• 제목/요약/키워드: Solar wafer

검색결과 281건 처리시간 0.033초

실리콘 와이어 어레이 및 에너지 소자 응용 (Silicon wire array fabrication for energy device)

  • 김재현;백성호;김강필;우성호;류홍근
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2009년도 하계학술대회 논문집
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    • pp.440-440
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    • 2009
  • Semiconductor nanowires offer exciting possibilities as components of solar cells and have already found applications as active elements in organic, dye-sensitized, quantum-dot sensitized, liquid-junction, and inorganic solid-state devices. Among many semiconductors, silicon is by far the dominant material used for worldwide photovoltaic energy conversion and solar cell manufacture. For silicon wire to be used for solar device, well aligned wire arrays need to be fabricated vertically or horizontally. Macroscopic silicon wire arrays suitable for photovoltaic applications have been commonly grown by the vapor-liquid-solid (VLS) process using metal catalysts such as Au, Ni, Pt, Cu. In the case, the impurity issues inside wire originated from metal catalyst are inevitable, leading to lowering the efficiency of solar cell. To escape from the problem, the wires of purity of wafer are the best for high efficiency of photovoltaic device. The fabrication of wire arrays by the electrochemical etching of silicon wafer with photolithography can solve the contamination of metal catalyst. In this presentation, we introduce silicon wire arrays by electrochemical etching method and then fabrication methods of radial p-n junction wire array solar cell and the various merits compared with conventional silicon solar cells.

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절연막을 이용한 단면 표면조직화 결정질 실리콘 태양전지 (The Single-Side Textured Crystalline Silicon Solar Cell Using Dielectric Coating Layer)

  • 도겸선;박석기;명재민;유권종;송희은
    • 한국태양에너지학회:학술대회논문집
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    • 한국태양에너지학회 2011년도 추계학술발표대회 논문집
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    • pp.245-248
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    • 2011
  • Many researches have been carried out to improve light absorption in the crystalline silicon solar cell fabrication. The rear reflection is applied to increase the path length of light, resulting in the light absorption enhancement and thus the efficiency improvement mainly due to increase in short circuit current. In this paper, we manufactured the silicon solar cell using the mono crystalline silicon wafers with $156{\times}156mm^2$, 0.5~3.0 ${\Omega}{\cdot}cm$ of resistivity and p-type. After saw damage removal, the dielectric film ($SiN_x$)on the back surface was deposited, followed by surface texturing in the KOH solution. It resulted in single-side texturing wafer. Then the dielectric film was removed in the HF solution. The silicon wafers were doped with phosphorus by $POCl_3$ with the sheet resistance 50 ${\Omega}/{\Box}$ and then the silicon nitride was deposited on the front surface by the PECVD with 80nm thickness. The electrodes were formed by screen-printing with Ag and Al paste for front and back surface, respectively. The reflectance and transmittance for the single-sided and double-sided textured wafers were compared. The double-sided textured wafer showed higher reflectance and lower transmittance at the long wavelength region, compared to single-sided. The completed crystalline silicon solar cells with different back surface texture showed the conversion efficiency of 17.4% for the single sided and 17.3% for the double sided. The efficiency improvement with single-sided textured solar cell resulted from reflectance increase on back surface and light absorption enhancement.

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양면동시증착 열선-CVD를 이용한 a-Si:H/c-Si 이종접합 태양전지 제조 (Fabrication of a-Si:H/c-Si Hetero-Junction Solar Cells by Dual Hot Wire Chemical Vapor Deposition)

  • 정대영;송준용;김경민;이희덕;송진수;이정철
    • 한국재료학회지
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    • 제21권12호
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    • pp.666-672
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    • 2011
  • The a-Si:H/c-Si hetero-junction (HJ) solar cells have a variety of advantages in efficiency and fabrication processes. It has already demonstrated about 23% in R&D scale and more than 20% in commercial production. In order to further reduce the fabrication cost of HJ solar cells, fabrication processes should be simplified more than conventional methods which accompany separate processes of front and rear sides of the cells. In this study, we propose a simultaneous deposition of intrinsic thin a-Si:H layers on both sides of a wafer by dual hot wire CVD (HWVCD). In this system, wafers are located between tantalum wires, and a-Si:H layers are simultaneously deposited on both sides of the wafer. By using this scheme, we can reduce the process steps and time and improve the efficiency of HJ solar cells by removing surface contamination of the wafers. We achieved about 16% efficiency in HJ solar cells incorporating intrinsic a-Si:H buffers by dual HWCVD and p/n layers by PECVD.

산화물구리 기반 이종접합형 태양전지의 후열처리효과 (Effect of Post-annealing Treatment on Copper Oxide based Heterojunction Solar Cells)

  • 김상모;정유섭;김경환
    • 반도체디스플레이기술학회지
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    • 제19권2호
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    • pp.55-59
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    • 2020
  • Copper Oxide (CuO) films were deposited on the n-type silicon wafer by rf magnetron sputtering for heterojunction solar cells. And then the samples were treated as a function of the annealing temperature (300-600℃) in a vacuum. Their electrical, optical and structural properties of the fabricated heterojunction solar cells were then investigated and the power conversion efficiencies (PCE) of the fabricated p-type copper oxide/n-type Si heterojunction cells were measured using solar simulator. After being treated at temperature of 500℃, the solar cells with CuO film have PCE of 0.43%, Current density of 5.37mA/㎠, Fill Factor of 39.82%.

실리콘 태양전지용 Ag pastes 에서의 무연 프릿에 따른 Ag, Si간 접촉 형성 (Contact Formation Between Ag and Si With Lead-Free Frits in Ag Pastes For Si Solar Cells)

  • 김동선;황성진;김종우;이정기;김형순
    • 한국신재생에너지학회:학술대회논문집
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    • 한국신재생에너지학회 2010년도 춘계학술대회 초록집
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    • pp.61.2-61.2
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    • 2010
  • Ag thick-film has usually been used for the front electrode of Si solar cells with the outstanding electrical properties. Ag paste consists of Ag powers, vehicles, frits and additives. Ag paste has broadly been screen-printed on the front side of Si wafer with the merits of low cost and simplicity. The optimal contact formation between Ag electrodes and Si wafer in the front electrode during a fast firing has been considered as the key factor for high efficiency. Although the content of frit in Ag pastes is less than 5wt%, it can profoundly influence the contact formation between Ag and Si under the fast firing. In this study, the effects of lead-free frits on the contacts between Ag and Si were studied with the thermal properties and compositions of various frits. Our experimental results showed that the electrical properties of cells were related to the interface structures between Ag and Si. It was found that current path of electrons from Si to Ag would be possible through the tunneling mechanism assisted by tens of nano-Ag recrystals on $n^+$ emitter as well as Ag recrystals penetrated into $n^+$ emitter layers. These preliminary studies will be helpful for designing the proper frits for the Ag pastes with considering the properties of various Si wafers.

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고효율 태양전지 제작을 위한 레이저 텍스쳐링 연구 (Study on laser texturing process for fabrication of high efficiency solar cell)

  • 고지수;정한욱;공대영;이원백;김광열;신성욱;박홍진;최병덕
    • 한국신재생에너지학회:학술대회논문집
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    • 한국신재생에너지학회 2009년도 춘계학술대회 논문집
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    • pp.143-146
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    • 2009
  • One of the most important issues of crystalline silicon solar cell is minimizing reflectance at the surface. Laser texturing is an isotropic process that will sculpt the surface of a silicon wafer, regardless of its crystallographic orientation. We investigated surface texturing process using Nd-YAG laser ($\lambda$=1064 nm) on multi-crystalline silicon wafer. Removal of slag formed after the laser process was performed using acid solution (HF : $HNO_3$ : $CH_3COOH$ : DI water). The reflectance and carrier lifetime of the samples were measured and analyzed using UV-Vis spectrophotometer and carrier lifetime tester. It was found that the minimum reflectance of the samples was 16.39% and maximum carrier life time was $21.8\;{\mu}s$.

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POCl3를 사용한 pn접합 소자에 관한 연구 (Study on the pn Junction Device Using the POCl3 Precursor)

  • 오데레사
    • 한국진공학회지
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    • 제19권5호
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    • pp.391-396
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    • 2010
  • 실리콘 태양전지의 pn 접합 계면특성을 조사하기 위해서 p형 실리콘 기판 위에 전기로를 이용한 $POCl_3$ 공정을 통하여 n형의 불순물을 주입하여 pn 접합을 만들었다. n형 불순물의 확산되어 들어가는 공정시간이 길고 공정온도가 높을수록 면저항은 줄어들었다. n형 불순물의 주입이 많아질수록 pn 접합 계면에서의 전자친화도가 줄어들면서 면저항은 감소되었다. 면저항이 줄어든 이유는 pn 접합계면에서 전자홀쌍이 생성되면서 이동길이가 길어지고 재결합률이 감소하였기 때문이다. n형의 불순물 확산공정시간이 긴 태양전지 셀에서 F.F. 계수가 높게 나타났으며, 효율도 높게 나타났다.

다결정 실리콘 태양전지의 표면 텍스쳐링 및 반사방지막의 영향 (Surface Texturing and Anti-Reflection Coating of Multi-crystalline Silicon Solar Cell)

  • 전성욱;임경묵;최석환;홍영명;조경목
    • 한국표면공학회지
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    • 제40권3호
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    • pp.138-143
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    • 2007
  • The effects of texturing and anti-reflection coating on the reflection properties of multi-crystalline silicon solar cell have been investigated. The chemical solutions of alkaline and acidic etching solutions were used for texturing at the surface of multi-crystalline Si wafer. Experiments were performed with various temperature and time conditions in order to determine the optimized etching condition. Alkaline etching solution was found inadequate to the texturing of multi-crystalline Si due to its high reflectance of about 25%. The reflectance of Si wafer texturing with acidic etching solution showed a very low reflectance about 10%, which was attributed to the formation of homogeneous. Also, deposition of ITO anti-reflection coating reduced the reflectance of multi-crystalline si etched with acidic solution($HF+HNO_3$) to 2.6%.

박판 웨이퍼의 적재 시 손상 최소화 기술 (Technology of Minimized Damage during Loading of a Thin Wafer)

  • 이종항
    • 한국산학기술학회논문지
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    • 제22권1호
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    • pp.321-326
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    • 2021
  • 본 연구는 웨이퍼를 적재할 때 웨이퍼의 손상을 최소화 시키기 위한 기술이다. 반도체와 솔라셀에 이용되는 두께가 얇은 웨이퍼는 적재된 웨이퍼 사이의 표면 장력에 의해 웨이퍼의 분리를 어렵게 만들어 웨이퍼의 표면에 손상을 줄 수 있다. 이러한 웨이퍼의 손상을 최소화시키는 기술은 압축 공기를 웨이퍼 쪽으로 분사하고, 미소의 수평 이동 기구를 동시에 적용하는 것이다. 연구에 사용된 주요 실험 인자는 웨이퍼의 공급 속도, 압축 공기의 노즐 압력, 그리고 흡착 헤드의 흡착 시간이다. 실험 결과, 동일한 노즐 압력에서 웨이퍼의 공급 속도가 빠를수록 파손율이 증가하고, 동일한 공급 속도에서는 노즐 압력이 낮을수록 파손율이 증가한다. 그리고, 웨이퍼를 흡착시키데 필요한 시간은 어느 수준 이상이면 웨이퍼의 공급 속도에 따른 파손율에는 큰 영향을 미치지 않는다. 본 연구의 실험 범위 안에서 최적의 실험 조건은 웨이퍼의 공급 속도 600 ea/hr, 압축 공기의 노즐 압력 0.55 MPa, 흡착 헤드의 흡착 시간 0.9 sec 이다. 또한, 반복성능 실험을 통해 개선된 기술은 웨이퍼의 파손율을 최소화시킬 수 있음을 보여 주었다.

Interface Structures of Ag-Si Contacts with Thermal Properties of Frits in Ag Pastes

  • Choi, Seung-Gon;Kim, Dong-Sun;Lee, Jung-Ki;Kim, Hyung-Sun
    • 한국재료학회지
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    • 제22권8호
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    • pp.390-396
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    • 2012
  • Ag pastes added to Bi-oxide frits have been applied to the electrode material of Si solar cells. It has been reported that frits induce contacts between the Ag electrodes and the Si wafer after firing. During firing, the control of interfaces among Ag, the glass layer, and Si is one of the key factors for improving cell performance. Specifically, the thermo-physical properties of frits considerably influence Ag-Si contact. Therefore, the thermal properties of frits should be carefully controlled to enhance the efficiency of cells. In this study, the interface structures among Ag electrodes, glass layers, and recrystallites on an $n^+$ emitter were carefully analyzed with the thermal properties of lead-free frits. First, a cross-section of the area between the Ag electrodes and the Si wafer was studied in order to understand the interface structures in light of the thermal properties of the frits. The depth and area of the pits formed in the Si wafer were quantitatively calculated with the thermal properties of frits. The area of the glass layers between the Ag electrodes and Si, and the distribution of recrystallites on the $n^+$ emitter, were measured from a macroscopic point of view with the characteristics of the frits. Our studies suggest that the thermophysical properties should be controlled for the optimal performance of Si solar cells; our studies also show why cell performance deteriorated due to the high viscosity of frits in Ag pastes.