• 제목/요약/키워드: TiAgN

검색결과 78건 처리시간 0.024초

4H-SiC기판 위의 자기구조화된 Ag/Ti 나노입자 제어를 위한 열처리 분석 (Annealing Effect on controlling Self-Organized Ag/Ti Nanoparticles on 4H-SiC Substrate)

  • 김소망;오종민;구상모
    • 전기전자학회논문지
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    • 제20권2호
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    • pp.177-180
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    • 2016
  • 본 연구에서는 4H-SiC(0001)기판 위에서 형성되는 나노구조화를 제어하기 위해 상지층과 하지층으로 구성된 이중층 금속을 증착하고 두께, 열처리 시간을 변화하였다. 또한 표면에너지와 응집현상의 상관관계를 분석하기 위해 SiC와는 다른 표면에너지를 갖는 Glass와 Si기판에도 같은 조건으로 실험하였다. FE-SEM을 통하여 금속이 나노구조화를 형성하는 두께가 Ag=20nm, Ti=2nm임을 확인 했으며 두께가 두꺼울 수록 나노 입자가 형성되지 않았다. 세기판의 표면에너지를 구하기 위해 접촉각 측정기를 통해 정접촉각법으로 측정하였다. 그 결과 표면에너지 값이 가장 높은 Glass(53.89 mN/m) 기판에서 나노 입자가 가장 고르게 분포된 형태를 보였으며 SiC(41.13 mN/m)에서 나노구조화 되는 양상을 보였고, Si(32.96 mN/m)에서는 NPs 형성이 되지 않았다. 표면에너지가 작을수록 나노 입자형성이 고르게 분포되는 현상을 Young equation으로 분석하였다.

Synthesis and characterization of noble metal coupled N-TiO2 nanoparticles

  • Lee, Kyusang;Moon, Jiyeon;Kim, Seonmin
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
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    • pp.374.2-374.2
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    • 2016
  • Volatile organic compounds (VOCs) in the atmosphere are harmful materials which influence indoor air environment and human health. Titanium dioxide ($TiO_2$) is photocatalyst extensively used in degradation of organic compound. To improve the photocatalytic activity in the visible light region, doping with non-metals element or loading noble metals on the surface of $TiO_2$ is generally proposed. In this study, N- doped $TiO_2$ having photocatalytic activity in visible light region was attached noble metal such as Pt, Ag, Pd, Au by coupling method. Catalytic activities of Noble metal coupled $N-TiO_2$ powders were evaluated by the improvement of their photocatalytic activities and the degradation of VOC gas. A UV-Vis spectrophotometer was used to measure the diffuse reflectance spectra of coupled $N-TiO_2$ sample. The photocatlytic activities of as prepared samples were characterized by the decoloration of aqueous MB solution under Xenon light source (UV and visible light). To measure of decomposition VOCs, ethylbenzene was selected for target VOC material and the concentration was monitored under UVLED irradiation in a closed chamber system. Adjusting the initial concentration of 10~12 ppm, to evaluate the removal characteristics by using the coupled $N-TiO_2$.

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cBN 지립과 Ag계 필러합금에서의 브레이징 특성 (The Brazing Characters of cBN Grit with Ag-based Filler Alloys)

  • 송민석;안상재;정기정
    • 대한용접접합학회:학술대회논문집
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    • 대한용접접합학회 2007년 추계학술발표대회 개요집
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    • pp.215-217
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    • 2007
  • 철계 피삭재 가공 시 적용되는 cBN(cubic Boron-Nitride)의 경우 열적/구조적 안정성으로 인해 융착 시 계면에서 화학적 결합이 어려워, 지립이 단일층으로 형성되어야 하는 융착 공구의 경우 적용되질 못하고 있다. 이러한 문제를 해결하기 위해 세라믹과의 젖음성이 우수한 Ti 성분이 포함된 67Ag+28Cu+5Ti(wt.%) 조성의 합금분말을 이용하여 cBN을 접합을 하였으며, 이때 융착조건은 진공 분위기($6{\times}10^{-6}$Torr), $900^{\circ}C$ 온도에서 5분간 유지하여 융착을 실시하였다. 본 연구의 주목적은 Ti 합금화 된 Ag계 합금분말 및 cBN의 융착 계면에서의 융착 계면거동해석을 통한 건전한 접합공정을 찾는데 있다. 이에 온도 $900^{\circ}C$, 유지시간 5분에서 건전한 융착층을 형성함을 알 수 있었다. 또한 결합력 측정기를 이용하여 결합력을 측정한 결과 diamond와 융착하였을 때가 123N, cBN을 융착하였을 때 107N으로써, cBN 융착이 diamond 융착의 87%정도의 결합력을 보임을 알 수 있었다. 한편 cBN과 Ag-Cu-Ti계 브레이징 필러의 계면에서의 미세조직 및 화학반응의 메커니즘은 SEM, EDS를 이용하여 분석하였다.

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Effect of Bottom Electrode on Resistive Switching Voltages in Ag-Based Electrochemical Metallization Memory Device

  • Kim, Sungjun;Cho, Seongjae;Park, Byung-Gook
    • JSTS:Journal of Semiconductor Technology and Science
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    • 제16권2호
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    • pp.147-152
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    • 2016
  • In this study, we fabricated Ag-based electrochemical metallization memory devices which is also called conductive-bridge random-access memory (CBRAM) in order to investigate the resistive switching behavior depending on the bottom electrode (BE). RRAM cells of two different layer configurations having $Ag/Si_3N_4/TiN$ and $Ag/Si_3N_4/p^+$ Si are studied for metal-insulator-metal (MIM) and metal-insulator-silicon (MIS) structures, respectively. Switching voltages including forming/set/reset are lower for MIM than for MIS structure. It is found that the workfunction different affects the performances.

Development of Eco-Friendly Ag Embedded Peroxo Titanium Complex Solution Based Thin Film and Electrical Behaviors of Res is tive Random Access Memory

  • Won Jin Kim;Jinho Lee;Ryun Na Kim;Donghee Lee;Woo-Byoung Kim
    • 한국재료학회지
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    • 제34권3호
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    • pp.152-162
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    • 2024
  • In this study, we introduce a novel TiN/Ag embedded TiO2/FTO resistive random-access memory (RRAM) device. This distinctive device was fabricated using an environmentally sustainable, solution-based thin film manufacturing process. Utilizing the peroxo titanium complex (PTC) method, we successfully incorporated Ag precursors into the device architecture, markedly enhancing its performance. This innovative approach effectively mitigates the random filament formation typically observed in RRAM devices, and leverages the seed effect to guide filament growth. As a result, the device demonstrates switching behavior at substantially reduced voltage and current levels, heralding a new era of low-power RRAM operation. The changes occurring within the insulator depending on Ag contents were confirmed by X-ray photoelectron spectroscopy (XPS) analysis. Additionally, we confirmed the correlation between Ag and oxygen vacancies (Vo). The current-voltage (I-V) curves obtained suggest that as the Ag content increases there is a change in the operating mechanism, from the space charge limited conduction (SCLC) model to ionic conduction mechanism. We propose a new filament model based on changes in filament configuration and the change in conduction mechanisms. Further, we propose a novel filament model that encapsulates this shift in conduction behavior. This model illustrates how introducing Ag alters the filament configuration within the device, leading to a more efficient and controlled resistive switching process.

고주파 마그네트론 스퍼터링에 의한 $SrTiO_3$ 캐패시터 박막의 온도 의존성 (Temperature Dependence of the $SrTiO_3$ Capacitor Thin Films Deposited by RF Magnetron Sputtering)

  • 오금곤;이우선;김남오;김재민;이병성;김상용
    • 대한전기학회논문지:전기물성ㆍ응용부문C
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    • 제48권6호
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    • pp.429-435
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    • 1999
  • The $SrTiO_3$ thin films were prepared on Ag/TiN-coated and p-type bare Si(100) substrates by r.f. magnetron sputtering deposition technique. The electrical properties of the deposited films were investigated, which controlling deposition parameters such as substrate temperature and film thickness. The electrical properties ofthe $SrTiO_3$ films were measured using the capacitance-voltage(C-V) technique. The thickness dependence of the electrical properties of the $SrTiO_3$ films was analyzed of the connection with the films in series. The substrate affected the crystal structure and texture characteristics of the $SrTiO_3$ films. The resistivity of the film, sandwiched between Al and Ag films was measured, as a function of the temperature.

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Influence of Silver Ions in HA Film on Morphology of Macrophages

  • Feng, Q.L.;Kim, T.N.;Kim, J.W.
    • 한국진공학회지
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    • 제7권s1호
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    • pp.50-56
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    • 1998
  • Ion beam assisted deposition (IBAD) was successfully used to produce a dense and ultra-adherent Hydroxyapatite (HA) film on titanium alloy and alumina. Recently it is also proved that the HA coatings on alumina substrate treated with 20 ppm $AgNO_3$ had the structure of $(Ag, Ca)_10(PO_4)6(OH)_2$, which exhibited excellent antimicrobial effects. The present paper aims to morphlogically characterize the adhesion of macrophages on newly developed Ag-HA coated alumina and Ti6A14V substrates and to evaluate the biocompatibility of the coatings in vitro. It can be found that the cell number on alumina of the concentration of $AgNO_3$ in the treatment, the cell number on Ag-HA coatings decreased. Up to 20 ppm $AgNO_3$ by Ag-treatment, the morphological development of the cells on Ag-HA coating was similar to that of the cells on HA coating, suggesting the biotolerance of the Ag-HA coatings.

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AlN 세라믹스와 금속간 계면접합에 관한 연구 : I. AlN/Cu 및 AlN/W 활성금속브레이징 접합체의 잔류응력 해석 (A Study on the Interfacial Bonding in AlN Ceramics/Metals Joints: I. Residual Stress Analysis of AlN/Cu and AlN/W Joints Produced by Active-Metal Brazing)

  • 박성계;이승해;김지순;유희;염영진
    • 한국재료학회지
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    • 제9권10호
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    • pp.962-969
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    • 1999
  • Ag-Cu-Ti 삽입금속을 이용하여 제조된 AlN/Cu와 AlN/W 활성금속브레이징 접합체의 잔류응력을 유한요소법으로 탄성 및 탄소성 해석을 행하여 그 결과를 접합강도 측정 결과와 파단 거동 관찰 결과와 비교, 분석하였다. 최대 잔류 주응력의 크기는 AlN/W 접합체보다 모재간 열팽창계수 차이가 큰 AlN/Cu 접합체에서 더 크게 나타났으며, 접합계면에 인접한 AlN 세라믹스 자유표면에 인장 성분의 응력집중이 확인되었다. 모재와 삽입금속의 탄소성 변형을 모두 고려할 경우, AlN/Cu 접합체의 경우 연질의 삽입금속에 의해 최대 잔류 주응력이 감소하여 소성변형에 의한 응력완화 효과가 있음을 확인하였으나, 100$\mu\textrm{m}$ 이상으로 삽입금속 두께를 증가시키더라도 잔류 주응력의 크기는 더 이상 크게 감소하지 않았다. 측정된 최대 접합강도는 AlN/Cu와 AlN/W 접합체에서 각각 52 MPa와 108 MPa이었으며, 파단 형태는 AlN/Cu 접합체는 AlN 자유표면으로부터 AlN 내부로 큰 각도를 이루면 진행되는 돔형의 파단이, AlN/W 접합체에서는 접합계면의 삽입금속층을 따라 AlN 측에서 파단이 일어나는 형태를 보였다.

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와이어 쏘우용 Ag계 브레이징 필러를 이용한 cBN 계면 반응 분석 (Interfacial reaction of cBN in Ag-based Brazing Filler Metal by wiresaw)

  • 이장훈;채나현;임철호;박성원;이지환;송민석
    • 대한용접접합학회:학술대회논문집
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    • 대한용접접합학회 2007년 추계학술발표대회 개요집
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    • pp.248-250
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    • 2007
  • 이 연구는 cBN과 활성 Ag계 금속필러메탈을 이용하여 접합계면에서의 금속성분과 화합물, 탄화물의 거동을 분석하는데 있다. 진공 브레이징은 $900{\sim}1000^{\circ}C$에서 $25^{\circ}C$ 간격으로, 유지 시간은 각각 5, 10, 15, 20분으로 실시하였다. Ag-Cu-Ti을 사용하여 브레이징된 cBN은 $950{\sim}1000$도, 유지시간 10분 사이에서 각각 건전한 계면과 표면을 얻을 수 있었으며, 계면에서 Ti-rich상과 화합물이 확인되었다. 이상의 결과로 부터 화합물의 생성과 건전한 접합공정은 브레이징 온도와 시간이 좌우하며, N과 B, Ti의 함유량이 cBN의 브레이징 접합 특성의 중요변수로 생각되어진다. cBN과 Ag계 브레이징 필러의 계면에서의 미세조직 및 화학반응의 메커니즘은 DTA, SEM, EPMA, XRD를 이용하여 분석하였다.

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Effect of metal primers and tarnish treatment on bonding between dental alloys and veneer resin

  • Choo, Seung-Sik;Huh, Yoon-Hyuk;Cho, Lee-Ra;Park, Chan-Jin
    • The Journal of Advanced Prosthodontics
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    • 제7권5호
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    • pp.392-399
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    • 2015
  • PURPOSE. The aim of this study was to evaluate the effect of metal primers on the bonding of dental alloys and veneer resin. Polyvinylpyrrolidone solution's tarnish effect on bonding strength was also investigated. MATERIALS AND METHODS. Disk-shape metal specimens (diameter 8 mm, thickness 1.5 mm) were made from 3 kinds of alloy (Co-Cr, Ti and Au-Ag-Pd alloy) and divided into 4 groups per each alloy. Half specimens (n=12 per group) in tarnished group were immersed into polyvinylpyrrolidone solution for 24 hours. In Co-Cr and Ti-alloy, Alloy Primer (MDP + VBATDT) and MAC-Bond II (MAC-10) were applied, while Alloy Primer and V-Primer (VBATDT) were applied to Au-Ag-Pd alloys. After surface treatment, veneering composite resin were applied and shear bond strength test were conducted. RESULTS. Alloy Primer showed higher shear bond strength than MAC-Bond II in Co-Cr alloys and Au-Ag-Pd alloy (P<.05). However, in Ti alloy, there was no significant difference between Alloy Primer and MAC-Bond II. Tarnished Co-Cr and Au-Ag-Pd alloy surfaces presented significantly decreased shear bond strength. CONCLUSION. Combined use of MDP and VBATDT were effective in bonding of the resin to Co-Cr and Au-Ag-Pd alloy. Tarnish using polyvinylpyrrolidone solution negatively affected on the bonding of veneer resin to Co-Cr and Au-Ag-Pd alloys.