한국정보디스플레이학회:학술대회논문집
- 2007.08b
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- Pages.1273-1276
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- 2007
Dry Etching Behaviors of ZnO and $Al_2O_3$ Films in the Fabrication of Transparent Oxide TFT for AMOLED Display Application
- Yoon, S.M. (ICCL, ETRI) ;
- Hwang, C.S. (ICCL, ETRI) ;
- Park, S.H. (ICCL, ETRI) ;
- Chu, H.Y. (ICCL, ETRI) ;
- Cho, K.I. (ICCL, ETRI)
- Published : 2007.08.27
Abstract
We provide a newly developed dry etching process for the fabrication of ZnO-based oxide TFTs. The etching characteristics of ZnO (active layer) and