A Study for Properties of SiOC(-H) Thin Films with $Low-{\kappa}$ Formed by UV-Assisted PECVD Method

  • Kim, Chang-Young (Nano Thin film Material Laboratory, Department of Physics, Cheju National University) ;
  • Jang, Young-Jun (Nano Thin film Material Laboratory, Department of Physics, Cheju National University) ;
  • Navamathavan, R. (Nano Thin film Material Laboratory, Department of Physics, Cheju National University) ;
  • Choi, Chi-Kyu (Nano Thin film Material Laboratory, Department of Physics, Cheju National University)
  • Published : 2007.08.15