Journal of Integrative Natural Science (통합자연과학논문집)

The Basic Science Institute Chosun University (조선대학교 기초과학연구원)
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Fabrication of ZnSn Thin Films Obtained by RF co-sputtering

  • Lee, Seokhee (Department of Chemistry, Pukyong National University) ;
  • Park, Juyun (Department of Chemistry, Pukyong National University) ;
  • Kang, Yujin (Department of Chemistry, Pukyong National University) ;
  • Choi, Ahrom (Department of Chemistry, Pukyong National University) ;
  • Choi, Jinhee (Department of Chemistry, Pukyong National University) ;
  • Kang, Yong-Cheol (Department of Chemistry, Pukyong National University)
  • Received : 2016.08.20
  • Accepted : 2016.12.25
  • Published : 2016.12.31
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Abstract

The Zn, Sn, and ZnSn thin films were deposited on Si(100) substrate using radio frequency (RF) magnetron co-sputtering method. A surface profiler and X-ray photoelectron spectroscopy (XPS) were used to investigate the Zn, Sn, and ZnSn thin films. Thickness of the thin films was measured by a surface profiler. The deposition rates of pure Zn and Sn thin films were calculated with thickness and sputtering time for optimization. From the survey XPS spectra, we could conclude that the thin films were successfully deposited on Si(100) substrate. The chemical environment of the Zn and Sn was monitored with high resolution XPS spectra in the binding energy regions of Zn 2p, Sn 3d, O 1s, and C 1s.

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References

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