• 한국정보디스플레이학회:학술대회논문집
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• 2009.10a
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• pp.272-275
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• 2009

A new green phosphor, ($Mg_{1-x-yZnx)$)$Al_2O_4:Mn^{2+}{_y}$ (0 x 0.6, 0.001 y 0.01), was synthesized by a flux-assisted solid reaction and its vacuum ultraviolet (VUV) excitation and emission characteristics were examined in this study. The chromaticity and peak intensity of the $(Mg_{0.79}Zn_{0.2})Al_2O_4:Mn^{2+}{_{0.01}}$ (x = 0.177, y = 0.745) phosphor were found to be more desirable than that of $Zn_2SiO_4:Mn^{2+}$ (x = 0.216, y = 0.72) phosphor as a green primary color.

• Proceedings of the KIEE Conference
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• 2006.07c
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• pp.1414-1415
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• 2006

Air-gap type film bulk acoustic wave resonator device using ZnO for piezoelectric layer and sacrifice layer, deposited by RF magnetron sputter with various conditions, fabricated in this study. Also, membrane$(SiO_2)$ and top and bottom electrode(both Al) of piezoelectric layer deposited by RF magnetron sputter. Using micro electro mechanical systems(MEMS) technique, sacrifice layer removed and then air-gap formed. The results of each process checked by XRD, AFM, SEM to obtain good quality device.

• Journal of the Korean Magnetics Society
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• v.5 no.5
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• pp.610-613
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• 1995

The effect of processing parameters such as milling, additives and sintering atmoshpere on the magnetic properties of Mn-Zn ferrite was investigated. The experiment was followed by general ceramic fabrication process and added additives were $CaCO_{3}$, $SiO_{2}$, $V_{2}O_{5}$, $ZrO_{2}$, and $Nb_{2}O_{5}$. The effects of additives could be divided into three categories which were formation ofliquid phase, substitution in lattice and inducing stress. Core loss smong the magnetic properties was dependent mainly on the additives and also correlated with processing parameters. As a result, an optimum condition of preparing process for a high quality Mn-Zn ferrite was suggested by controlling the correlation of each processing parameters.

• Transactions on Electrical and Electronic Materials
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• v.12 no.2
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• pp.60-63
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• 2011

We investigated the etching characteristics of zinc oxide (ZnO) and the effect of additive gases in a $Cl_2$-based inductively coupled plasma. The inert gases were argon, nitrogen, and helium. The maximum etch rates were 44.3, 39.9, and 37.9 nm/min for $Cl_2$(75%)/Ar(25%), $Cl_2$(50%)/$N_2$(50%), and $Cl_2$(75%)/He(25%) gas mixtures, 600 W radiofrequency power, 150 W bias power, and 2 Pa process pressure. We obtained the maximum etch rate by a combination of chemical reaction and physical bombardment. A volatile compound of Zn-Cl. achieved the chemical reaction on the surface of the ZnO thin films. The physical etching was performed by inert gas ion bombardment that broke the Zn-O bonds. The highly oriented (002) peak was determined on samples, and the (013) peak of $Zn_2SiO_4$ was observed in the ZnO thin film sample based on x-ray diffraction spectroscopy patterns. In addition, the sample of $Cl_2$/He chemistry showed a high full-width at half-maximum value. The root-mean-square roughness of ZnO thin films decreased to 1.33 nm from 5.88 nm at $Cl_2$(50%)/$N_2$(50%) plasma chemistry.

• Journal of Integrative Natural Science
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• v.9 no.4
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• pp.223-227
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• 2016

The Zn, Sn, and ZnSn thin films were deposited on Si(100) substrate using radio frequency (RF) magnetron co-sputtering method. A surface profiler and X-ray photoelectron spectroscopy (XPS) were used to investigate the Zn, Sn, and ZnSn thin films. Thickness of the thin films was measured by a surface profiler. The deposition rates of pure Zn and Sn thin films were calculated with thickness and sputtering time for optimization. From the survey XPS spectra, we could conclude that the thin films were successfully deposited on Si(100) substrate. The chemical environment of the Zn and Sn was monitored with high resolution XPS spectra in the binding energy regions of Zn 2p, Sn 3d, O 1s, and C 1s.

• Proceedings of the Korean Vacuum Society Conference
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• 2013.02a
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• pp.497-497
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• 2013

Semiconducting amorphous InGaZnO (a-IGZO) has attracted significant research attention as improved deposition techniques have made it possible to make high-quality a-IGZO thin films. IGZO thin films have several advantages over thin film transistors (TFTs) based on other semiconducting channel layers.The electron mobility in IGZO devices is relatively high, exceeding amorphous Si (a-Si) by a factor of 10 and most organic devices by a factor of $10^2$. Moreover, in contrast to other amorphous semiconductors, highly conducting degenerate states can be obtained with IGZO through doping, yet such a state cannot be produced with a-Si. IGZO thin films are capable of mobilities greaterthan 10 $cm^2$/Vs (higher than a-Si:H), and are transparent at visible wavelengths. For oxide semiconductors, carrier concentrations can be controlled through oxygen vacancy concentration. Hence, adjusting the oxygen partial pressure during deposition and post-deposition processing provides an effective method of controlling oxygen concentration. In this study, we deposited IGZO thinfilms at optimized conditions and then analyzed the film's electrical properties, surface morphology, and crystal structure. Then, we explored how to generate IGZO thin films using DC magnetron sputtering. We also describe the construction and characteristics of a bottom-gate-type TFT, including the output and transfer curves and bias stress instability mechanism.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.25 no.8
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• pp.580-583
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• 2012

The dependency of processing pressure on the electrical performances in amorphous silicon-zinc-tin-oxide thin film transistors (SZTO-TFT) has been investigated. The SZTO channel layers were deposited by using radio frequency (RF) magnetron sputtering method with different partial pressure. The field effect mobility (${\mu}_{FE}$) increased and threshold voltage ($V_{th}$) shifted to negative direction with increasing pressure during deposition processing. As a result, oxygen vacancies generated in SZTO channel layer with increasing partial pressure resulted in negative shift in $V_{th}$ and increase in on-current.

• Journal of the Korean Vacuum Society
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• v.19 no.2
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• pp.128-133
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• 2010

ZnO:Al films were deposited by DC-pulsed magnetron sputtering using a two-step process involving the control of the oxygen pressure. The seed layers were prepared with various Ar to oxygen flow ratios and the bulk layers were deposited under pure Ar. As the oxygen pressure during the deposition of the seed layer increased, the crystallinity and degree of (002) texturing increased. The resistivity gradually decreased with increasing crystallinity from $4.7\times10^4\Omega{\cdot}cm$ (no seed) to $3.7\times10^4\Omega{\cdot}cm$ (Ar/$O_2$ = 9/1). The etched surface showed a crater-like structure and an abrupt morphology change appeared as the crystallinity was increased. The sample deposited at an Ar/$O_2$ flow ratio of 9/1 showed a very high haze value of 88% at 500 nm, which was explained by the large feature size of the craters, as shown in the AFM image.

• Transactions on Electrical and Electronic Materials
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• v.18 no.1
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• pp.13-15
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• 2017

Low emissivity glass for high transparency in the visible range and low emissivity in the IR (infrared) range was fabricated and investigated. The multilayers were have been fabricated, and consisted of two outer oxide layers and a middle layer of Ag as a metal layer. Oxide layers were formed by rf sputtering and metal layers were formed using by an evaporator at room temperature. SiInZnO (SIZO) film was used as an oxide layer. The OMO (oxide-metaloxide) structures of SIZO/Ag/SIZO were analyzed by using transmittance, AFM (atomic force microscopye), and XRD (X-ray diffraction). The OMO multilayer structure was designed to investigate the effect of Ag layer thickness on the optical property of the OMO structure.

• Journal of Environmental Science International
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• v.15 no.6
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• pp.579-586
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• 2006

The purposes of this paper were to monitor the temperature rising courses and spark discharge of the modified granular activated carbon (GAC) by microwave (MW) irradiation and to evaluate absorption of benzene. The GAC coated on $SiO_2$, boron, talc, ferrite was named as the modified GAC. Thermal and spark discharge measurement of virgin GAC and modifed GAC has been carried out using a MW device operating at 2450 MHz under various energy conditions. The results of this paper as follows. First, the modified GAC is more efficient than the virgin GAC in temperature control. Temperature gradient of the modified GAC is more lower than that of virgin GAC. The temperature gradient of GAC was observed in the following order : virgin GAC, Mn-Zn ferrite/GAC, Ni-Zn ferrite,/GAC, $SiO_2/GAC$, Boron/GAC, Talc/GAC. Second, the spark discharge of the modified GAC was diminished, compared with that of virgin GAC. Because of its excellent electrical insulating properties, the coating material prevents the spark discharge. Finally, the benzene adsorption capacity of the modified GAC decreased due to diminishing of adsorption site by the coating material. Considering the temperature gradient and spark discharge of GAC, the GAC coated $SiO_2$ would be appropriate absorbent under irradiation of MW.