• 대한전기학회:학술대회논문집
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• 대한전기학회 2005년도 제36회 하계학술대회 논문집 C
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• pp.1927-1929
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• 2005

Colloidal Silica(CS)/methyltrimethoxy silane(MTMS) sol solutions were prepared in variation with synthesizing parameters such as kinds of CS, acidity and reaction time. In order to understand its surface properties, sol-gel coating films on glass were fabricated. The coating film obtained from CS/MTMS sol had stable contact angle and more enhanced flat surface at reaction time of 24 hours. In case of the initial and final period of reaction, the coating films had unstable contact angle and more rough surface. In addition, surface of CS/MTMS sol-gel coating film was more rougher with increasing of acidity.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2005년도 하계학술대회 논문집 Vol.6
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• pp.113-114
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• 2005

Sufficient removal rate with adequate selectivity to realize the pattern mask of tetra-ethyl ortho-silicate (TEOS) film for the vertical sidewall angle were obtained by chemical mechanical polishing (CMP) with commercial silica slurry as a function of pH variation. The changes of X-ray diffraction pattern and dielectric constant by CMP process were negligible.

• 한국재료학회:학술대회논문집
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• 한국재료학회 2007년도 추계학술발표대회 및
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• pp.148.2-148.2
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• 2007

• 한국세라믹학회:학술대회논문집
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• 한국세라믹학회 2003년도 추계총회 및 연구발표회 초록집
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• pp.150.2-150
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• 2003

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2008년도 추계학술대회 논문집 Vol.21
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• pp.228-228
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• 2008

본 논문에서는 epoxy bonding film의 phenoxy resin의 함량변화에 따른 특성 변화에 대하여 연구하였다. epoxy bonding film은 미세패턴 구현을 위해서 사용되는 기판재료로써 epoxy, hardener, silica, phenoxy resin 등이 첨가되어진다. phenoxy resin 함량을 변화를 주면서 tape casting 방법을 통해서 flim 형성을 한 후, 제작된 film의 phenoxy resin 함량변화에 따른 조도 특성의 연구를 위해서 sweller, desmear 공정을 후 RA(Roughness Average)를 측정하고, SEM으로 표면을 관찰하였다. 또한 제작된 bonding film을 가열 가압 후 구리 도금공정을 거쳐 peel strength를 측정하였다. phenoxy resin 함량이 증가 할수록 RA가 증가되어지는 것이 관찰되어졌고, 또 한 peel strength 증가하였다.

• Tribology and Lubricants
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• 제24권5호
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• pp.255-263
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• 2008

Adhesion tests were conducted to investigate the adhesion characteristics between mold and thermoplastic polymer film. Coating of anti-sticking layer (ASL), a kind of polymer material, imprint pressure, and separation velocity were considered as the process conditions. A piece of fused silica without patterns on its surface was used as a mold and the thermoplastic polymer films were made on Si substrate by spin-coating the commercial polymer solution such as mr-I PMMA and mr-I 7020. The ASL was derived from (1H, 1H, 2H, 2H - perfluorooctyl) trichlorosilane($F_{13}$-OTS) and coated on the fused silica mold in vapor phase. The pull-off force was measured in various process conditions and the surfaces of the mold and the polymer film were observed after separation. It was found that the adhesion characteristics between the mold and the thermoplastic polymer film and the release performance of ASL were changed according to the process conditions. The ASL was effective to reduce the pull-off force and the damage of polymer film. In cases of the mold coated with ASL, the pull-off force did not depend on imprint pressure and separation velocity.

• 한국전기전자재료학회논문지
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• 제17권12호
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• pp.1296-1300
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• 2004

SnO$_2$ is one of the most suitable gas sensor materials. The microstructure and surface morphology of films must be controlled because the electrical and optical properties of SnO$_2$ films depend on these characteristics. The effects of chemical mechanical polishing(CMP) on the variation of morphology of SnO$_2$ films prepared by RF sputtering system were investigated. The commercially developed ceria-based oxide slurry, silica-based oxide slurry, and alumina-based tungsten slurry were used as CMP slurry. Non-uniformities of all slurries met stability standards of less than 5 %. Silica slurry had the highest removal rate among three different slurries, sufficient thin film topographies and suitable root mean square(RMS) values.

• 대한전기학회:학술대회논문집
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• 대한전기학회 2006년도 제37회 하계학술대회 논문집 C
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• pp.1450-1451
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• 2006

In this paper, we first applied the chemical mechanical polishing (CMP) process to the planarization of ferroelectric film in order to obtain a good planarity of electrode/ferroelectric film interface. $Bi_{3.25}La_{0.75}Ti_{3}O_{12}$ (BLT) ferroelectric fan was fabricated by the sol-gel method. Removal rate and non-uniformity (WIWNU%) were examined by change of silica slurries pH(10.3, 11.3, 12.3). Surface roughness of BLT thin films before and after CMP process was inquired into by atomic force microscopy (AFM). Effects of silica slurries pH(10.3, 11.3, 12.3) were investigated on the CMP performance of BLT film by the surface analysis of X-ray photoelectron spectroscopy(XPS).

• 폴리머
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• 제31권2호
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• pp.111-116
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• 2007

폴리우레탄 변형 아크릴레이트(PUA)/실리카 하이브리드 필름은 자외선 경화에 의해 제조되었고, 필름의 표면물성은 경도시험과 접착력 테스트를 통해 분석되었다. 이들 필름은 유기, 무기함량을 mole비로 조성하여 실험하였으며, 무기조성은 실리카 입자의 함량을 기준으로 설정하였다. 필름 층 내의 실리카 입자는 함량에 따라 혹은 분산정도에 따라 내스크래치성이나 필름자체 경도 등의 물성이 많은 차이를 보였는데, 이는 PUA필름 층 내의 실리카 입자들이 균일하게 분포되어 가교결합되어 있었기 때문이다.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
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• pp.218-218
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• 2013

We report a simple and cost-effective method to fabricate transparent superhydrophobic surface on various substrates. The surface was fabricated by coating hydrophobic PDMS (polydimethylsiloxane) film on the silica nanoparticle and subsequent fixing of the hydrophobic silica nanoparticles onto substrates. The water contact angle for the prepared surface was determined to be over $150^{\circ}$, whichindicates that the surface is highly repellent to water. The hierarchical structure and roughness of the surface were examined by scanning electron microscopy (SEM) and atomic force microscopy (AFM). Additionally, transparency of the prepared surface was measured with UV-VIS spectrometer. The transmittance of the superhydrophobic surface was ~80%, which is lower than that without PDMS-coated silica by only 5 to 10%. It is also notable that the superhydrophobic surface fully recovers its original transmittance after self-cleaning process. Also the PDMS coating is stable under a wide range of pH conditions, UV radiation and salinity conditions, which is essential for the practical use. Moreover, our fabrication method is applicable in large scale production.