containing up to 4.95% (wt) of $SiO_2$ were obtained and characterized by FT-IR, transmission electron microscopy (TEM), differential scanning calorimetry (DSC) and thermogravimetry analysis (TGA). It was experimentally shown that the swelling property in toluene, morphologies and thermal properties of the resulting hybrids were quite dependent on the contents of $SiO_2$. The crosslink network density decreases with increasing of the PCL-TESi. And in TEM, the phase separated morphology of these hybrids was found, which resulted from the coagulation of Si-O-Si networks resulting from $-Si(OC_2H_5)_3$ of PCL-TESi self-curing by hydrolytic silanol condensation, with the advancement of the curing reaction in the modified epoxy resin systems. Meanwhile, the change of the $SiO_2$ content made the morphologies changed from aggregated particles of Si-O-Si in the hybrid to nanocluster of interconnected Si-O-Si particles, then to aggregated Si-O-Si dispersing in the continuous cured epoxy phase again, and last to co-continuous interpenetrating network. The glass transition behavior of the hybrid material was cooperative motion of large chain segments, which were hindered by the inorganic Si-O-Si network. And in TG analysis, the characteristic temperature at 5% of weight loss was evidently increased from $120.5^{\circ}C$ of pure cured epoxy to $277.6^{\circ}C$ of 3.84% (wt) of $SiO_2$ modified epoxy due to the existence of Si-O-Si when PCL-TESi was added in the hybrid.

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Advanced Low-k Materials for Cu/Low-k Chips

  • Choi, Chi-Kyu
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.02a
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    • pp.71-71
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    • 2012
  • As the critical dimensions of integrated circuits are scaled down, the line width and spacing between the metal interconnects are made smaller. The dielectric film used as insulation between the metal lines contributes to the resistance-capacitance (RC) time constant that governs the device speed. If the RC time delay, cross talk and lowering the power dissipation are to be reduced, the intermetal dielectric (IMD) films should have a low dielectric constant. The introduction of Cu and low-k dielectrics has incrementally improved the situation as compared to the conventional $Al/SiO_2$ technology by reducing both the resistivity and the capacitance between interconnects. Some of the potential candidate materials to be used as an ILD are organic and inorganic precursors such as hydrogensilsequioxane (HSQ), silsesquioxane (SSQ), methylsilsisequioxane (MSQ) and carbon doped silicon oxide (SiOCH), It has been shown that organic functional groups can dramatically decrease dielectric constant by increasing the free volume of films. Recently, various inorganic precursors have been used to prepare the SiOCH films. The k value of the material depends on the number of $CH_3$ groups built into the structure since they lower both polarity and density of the material by steric hindrance, which the replacement of Si-O bonds with Si-$CH_3$ (methyl group) bonds causes bulk porosity due to the formation of nano-sized voids within the silicon oxide matrix. In this talk, we will be introduce some properties of SiOC(-H) thin films deposited with the dimethyldimethoxysilane (DMDMS: $C_4H_{12}O_2Si$) and oxygen as precursors by using plasma-enhanced chemical vapor deposition with and without ultraviolet (UV) irradiation.

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Silica-Pillared H-kenyaites: Interlamellar Base Catalyzed-Reaction of Tetraethlorthosilicate in Water Suspension

  • 권오윤;최상원
    • Bulletin of the Korean Chemical Society
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    • v.20 no.1
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    • pp.69-75
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    • 1999
  • The silica-pillared H-kenyaites were prepared by interlarmellar base-catalyzed reaction of tetraethylorthosilicate [TEOS, Si(OC2H5)4] intercalated into the interlayer of H-kenyaite. The intercalation of TEOS was conducted by the octylamine preswelling process, resulting in a dramatic increase in gallery height to 24.7 Å. The interlamellar hydrolysis of octylamine-TEOS/H-kenyaite paste were conducted between 10 min and 40 min in 0.00%, 0.05% and 0.10% NH3-water solution respectively, and resulting in siloxane-pillared H-kenyajte with gallery height of 28.2-31.8 Å. The calcination of samples at 538 ℃ resulted in silica-pillared H-kenyaites with a large surface areas between 411 m2/g and 885 m2/g, depending on the aging time and NH3 concentration. Samples with optimum specific surface areas and well ordered-basal spacing were obtained by reaction between 10 min and 40 min in pure water and 0.05% NH3-water solution. Mesoporous samples with narrow pore size distribution were also prepared by reaction for 10-40 min in 0.05% NH3 solution. Rapid interlamellar reaction of TEOS in pure water showed that intercalated octylamine itself could act as a base catalyst during interlamellar polycondensation of TEOS.

Sources Apportionment Estimation of Ambient PM2.5 and Identification of Combustion Sources by Using Concentration Ratios of PAHs (대기 중 PM2.5의 오염기여도 추정 및 PAHs 농도비를 이용한 연소 오염원 확인)

  • Kim, Do-Kyun;Lee, Tae-Jung;Kim, Seong-Cheon;Kim, Dong-Sool
    • Journal of Korean Society for Atmospheric Environment
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    • v.28 no.5
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    • pp.538-555
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    • 2012
  • The purpose of this study was to understand $PM_{2.5}$ chemical characteristics on the Suwon/Yongin area and further to quantitatively estimate $PM_{2.5}$ source contributions. The $PM_{2.5}$ sampling was carried out by a high-volume air sampler at the Kyung Hee University-Global Campus from November, 2010 to October, 2011. The 40 chemical species were then analyzed by using ICP-AES(Ag, Ba, Cr, Cu, Fe, Mn, Ni, Pb, Si, Ti, V and Zn), IC ($Na^+$, $K^+$, $NH_4{^+}$, $Mg^{2+}$, $Ca^{2+}$, $NO_3{^-}$, ${SO_4}^{2-}$ and $Cl^-$), DRI/OGC (OC1, OC2, OC3, OC4, OP, EC1, EC2 and EC3) and GC-FID (acenaphthene, fluorene, phenanthrene, anthracene, fluoranthene, pyrene, benzo[a]anthracene, benzo[b]fluoranthene, benzo[a] pyrene, indeno[1,2,3-cd] pyrene, benzo[g,h,i]perylene and dibenzo[a,h,]anthracene). When applying PMF model after performing proper data treatment, a total of 10 sources was identified and their contributions were quantitatively estimated. The average contribution to $PM_{2.5}$ emitted from each source was determined as follows; 26.3% from secondary aerosol source, 15.5% from soil and road dust emission, 15.3% from vehicle emission, 15.3% from illegal biomass burning, 12.2% from incineration, 7.2% from oil combustion source, 4.9% from industrial related source, and finally 3.2% from coal combustion source. In this study we used the ratios of PAHs concentration as markers to double check whether the sources were reasonably classified or not. Finally we provided basic information on the major $PM_{2.5}$ sources in order to improve the air quality in the study area.

A study on the preparation and analysis of cordierite by sol-gel method (졸-겔법에 의한 코디어라이트 제조와 분석에 관한 연구)

  • Chun, Kyung Soo;Lee, Young Hwan
    • Analytical Science and Technology
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    • v.21 no.2
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    • pp.123-128
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    • 2008
  • The golden turbid solution of cordierite precursor was obtained by using magnesium ethoxide in sol-gel method, while the clear solution of cordierite precursor was obtained when 5%-$Zr(OC_3H_7)_4$ solution was used in the sol-gel reaction. $SiO_2$ component was confirmed by infrared spectra showing $1045cm^{-1}$ and the stretching vibration of gelish $SiO_4$ showed $1140cm^{-1}$ and $940cm^{-1}$. The component of $Al_2O_3$ showed at $580cm^{-1}$ and network structure of $Al_2O_6$ showed at $680cm^{-1}$. The component of MgO was confirmed at $575cm^{-1}$ as the stretching vibration. X-ray diffraction analysis showed ${\mu}$-cordierite crystal was showed up at temperature above $1000^{\circ}C$ at the mole ratio of cordierite precursor and water (1:5). ${\mu}$-Cordierite and ${\alpha}$-cordierite were coexisted at $1050^{\circ}C$ for the mole ratio of cordierite precursor and ammonia (1:5) while ${\alpha}$-cordierite was only existed at $1100^{\circ}C$ for the same mole ratio as mentioned above.