• Title/Summary/Keyword: ZnO:Al layer

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A Study on Durability of Sprayed Coating Layer in the Molten Zn-0.2% Al Alloy Bath (아연-0.2%알루미늄합금 용융도금액 중에서 용사층의 내구성에 관한 연구)

  • 강태영;임병문;최장현;김영식
    • Journal of Welding and Joining
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    • v.19 no.5
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    • pp.512-519
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    • 2001
  • Sink roll has been used in molten Zn-0.2%Al alloy bath of continuous galvanizing line in sinking and stabilizing process of the steel strip in molten metal bath. In this process, although the scraper scraps off the sink roll surface, the dross compounds is builded up on the sink roll surface and the life time of the sink roll is shorten by the dross compounds. The present study was investigated the application of the spray coating layer on sink roll body for improving durability In molten Zn-0.2%Al alloy. Through the durability tests in molten Zn-0.2%Al alloy with various ceramic and cermet coating layer, the optimum bond and top coating material was obtained. As the results, the system of STS430F base metal, WC-l7Co bond and $ZrO_2-SiO_2$ top coating was clarified to be the best quality of durability in molten Zn-0.2%Al alloy.

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Structure of Surface Oxide Formed on Zinc-Coated Steel Sheet During Hot Stamping

  • Shota Hayashida;Takuya Mitsunobu;Hiroshi Takebayashi
    • Corrosion Science and Technology
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    • v.23 no.3
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    • pp.221-227
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    • 2024
  • During hot stamping of hot-dip zinc-coated steel sheets such as hot-dip galvanized steel sheets and hot-dip galvannealed steel sheets, an oxide mainly composed of ZnO is formed on the sheet surface. However, excessive formation of ZnO can lead to a decrease in the amount of metal Zn in the coating layer, decreasing the corrosion resistance of hot-stamped members. Therefore, it is important to suppress excessive formation of ZnO. While the formation of Al oxides and Mn oxides along with ZnO layer during the hot stamping of hot-dip zinc-coated steel sheets can affect ZnO formation, crystal structures of such oxides have not been elucidated clearly. Thus, this study aimed to analyze structures of oxides formed during hot stamping of hot-dip galvannealed steel sheets using transmission electron microscopy. Results indicated the formation of an oxide layer comprising ZnAl2O4 at the interface between ZnO and the coating layer with Mn3O4 at the outermost of an oxide layer.

Characteristics of nanocrystalline ZnO films grown on polyctystalline AlN for wireless chemical sensors (무선 화학센서용으로 다결정 AlN 위에 성장된 나노결정질 ZnO 막의 특성)

  • Song, Le Thi;Chung, Gwiy-Sang
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2009.11a
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    • pp.252-252
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    • 2009
  • In this work, the nanocrystalline ZnO/polycrystalline (poly) aluminum nitride (AlN)/Si structure was fabricated for humidity sensor applications based on surface acoustic wave (SAW). In this structure, the ZnO film was used as sensing material layer. These ZnO and AlN(0002) were deposited by so-gel process and a pulse reactive magnetron sputtering, respectively. These experimental results showed that the obtained SAW velocity on AlN film was about 5128 m/s at $h/\lambda$=0.0125 (h and $\lambda$ is thickness and wavelength, respectively). For ZnO sensing layers coated on AlN, films have hexagonal wurtzite structure and nanometer particle size. The crystalline size of ZnO films annealed at 400, 500, and 600 $^{\circ}C$ is 10.2, 29.1, and 38 nm, respectively. Surface of the film exhibits spongy which can adsorb steam in the air. The best quality of the ZnO film was obtained with annealing temperature at 500 $^{\circ}Cis$. The change in frequency response (127.9~127.85 MHz) of the SAW humidity sensor based on ZnO/AlN structure was measured along the change in humidity (41~69%). The structural properties of thin films wereinvestigated by XRD and SEM.

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Effect of Al Doping on the Properties of ZnO Nanorods Synthesized by Hydrothermal Growth for Gas Sensor Applications

  • Srivastava, Vibha;Babu, Eadi Sunil;Hong, Soon-Ku
    • Korean Journal of Materials Research
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    • v.30 no.8
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    • pp.399-405
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    • 2020
  • In the present investigation we show the effect of Al doping on the length, size, shape, morphology, and sensing property of ZnO nanorods. Effect of Al doping ultimately leads to tuning of electrical and optical properties of ZnO nanorods. Undoped and Al-doped well aligned ZnO nanorods are grown on sputtered ZnO/SiO2/Si (100) pre-grown seed layer substrates by hydrothermal method. The molar ratio of dopant (aluminium nitrate) in the solution, [Al/Zn], is varied from 0.1 % to 3 %. To extract structural and microstructural information we employ field emission scanning electron microscopy and X-ray diffraction techniques. The prepared ZnO nanorods show preferred orientation of ZnO <0001> and are well aligned vertically. The effects of Al doping on the electrical and optical properties are observed by Hall measurement and photoluminescence spectroscopy, respectively, at room temperature. We observe that the diameter and resistivity of the nanorods reach their lowest levels, the carrier concentration becomes high, and emission peak tends to approach the band edge emission of ZnO around 0.5% of Al doping. Sensing behavior of the grown ZnO nanorod samples is tested for H2 gas. The 0.5 mol% Al-doped sample shows highest sensitivity values of ~ 60 % at 250 ℃ and ~ 50 % at 220 ℃.

Dry Etching Behaviors of ZnO and $Al_2O_3$ Films in the Fabrication of Transparent Oxide TFT for AMOLED Display Application

  • Yoon, S.M.;Hwang, C.S.;Park, S.H.;Chu, H.Y.;Cho, K.I.
    • 한국정보디스플레이학회:학술대회논문집
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    • 2007.08b
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    • pp.1273-1276
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    • 2007
  • We provide a newly developed dry etching process for the fabrication of ZnO-based oxide TFTs. The etching characteristics of ZnO (active layer) and $Al_2O_3$ (gate insulator) thin films were systematically investigated when the etching gas mixtures and their mixing ratios were varied in the heliconplasma etching system.

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A Study on the Optical Property of Al-N-codoped p-type ZnO Thin Films Fabricated by DC Magnetron Sputtering Method

  • Liu, Yan-Yan;Jin, Hu-Jie;Park, Choon-Bae
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2009.06a
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    • pp.319-320
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    • 2009
  • In this study, high-quality Al-N doped p-type ZnO thin films were deposited on n-type Si (100) wafer or Si coated with buffer layer by DC magnetron sputtering in the mixture of $N_2$ and $O_2$ gas. The target was ceramic ZnO mixed with $Al_2O_3$ (2 wt%). The p-type ZnO thin film showed higher carrier concentration $2.93\times10^{17}cm^{-3}$, lower resistivity of $5.349\;{\Omega}cm$ and mobility of $3.99\;cm^2V^{-1}S^{-1}$, respectively. According to PL spectrum, the Al donor energy level depth ($E_d$) of Al-N codoped p-type ZnO film was reduced to about 51 meV, and the N acceptor energy level depth ($E_a$) was reduced to 63 meV, respectively.

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Conformal $Al_{2}O_{3}$ nano-coating of ZnO nanowires (ZnO 나노와이어에 ALD 방법으로 균일하게 코팅된 $Al_{2}O_{3}$)

  • Hwang, Joo-Won;Min, Byung-Don;Lee, Jong-Su;Keem, Ki-Hyun;Kang, Myung-Il;Kim, Sang-Sig
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2002.11a
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    • pp.47-50
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    • 2002
  • ZnO nanowires were coated conformally with aluminum oxide ($Al_{2}O_{3}$) material by atomic layer deposition (ALD). The ZnO nanowires were first synthesized on a Si (100) substrate at $1380^{\circ}C$ from ball-milled ZnO powders by a thermal evaporation procedure with an argon carrier gas without any catalysts; the length and diameter of these ZnO nanowires are $20\sim30{\mu}m$ and $50{\sim}200$ nm, respectively. $Al_{2}O_{3}$ films were then deposited on these ZnO nanowires by ALD at a substrate temperature of $300^{\circ}C$ using trimethylaluminum (TMA) and distilled water ($H_{2}O$). Transmission electron microscopy (TEM) images of the deposited ZnO nanowires revealed that 40nm-thick $Al_{2}O_{3}$ cylindrical shells surround the ZnO nanowires.

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ZnO/ITO anode for organic electro-luminescence devices

  • Jeong, S.H.;Kho, S.;Jung, D.;Boo, J.H.
    • 한국정보디스플레이학회:학술대회논문집
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    • 2003.07a
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    • pp.885-886
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    • 2003
  • A bilayer is used as an anode electrode for organic electroluminescent devices. The bilayer consist of an ultrathjn ZnO layer adjacent to an hole-transporting layer and an Indium tin oxide(ITO) outerlayer. We tried to bring low the barrier between the devices as deposited ZnO films on ITO substrates. We fabricated the organic EL structure consisted of Al as cathode, $Al_{2}O_{3}$ as electro transport layer, Alq3 as luminously layer, triphenyl diamine(TPD) as hole transport layer and ZnO(l nm )/ITO(l50 nm) as anode. The result of this experiment was not good compared with the case of using ITO, Nevertheless, at this structure we obtained the lowest turn-on voltage as the value of 19 V and the good brightness (6200 $cd/m^{2}$) of the emission light from the devices. Then the quantum efficiency was to be 1.0%.

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Effects of Boron Concentration in ZnO:Al Seed Films on the Growth and Properties of ZnO Nanorods (ZnO:Al 시드 막의 보론 농도가 ZnO 나노로드의 성장 및 특성에 미치는 영향)

  • Ma, Tae-Young;Park, Ki-Cheol
    • The Transactions of The Korean Institute of Electrical Engineers
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    • v.66 no.10
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    • pp.1488-1493
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    • 2017
  • Boron-doped ZnO:Al films were deposited by rf magnetron sputtering. The structural and optical property variations of the films with the boron amounts were studied. ZnO nanorods were grown on $SiO_2/Si$ wafers and glass by a hydrothermal method. ~50 nm-thick boron-doped ZnO:Al films were deposited on the substrates as seed layers. The mixed solution of zinc nitrate hexahydrate and hexamethylenetetramine in DI water was used as a precursor for ZnO nanorods. The concentration of zinc nitrate hexahydrate and that of hexamethylenetetramine were 0.05 mol, respectively. ZnO nanorods were grown at $90^{\circ}C$ for 2 hours. X-ray diffraction was conducted to observe the crystallinity of ZnO nanorods. A field emission scanning electron microscope was employed to study the morphology of nanorods. Optical transmittance was measured by a UV-Vis spectrophotometer, and photoluminescence was carried out with 266 nm light. The ZnO nanorods grown on the 0.5 wt% boron-doped ZnO seed layer showed the best crystallinity.