• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.18 no.3
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• pp.276-283
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• 2005

Magnetic tunneling transistor (MTT) device using the amorphous n-type Si semiconductor film for base and collector consisting of the [CoFe/NiFe](free layer) and Si(top layer) multilayers was used to study the spin-dependent hot electron magnetocurrent (MC) and tunneling magnetoresistance (TMR) at room temperature. A large MC of 40.2 % was observed at the emitter-base bias voltage ( $V_{EB}$ ) of 0.62 V. The increasing emitter hot current and transfer ratio ( $I_{C}$/ $I_{E}$) as $V_{EB}$ are mainly due to a rapid increase of the number of conduction band states in the Si collector. However, above the $V_{EB}$ of 0.62 V, the rapid decrease of MC was observed in amorphous Si-based MTT because of hot electron spin-dependent elastic scattering across CoFe/Si interfaces.

• Journal of Magnetics
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• v.6 no.4
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• pp.126-128
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• 2001

The effect of rapid thermal anneal (RTA) has been investigated on the properties of an FeMn exchange-biased magnetic tunnel junction (MTJ) using magnetoresistance and I-V measurements and transmission electron microscopy (TEM). The tunneling magnetoresistance (TMR) in an as-grown MTJ is found to be ∼27%, while the TMR in MTJs annealed by RTA increases with annealing temperature up to 300$\^{C}$, reaching ∼46%. A TEM image reveals a structural change in the interface of A1$_2$O$_3$layer for the MTJ annealed by RTA at 300$\^{C}$. The oxide barrier parameters are found to vary abruptly with annealing time within a few ten seconds. Our results demonstrate that the present RTA enhances the magnetoresistive properties of MTJs.

• Journal of the Korean Magnetics Society
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• v.25 no.2
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• pp.47-51
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• 2015

To achieve a high tunneling magneto resistance (TMR) of sputtered magnetic tunnel junctions (MTJs) with an MgO barrier, the annealing process is indispensable. The structural and compositional changes as consequences of the annealing greatly affect the spin-dependent transport properties of MTJs. Higher TMR could be obtained for MTJs annealed at higher annealing temperature. The diffusion of Ru, Mn and/or Ta in the MTJs may occur during annealing process, which is known to be detrimental to spin-dependent tunneling effect. The rapid thermal annealing (RTA) process was used for annealing the MTJs with synthetic antiferromagnets. To suppress the diffusion of Mn, Ru and/or Ta in the MTJs, the process time and temperature of RTA were minutely controlled.

• Tunnel and Underground Space
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• v.16 no.3 s.62
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• pp.209-217
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• 2006

Literatures on the fracture mechanics and damaged zone of rocks were studied to estimate the excavation and blasting damaged zone for rapid tunneling. Fracture mechanics were applied to explain fracture mechanism and to estimate damaged zone and seemed to be applicable for controlling the fractures.

• Convergence Security Journal
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• v.15 no.4
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• pp.107-112
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• 2015

Due to the rapid development of wireless communication technology, foundation system of military communication that is based on the daily use technology has been changed in to wireless system. However, military communication contains clssified information, and it is expected to have increase amount of enemy's there in such a imperfect security system. The next generation of tactical network communication system is expected to adopt All IP based wireless system. This research studies expected threatening factor on the wireless environment, and find the appropriate tunneling techniques.

• Proceedings of the Korean Vacuum Society Conference
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• 2010.02a
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• pp.13-13
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• 2010

Switching an elementary excitation by injecting a single carrier would offer the exciting opportunity for the ultra-high data storage technologies. However, there has been no methodology available to investigate the interaction of low energy discrete carriers with nano-structures. In order to map out the spatial dependency of such single carrier level interactions, we developed a pulse-and-probe algorithm, combining with low temperature scanning tunneling microscopy. The new tool, which we call single carrier spectroscopy, allows us to track the interaction with the target macrostructure with tunneling carriers on a single carrier basis. Using this tool, we demonstrate that it is possible not only to locally write and erase individual bi-solitons, reliably and reversibly, but also to track of creation yields of single and multiple bi-solitons. Bi-solitons are pairs of solitons that are elementary out-of-phase excitations on anti-ferromagnetically ordered pseudo-spin system of Si dimers on Si(001)-c(42) surfaces. We found that at low energy tunneling the single bisoliton creation mechanism is not correlated with the number of carriers tunneling, but with the production of a potential hole under the tip. An electric field at the surface determines the density of the local charge density under the tip, and band-bending. However a rapid, dynamic change of a field produces a potential hole that can be filled by energetic carriers, and the amount of energy released during filling process is responsible for the creation of bi-solitons. Our model based on the field-induced local hole gives excellent explanation for bi-soliton yield behaviors. Scanning tunneling spectroscopy data supports the existence of such a potential hole. The mechanism also explains the site-dependency of bi-soliton yields, which is highest at the trough, not on the dimer rows. Our study demonstrates that we can manipulate not just single atoms and molecules, but also single pseudo-spin excitations as well.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.17 no.1
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• pp.21-26
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• 2004

Ultra-thin silicon dioxides were grown on p-type(100) oriented silicon employing rapid thermal dry oxidation technique at the temperature range of 850∼1050 $^{\circ}C$. The growth rate of the ultra-thin film was fitted well with tile model which was proposed recently by da Silva ＆ Stosic. The capacitance-voltage, current-voltage, characteristics were used to study the electrical properties of these thin oxides. The minimum interface state density around the midgap of the MOS capacitor having oxide thickness of 111.6 $\AA$ derived from the C-V curve was ranged from 6 to 10${\times}$10$^{10}$ /$\textrm{cm}^2$eV.

• Journal of the Korean Institute of Telematics and Electronics
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• v.27 no.5
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• pp.709-715
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• 1990

SiO2 films were nitrided by tungsten-halogen heated rapid thermal annealing in ammonia gas at temperatures of 900-1100\ulcorner for 15-180sec. The nitroxide films were analyzed using Auger electron spectroscopy. MIS caapcitors were fabricated using these films as gate insulators. I-V and C-V characteristics of MIS capacitors were investigated. The AES depth profiles of nitroxide film show that the nitrogen rich layer is, at the early stage of nitridation, formed at the surface of nitroxide film and near the interface between nitroxide and silicon. Nitridation of SiO2 makes the film have a larger effective average refractive index. The thermal nitridation of SiO2 on silicon causes the flatband voltage shift due to the change of the fixed charge density. It is found that the dominant conduction mechanism in nitroxide is Fowler-Nordheim tunneling. Rapid thermal nitridation of 200\ulcornerSiO2 on silicon results in an improvement in the dielectric breakdown electric field.

• Journal of Welding and Joining
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• v.33 no.2
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• pp.14-17
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• 2015

Cleaning effect is well known mechanism of oxide layer removal in DCEP polarity. It is also known that DCEN has higher heat input efficiency than DCEP in GTAW process. Based on these two renowned arc theories, conventional variable polarity arc for aluminum welding was set up to have minimum DCEP and maximum DCEN duty ratio to achieve the highest heat input efficiency and weldability increase. However, recent several variable polarity GTA research papers reported unexpected result of proportional relationship between DCEP duty ratio and heat input. The authors also observed the same result then suggested combination of tunneling effect and random walk of cathode spot to fill up the gap between experiment and conventional arc theory. In this research, suggested combinational work of tunneling effect and rapid cathode spot changing is applied to another unexpected phenomena of variable polarity aluminum arc welding. From previous research, it is reported that wider oxide removal range, narrower bead width and shallower penetration depth are observed in thin oxide layered aluminum compared to the case of thick oxide. This result was reported for the first time and it was hard to explain the reason at that time therefore the inference by the authors was hardly acceptable. However, the suggested combinational theory successfully explains the result of the previous report in logical way.

• Journal of Korea Multimedia Society
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• v.8 no.2
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• pp.258-268
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• 2005

The efficient provision of multicast service to moving hosts in mobile computing environments is not so easy task. Bi-directional tunneling scheme causes overhead about encapsulation and triangular routing. On the other hand, remote subscription scheme need freDuent tree reconstruction, which is inefficient for rapid moving hosts. In this paper we propose Mobility Based Mobile Multicast(MBMOM) scheme which is based on host's mobility information. Ultimately MBMOM try to find the strong points of remote subscription scheme and hi-directional tunneling scheme. If host's mobility speed is considered to be high, multicast packets are forwarded using hi-directional tunneling scheme from home agent continuously. If host's mobility speed is considered to be slow, remote subscription scheme is applied for foreign agent and it try to join multicast tree. We developed analytical models to analyze the performance of proposed scheme and simulated our scheme compared with MOM(Mobile Multicast), RBMOM(Range Based MOM), and TBMOM(Timer Based MOM) schemes. Simulation results show that our scheme has shorter transmission delay than above 3 schemes in the aspect of host's mobility speed and multicast group size.