• 제목/요약/키워드: Volatile Memory

검색결과 302건 처리시간 0.035초

전자식 전력량계와 무선모듈을 이용한 전력품질 표시 및 모니터링 (Power Quality Monitoring with Electronic Watt-hour meter and Wireless communication module)

  • 정득일;손영대
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2007년도 추계학술대회 논문집 전기기기 및 에너지변환시스템부문
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    • pp.172-174
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    • 2007
  • An electronic watt-hour meter with high-precision measurement technology can provide many valuable metering data of a real-time system measurements, such as per-phase voltage, ampere, active power, reactive power, apparent power, power factor, and system frequency. Also many of accumulated metering data such as active energy, reactive energy, apparent energy, and load profile can be gettable from an electronic watt-hour meter[1]. This paper presents an approach of the small-sized AMR (Automatic Meter Reading) that provides customers with a very valuable electrical service. This AMR service transmits lots of a valuable metering data by using ZigBee communication module, so that users resided in their premises can use the information to audit a power quality and improve their electrical conditions by using the PQ monitoring device equipped with ZigBee receiver. This PQ monitoring device shows metering data on LCD and transmits to the PC through an internal network. Also, the device can keep the valuable meter data into a built-in non-volatile memory. The final goal of this paper is to better understand the power quality of electrical systems and offer the power qualify information for the convenience of all power consumers.

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안티퓨즈 MOS capacitor를 이용한 OTP 소자의 프로그래밍 후의 저항특성 (The resistance characterization of OTP device using anti-fuse MOS capacitor after programming)

  • 장성근;김윤장
    • 한국산학기술학회논문지
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    • 제13권6호
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    • pp.2697-2701
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    • 2012
  • 안티퓨즈 MOS 커패시터를 기반으로 제작된 OTP 소자의 수율은 프로그램 과정에서 입력 저항(Rin)값과 통과 트랜지스터(Pass Tr)의 크기, 데이터 읽기 과정에서 읽기 트랜지스터(Read Tr)와 읽기 전압에 영향을 받는다. 따라서 수율에 영향을 주는 요소를 분석하기 위해 여러 가지 실험 조건을 달리하여 각각의 조건에 대해 블로잉 후 실효소자의 저항 특성에 대한 풀 맵(full map) 데이터를 얻어 OTP 소자가 어떻게 동작하는지를 분석하여 수율 개선에 필요한 최적 조건을 연구하였다. 최적 조건은 입력저항이 $50{\Omega}$, 통과 트랜지스터의 W값이 $10{\mu}m$, 읽기 전압이 2.8 V 일 때이다.

비휘발성 메모리를 위한 $SiO_2/Si_3N_4$ 적층 구조를 갖는 터널링 절연막의 열처리 효과 (Annealing Effects of Tunneling Dielectrics Stacked $SiO_2/Si_3N_4$ Layers for Non-volatile Memory)

  • 김민수;정명호;김관수;박군호;정종완;정홍배;조원주
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2008년도 추계학술대회 논문집 Vol.21
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    • pp.128-129
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    • 2008
  • The annealing effects of $SiO_2/Si_3N_4$ stacked tunneling dielectrics were investigated. I-V characteristics of band gap engineered tunneling gate stacks consisted of $Si_3N_4/SiO_2/Si_3N_4$(NON), $SiO_2/Si_3N_4/SiO_2$(ONO) dielectrics were evaluated and compared with $SiO_2$ single layer using the MOS(Metal-Oxide-Semiconductor) capacitor structure. The leakage currents of engineered tunneling barriers (ONO, NON stacks) are lower than that of the conventional $SiO_2$ single layer at low electrical field. Meanwhile, the engineered tunneling barriers have larger tunneling current at high electrical field and improved electrical characteristics by annealing processes than $SiO_2$ layer.

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NVMe 드라이버 구현 방식에 따른 I/O 응답시간 분석 (Analysis of I/O Response Time Throughout NVMe Driver Implementation Architectures)

  • 강인구;주용수;임성수
    • 대한임베디드공학회논문지
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    • 제12권3호
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    • pp.139-147
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    • 2017
  • In recent years, non-volatile memory express (NVMe), a new host controller interface standard, has been adapted to overcome performance bottlenecks caused by the acceleration of solid state drives (SSD). Recently, performance breakthrough cases over AHCI based SATA SSDs by adapting NVMe based PCI Express (PCIe) SSD to servers and PCs have been reported. Furthermore, replacing legacy eMMC-flash storage with NVMe based storage is also considered for next generation of mobile devices such as smartphones. The Linux kernel includes drivers for NVMe support, and as the kernel version increases, the implementation of the NVMe driver code has changed. However, mobile devices are often equipped with older versions of Android operating systems (OSes), where the newest features of NVMe drivers are not available. Therefore, different features of different NVMe driver implementations are not well evaluated on Android OSes. In this paper, we analyze the response time of the NVMe driver for various Linux kernel version.

비휘발성 메모리 소자응용을 위한 Eu 첨가량에 따른 BET 박막의 강유전 특성 (Ferroelectric Properties of Bi3.25La0.75Ti3O12 Thin Films with Eu Contents for Non-volatile Memory Device Application)

  • 김경태;김종규;우종창;김관하;김창일
    • 한국전기전자재료학회논문지
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    • 제20권3호
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    • pp.223-227
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    • 2007
  • The effect of Eu contents on the ferroelectric properties of $Bi_{4-x}Eu_xTi_3 O_{12}$ (BET) thin films has been investigated. Bismuth Europium titanate thin films with a Eu contents were prepared on the $Pt/Ti/SiO_2/Si$ substrate by metal-organic decomposition technique. The structure and the morphology of the films were analyzed using X-ray diffraction (XRD) and field emission scanning microscopy (FE-SEM), respectively. From the XRD analysis, it was found that BET thin films have polycrystalline structure, and the layered-perovskite phase is obtained when the Eu contents exceeds 0.2 (x > 0.2). Also, the ferroelectric characteristics of the BET thin films were found to be dependent on the Eu content. Particularly, the BET films doped with x = 0.75 show better ferroelectric properties (remanent polarization 2Pr = 60.99 C/$cm^2$ and only a little polarization fatigue up to $3.5{\times}10^9$ bipolar switching cycling) than those doped with other Eu contents.

Surface Modification of MOOxOyS Non-volatile Memory Devices for Improving Charge Traps

  • 김태용;김지웅;이준신
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
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    • pp.264.2-264.2
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    • 2014
  • 비휘발성 메모리는 전원이 공급되지 않아도 저장된 정보를 계속 유지하는 메모리로써 현재 다양한 차세대 전자소자의 집적화 구현을 위해 저전압 동작 및 저장능력의 향상 등에 대한 연구가 활발히 진행되고 있다. 이때 삽입되는 전하저장층의 경우 기존 널리 이용되는 질화막(SiNx) 외에 최근에는 산화 알루미늄(Al2O3) 등의 고유전상수 물질 뿐만 아니라, 밴드갭 조절을 통해 전하저장능력을 향상시키는 산화막(SiOx)에 대한 연구도 진행 중이다. 이번 연구에서는 전하저장능력을 향상시키기 위해 전하저장층으로 산화막을 이용할 뿐만 아니라, 기존의 평편한 구조가 아닌 표면 조절을 통해 전하저장능력을 보다 향상시키고자 한다. 또한 이번 연구에서는 비휘발성 메모리 소자의 응용을 위해 우선적으로 금속-절연체-반도체 형태의 MOOxOyS 구조를 이용하였다. 이 때 실리콘 표면적을 변화시키기 위해 이용된 실리콘 웨이퍼는 1) 평편한 실리콘, 2) 수산화암모늄, 이소프로필 알코올 및 탈이온수를 혼합한 용액에 식각시킨 삼각형 구조, 3) 불산, 질산 및 아세트산을 혼합한 용액에 식각시킨 라운드 구조이다. 정전용량-전압 측정을 통해 얻어진 메모리 윈도우는 1) 평편한 실리콘의 경우 약 5.1 V, 2) 삼각형 구조의 경우 약 5.3 V, 3) 라운드 구조의 경우 약 5.9 V를 얻었다. 이 때, 라운드 구조의 경우 가장 넓은 표면적으로 인해 상대적으로 전하트랩이 가장 많이 되어 메모리 윈도우가 가장 커지는 특성을 볼 수 있었다.

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Synthesis and Characterization of Lead Zirconium Titanate Nanofibers by Electrospinnig

  • 최수진;박주연;고성위;강용철
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
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    • pp.189.1-189.1
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    • 2014
  • Lead zirconium titanate (PZT) is usually used as bulk and thin films. Due to high flexibility and piezoelectric, ferroelectric and pyroelectric properties, PZT fiber has attracted in a variety of fields such as sensor devices, non-electromechanical systems and non-volatile ferroelectric memory devices. And PZT fiber can be numerously synthesized and almost with the diameter of PZT fiber thicker than $10{\mu}m$. However, the electrospinnig method is cost effective and convenient. PZT obtained by electrospinning methodhas the diameter from sub-micro to nanometer. In this paper, the PZT/PVP nanofibers were synthesized with three precursors, lead nitrate, zirconium ethoxide and titanium isopropoxide. And the PZT nanofibers were fabricated after removal of PVP by annealing process at various temperature. The obtained PZT nanofibers were characterized by means of X-ray photoelectron spectroscopy (XPS) for chemical properties, X-ray diffraction (XRD) for crystallinity and phase, scanning electron microscopy (SEM) for morphologies. The diameter of PZT nanofibers were measured with SEM. From the SEM images, we confirmed that diameter of PZT nanofibers was hundreds of nanometers and decreased with increasing the annealing temperature. When the annealing temperature increased, the crystallinity of PZT nanofibers changed from pyrochlore to perovskite structure.

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Formation and stability of a ruthenium-oxide thin film made of the $O_2$/Ar gas-mixture sputtering

  • Moonsup Han;Jung, Min-Cherl;Kim, H.-D.;William Jo
    • Journal of Korean Vacuum Science & Technology
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    • 제5권2호
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    • pp.47-51
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    • 2001
  • To obtain high remnant polarization and good crystalinity of ferroelectric thin films in non-volatile memory devices, the high temperature treatment in oxygen ambient is inevitable. Severe problems that occur in this process are oxygen diffusion into substrate, oxidation of electrode and buffer layer, degradation of microstructure and so on. We made ruthenium dioxide thin film by reactive sputtering with oxygen and argon mixture atmosphere. Comparing quantitatively the core-level spectra of Ru and RuO$_2$ obtained by x-ray photoelectron spectroscopy(XPS), we found that chemical state of RuO$_2$ is very stable and of good resistance to oxygen diffusion and oxidation of adjacent layers. It opens the use of RuO$_2$ thin film as a multifunctional layer of good conducting electrode and resistive barrier for the diffusion and the oxidation. We also suggest a correct understanding of Ru 3d core-level spectrum for RuO$_2$ based on the scheme of final state screening and charge transfer satellites.

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하이브리드 하드디스크를 위한 효율적인 선반입 기법 (Effecient Prefetching Scheme for Hybrid Hard Disk)

  • 김정원
    • 한국전자통신학회논문지
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    • 제6권5호
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    • pp.665-671
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    • 2011
  • 하이브리드 하드디스크(Hybrid hard disk drive: H-HDD)가 SSD(Solid state drive)에 비해 경쟁력을 갖기 위해서는 저전력, 읽기 속도가 핵심 요소이다. 본 연구에서는 H-HDD에 장착되어 있는 비휘발성 메모리에 디스크 블록을 선반입하여 저전력과 응답시간을 향상시킬 수 있는 기법을 제안한다. 제안하는 기법의 핵심은 시스템파일이나 자주 사용되는 파일은 파일단위로 캐싱하고 나머지는 블록단위로 선반입한다. 선반입은 디스크 큐를 서비스하고 남은 여유 시간에 우선순위가 높은 블록부터 실행되며 이때 사용되는 우선순위는 시간적, 지역적 지역성을 동시에 고려하여 결정된다. 실험 결과 제안 기법은 기존 기법에 비해 전력소모가 낮고 응답시간이 향상되었음을 확인하였다.

비휘발성 메모리 소자응용을 위한 과잉 Bi 첨가에 따른 BLT 박막의 강유전 특성 (Ferroelectric Properties of Bi3.25La0.75 Ti3O12 Thin Films with Excess Bi Contents for Non-Volatile Memory Device Application)

  • 김경태;김창일;강동희;심일운
    • 한국전기전자재료학회논문지
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    • 제15권9호
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    • pp.764-769
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    • 2002
  • The effect of excess Bi contents on the ferroelectric properties of B $i_{3.25}$ L $a_{0.75}$ $Ti_3$ $O_{12}$ (BLT) thin films has been investigated. Bismuth lanthanum titanate thin films with excess Bi contents were prepared onto Pt/Ti/ $SiO_2$/Si substrate by metalorganic decomposition (MOD) technique. The structure and morphology of the films were analyzed using X-ray diffraction (XRD) and atomic force microscopy (AFM), respectively. From the XRD analysis, BLT thin films show polycrystalline structure and the layered-perovskite phase was obtained over 10% excess of Bi contents. As a result of ferroelectric characteristics related to the Bi content of the BLT thin film, the remanent polarization and dielectric constant decreased with increasing over Bi content of 10% excess. The BLT film with Bi content of 10% excess was measured to have a dielectric constant of 326 and dielectric loss of 0.024. The BLT thin films showed little polarization fatigue test up to 3.5$\times$10$^{9}$ bipolar switching cycling.