• Title/Summary/Keyword: Total trap density

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Studies on Relative Densities of Cockroach Populations in 7 Different Habitats by Using Sticky-Traps in Suwon (끈끈이 트랩(Trap)을 이용한 수원시내 바퀴 개체군의 서식처별 상대밀도 조사)

  • Myung-Soon Kim;Hyo-Sok Yu;Hung-Chul Kim
    • Korean journal of applied entomology
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    • v.34 no.4
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    • pp.391-405
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    • 1995
  • Cockroach survey on the relative density from 7 different habitats including hotel-ins, tea-rooms restaurants, hospitals, apartments, and resident hoses were conducted in 3 District(Ku) areas in Suwon city during the period of February through October, 1994. of a total of 3.039 trap sets, Cockroaches were collected from 1,435 traps, comprised of a 47.22% positive trap-rate. Chinese restaurants were shown to be the highest positive trap-rate of 72.67% of the total while the other habitats such as Korean restaurants, apartments, resident hoses, tea-rooms, hotel-inns, and hospitals were 60.67%, 58.61%, 52.22%, 38.67%, 24.88%, and 17.54%, respectively. Blattella germanica was shown to be the highest population density of 55.01 individuals/trap/week comprised of 97.36% of the total during survey period whereas the other 3 species, Periplaneta japonica, P. americana, and P. fuliginosa constituted in lesser extent of 2.35%, 0.14%, respectively. Of a total of 7 different cockroach breeding habitats, higher population density per trap/week was from restaurants with averages of 20.56 and 8.31 cockroaches from Chinese and Koran restaurants, respectively. An intermediate extent of density was observed from apartments, tea rooms and resident houses with 5.33, 3.79 and 3.53 individuals, respectively. Lower relative densities of cockroaches were observed from hospitals and hotel-inns with averages of 0.18 and 1.00 individuals per trap/week, respectively.

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Ink setting and back trap mottle

  • Kim, Byeong-Soo;Park, Jong-Ywal;Bousfield, Douglas W.
    • Proceedings of the Korea Technical Association of the Pulp and Paper Industry Conference
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    • 2003.04a
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    • pp.70-79
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    • 2003
  • Paper coating can give smoothness surface and good printability to uncoated paper. Macro roughness of base paper would be decreasing its groove and grit in view of side. Nevertheless its improving effect for paper, some kind of problem is showing in the fine coated paper. Especially, back trap mottle is one of serious problems in printing with fine coated paper. Printers can not adjust conditions to overcome the problem. Also large amounts of paper can be rejected. There are many factors that influence back trap mottle. However it is not clear what the important parameters are in back trap mottle. Back trap mottle has some relationship with ink setting but good guidelines are not clear. Back trap mottle has been linked to non-uniform ink setting. We do not know how much variation in setting we can tolerate. Other mottle issues such as micro-picking and ink refusal are still common. This paper was prepared to identify correlation with ink setting and delta ink density obtained from experiment and then tried to find out some relationships with ink setting and back trap mottle. Basically fine calcium carbonate and ciay was used for main components and coarse calcium carbonate was mixed in two fine pigments to change its porosity and ink acceptance. Micro ink tack force at KRK printing tester was adapted to measure ink setting rate. KRK units were used for back trap mottle simulation and two printed samples were prepared to check delta ink density. Clay base coating has more fast ink setting time than calcium carbonate's though smoothness of clay was better than calcium carbonate. It could be explained by that clay has finer pore in its coating than calcium carbonate. DID(delta ink density) has shown a good correlation with ink setting time from micro ink tack. The total pore volume of coating layer did not match with ink setting and DID. From the results we might conclude coating that has fine pore size around 0.05 ${\mu}m$ can be exposed to high possibility of back trap mottle.

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Effect of Sputtering Power on the Change of Total Interfacial Trap States of SiZnSnO Thin Film Transistor

  • Ko, Kyung-Min;Lee, Sang Yeol
    • Transactions on Electrical and Electronic Materials
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    • v.15 no.6
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    • pp.328-332
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    • 2014
  • Thin film transistors (TFTs) with an amorphous silicon zinc tin oxide (a-2SZTO) channel layer have been fabricated using an RF magnetron sputtering system. The effect of the change of excitation electron on the variation of the total interfacial trap states of a-2SZTO systems was investigated depending on sputtering power, since the interfacial state could be changed by changing sputtering power. It is well known that Si can effectively reduce the generation of the oxygen vacancies. However, The a-2SZTO systems of ZTO doped with 2 wt% Si could be degraded because the Si peripheral electron belonging to a p-orbital affects the amorphous zinc tin oxide (a-ZTO) TFTs of the s-orbital overlap structure. We fabricated amorphous 2 wt% Si-doped ZnSnO (a-2SZTO) TFTs using an RF magnetron sputtering system. The a-2SZTO TFTs show an improvement of the electrical property with increasing power. The a-2SZTO TFTs fabricated at a power of 30 W showed many of the total interfacial trap states. The a-2SZTO TFTs at a power of 30 W showed poor electrical property. However, at 50 W power, the total interfacial trap states showed improvement. In addition, the improved total interfacial states affected the thermal stress of a-2SZTO TFTs. Therefore, a-2SZTO TFTs fabricated at 50 W power showed a relatively small shift of threshold voltage. Similarly, the activation energy of a-2SZTO TFTs fabricated at 50 W power exhibits a relatively large falling rate (0.0475 eV/V) with a relatively high activation energy, which means that the a-2SZTO TFTs fabricated at 50 W power has a relatively lower trap density than other power cases. As a result, the electrical characteristics of a-2SZTO TFTs fabricated at a sputtering power of 50 W are enhanced. The TFTs fabricated by rf sputter should be carefully optimized to provide better stability for a-2SZTO in terms of the sputtering power, which is closely related to the interfacial trap states.

A Comparative Study of Gate Oxides Grown in $10%-N_2O$ and in Dry Oxygen on N-type 4H SiC

  • Cheong, Kuan-Yew;Bahng, Wook;Kim, Nam-Kyun
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2004.07a
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    • pp.17-19
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    • 2004
  • The electrical properties of gate oxides grown in two different processes, which are in 10% nitrous oxide($N_2O$) and in dry oxygen, have been experimentally investigated and compared. It has been observed that the $SiC-SiO_2$ interface-trap density(Dit) measured in nitrided gate oxide has been tremendously reduced, compared to the density obtained from gate oxide grown in dry oxygen. The beneficial effects of nitridation on gate oxides also have been demonstrated in the values of total near interface-trap density and of forward-bias breakdown field. The reasons of these improvements have been explained.

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Analysis of Trap Dependence on Charge Trapping Layer Thickness in SONOS Flash Memory Devices Based on Charge Retention Model (전하보유모델에 기초한 SONOS 플래시 메모리의 전하 저장층 두께에 따른 트랩 분석)

  • Song, Yu-min;Jeong, Junkyo;Sung, Jaeyoung;Lee, Ga-won
    • Journal of the Semiconductor & Display Technology
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    • v.18 no.4
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    • pp.134-137
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    • 2019
  • In this paper, the data retention characteristics were analyzed to find out the thickness effect on the trap energy distribution of silicon nitride in the silicon-oxide-nitride-oxide-silicon (SONOS) flash memory devices. The nitride films were prepared by low pressure chemical vapor deposition (LPCVD). The flat band voltage shift in the programmed device was measured at the elevated temperatures to observe the thermal excitation of electrons from the nitride traps in the retention mode. The trap energy distribution was extracted using the charge decay rates and the experimental results show that the portion of the shallow interface trap in the total nitride trap amount including interface and bulk trap increases as the nitride thickness decreases.

Estimating Population Density of Leopards in Semi-Arid habitat, Western India

  • Randeep Singh;Puneet Pandey;Qamar Qureshi;Kalyanasundaram Sankar;Paul R. Krausman;Surendra Prakash Goyal
    • Proceedings of the National Institute of Ecology of the Republic of Korea
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    • v.4 no.2
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    • pp.72-78
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    • 2023
  • The leopard (Panthera pardus) is one of the most widespread felids worldwide. Despite their wide distribution, reliable data on leopard population densities are still inadequate for conservation and management strategies in different landscapes. In the present study, we estimated leopard density using camera traps in the Ranthambhore Tiger Reserve (RTR), Rajasthan, India, between December 2010 and February 2011, where leopards coexist alongside a high density of tigers (Panthera tigris), a larger predator (RTR). A sampling effort of 4,450 trap days was made from 178 camera trapping stations over 75 days, resulting in 46 suitable photo captures (25 right flanks and 21 left flanks). In total, 18 individuals (7 males, 8 females, and 3 unknown sexes) were identified using the right flanks, and the estimated leopard density was 8.8 (standard error=2.8) individuals/100 km2. Leopard density appeared to respond to small prey (<50 kg weight) richness. As this is the first systematic study to provide baseline information on leopard density in RTR, it could form a baseline for comparison in future investigations.

Influence of Channel Thickness Variation on Temperature and Bias Induced Stress Instability of Amorphous SiInZnO Thin Film Transistors

  • Lee, Byeong Hyeon;Lee, Sang Yeol
    • Transactions on Electrical and Electronic Materials
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    • v.18 no.1
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    • pp.51-54
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    • 2017
  • TFTs (thin film transistors) were fabricated using a-SIZO (amorphous silicon-indium-zinc-oxide) channel by RF (radio frequency) magnetron sputtering at room temperature. We report the influence of various channel thickness on the electrical performances of a-SIZO TFTs and their stability, using TS (temperature stress) and NBTS (negative bias temperature stress). Channel thickness was controlled by changing the deposition time. As the channel thickness increased, the threshold voltage ($V_{TH}$) of a-SIZO changed to the negative direction, from 1.3 to -2.4 V. This is mainly due to the increase of carrier concentration. During TS and NBTS, the threshold voltage shift (${\Delta}V_{TH}$) increased steadily, with increasing channel thickness. These results can be explained by the total trap density ($N_T$) increase due to the increase of bulk trap density ($N_{Bulk}$) in a-SIZO channel layer.

Interface State Control of Amorphous InGaZnO Thin Film Transistor by Surface Treatment of Gate Insulator (게이트 절연막의 표면처리에 의한 비정질 인듐갈륨징크옥사이드 박막트랜지스터의 계면 상태 조절)

  • Kim, Bo-Sul;Kim, Do-Hyung;Lee, Sang-Yeol
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.24 no.9
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    • pp.693-696
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    • 2011
  • Recently, amorphous oxide semiconductors (AOSs) based thin-film transistors (TFTs) have received considerable attention for application in the next generation displays industry. The research trends of AOSs based TFTs investigation have focused on the high device performance. The electrical properties of the TFTs are influenced by trap density. In particular, the threshold voltage ($V_{th}$) and subthreshold swing (SS) essentially depend on the semiconductor/gate-insulator interface trap. In this article, we investigated the effects of Ar plasma-treated $SiO_2$ insulator on the interfacial property and the device performances of amorphous indium gallium zinc oxide (a-IGZO) TFTs. We report on the improvement in interfacial characteristics between a-IGZO channel layer and gate insulator depending on Ar power in plasma process, since the change of treatment power could result in different plasma damage on the interface.

Influence of Endurance tests on Space Charge Distribution of 160kV HVDC XLPE Cable

  • Liu, Yun-Peng;Liu, He-Chen
    • Journal of Electrical Engineering and Technology
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    • v.12 no.1
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    • pp.302-309
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    • 2017
  • The ageing of XLPE cable insulation will lead to the accelerating accumulation of space charge, which will greatly affect the safe operation of the HVDC cable. In order to investigate the influence of different ageing modes on the space charge distribution of the HVDC cable, thermal stressed, electrical stressed and electro-thermal stressed endurance tests were carried out on the XLPE peelings. The tested XLPE peelings were obtained from 160kV HVDC cable insulation. The endurance tests were carried at thermal stress of 363K, electrical stress of 20kV/mm DC and a combination of both. The Pulsed Electro-Acoustic (PEA) method was used to measure the space charge distribution of the samples. The influences of ageing on the trap energy distribution were analyzed based on the isothermal relaxation theory and the decay characteristics of the space charge. The results showed that thermal ageing would help to improve the crystalline morphologies of the XLPE at the early stage. The total amount of space charge decreased compared to the ones before thermal ageing. The long term of electrical stress would result in the cleavage of polymer molecule chains which would intensify the accumulation of space charge and increase the density and depth of electron traps. With a combination of electrical and thermal stress, the injection and migration of space charge were more significant. Besides, the depth and density of electron traps increased rapidly with the increase of endurance time.

Space Charge Behavior of Oil-Impregnated Paper Insulation Aging at AC-DC Combined Voltages

  • Li, Jian;Wang, Yan;Bao, Lianwei
    • Journal of Electrical Engineering and Technology
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    • v.9 no.2
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    • pp.635-642
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    • 2014
  • The space charge behaviors of oil-paper insulation affect the stability and security of oil-filled converter transformers of traditional and new energies. This paper presents the results of the electrical aging of oil-impregnated paper under AC-DC combined voltages by the pulsed electro-acoustic technique. Data mining and feature extractions were performed on the influence of electrical aging on charge dynamics based on the experiment results in the first stage. Characteristic parameters such as total charge injection and apparent charge mobility were calculated. The influences of electrical aging on the trap energy distribution of an oil-paper insulation system were analyzed and discussed. Longer electrical aging time would increase the depth and energy density of charge trap, which decelerates the apparent charge mobility and increases the probability of hot electron formation. This mechanism would accelerate damage to the cellulose and the formation of discharge channels, enhance the acceleration of the electric field distortion, and shorten insulation lifetime under AC-DC combined voltages.