• Title/Summary/Keyword: P-E hysteresis loops

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A Study on the Development of a System for Measuring Dielectric Hysteresis (유전 히스테리시스 특성 측정장치의 연구 개발)

  • 강대하
    • Journal of the Korean Institute of Illuminating and Electrical Installation Engineers
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    • v.12 no.1
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    • pp.58-68
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    • 1998
  • A computer-controlled system for measuring dielectric hysteresis has been developed. This system consists of the wave generation par\, the high voltage amplifier part, the measurement part, the data acquisition part and the related controll circuits and is interfaced to P.C(personal computer). The applied voltage and its frequency are controlled by P.C . Since the measured datas can be saved in the RAM of P.C, the analysis and the graphics of the datas are very convenient. As a accuracy test, the capcitances of the commercial mica and styroll capacitors were measured by applying high voltage and the results were good agreement with the rating values. In the test of PZT ceramic sample, the typical D-E hysteresis loops were obtained by applying a single frequency voltage to the sample, and $\varepsilon-E$ and D-E hysteresis loops could be measured at the same time by applying a double frequency voltage to the sample.sample.

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Dielectric Properties and Electrocaloric Effects of PLZT Ferroelectric Ceramics by Applying Electric Fields (전계 인가에 따른 PLZT 강유전체의 유전특성 및 전기열량 효과)

  • Kim, You-Seok;Yoo, Ju-Hyun;Jeong, Yeong-Ho
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.29 no.3
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    • pp.164-167
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    • 2016
  • In this study, in order to develop relaxor ferroelectric ceramics for refrigeration device application with large electrocaloric effect, PLZT(8/65/35) composition was fabricated using conventional solid-state method. The Curi temperature of this composition PLZT ceramics was $230^{\circ}C$, and the P-E hysteresis loops of the PLZT ceramics as a fuction of temperature became slim by degrees with higher temperatures. The maximum value of ${\Delta}T$ of $0.243^{\circ}C$ in ambient temperature of $215^{\circ}C$ with 30 kV/cm was appeared. It is considered that PLZT ceramics possess the possibility of refrigeration device application.

Electrocaloric Effect of [Bi0.5(Na0.84K0.16)0.5]TiO3 Lead-free Ceramics ([Bi0.5(Na0.84K0.16)0.5]TiO3 무연 세라믹스의 전기열량 효과)

  • Han, Jong-Dae;Yoo, Ju-Hyun;Jeong, Yeong-Ho
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.28 no.4
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    • pp.234-237
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    • 2015
  • In this work, in order to develop the ceramics with an excellent electrocaloric effect, $[Bi_{0.5}(Na_{0.84}K_{0.16})_{0.5}]TiO_3$ ceramics were fabricated by conventional solid state reaction method. The ceramics was observed as rhombohedral phase by X-ray diffraction patterns. To investigate the electrocaloric effect of the ceramics, P-E hysteresis loops were measured at various temperature. The temperature change ${\Delta}T$ of these ceramics was calculated using the Maxwell's relations. The maximum value of temperature change ${\Delta}T$ was obtained as 0.3 $1^{\circ}C$ at $165^{\circ}C$ under applied electric fields 45 kV/cm.

Electrical Properties of SBT Thin Films after Etching in Cl$_2$/Ar Inductively Coupled Plasma (Ar/Cl$_2$ 유도결합플라츠마 식각 후 SBT 박막의 전기적 특성)

  • 이철인;권동표;깅창일
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2002.07a
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    • pp.58-61
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    • 2002
  • SBT thin films were etched at different content of Cl$_2$in Cl$_2$/Ar plasma. We obtained the maximum etch rate of 883 ${\AA}$/min at Cl$_2$(20%)/Ar(80%). As Cl$_2$ gas increased in Cl$_2$/Ar plasma, the etch rate decreased. The maximum etch rate may be explained by variation of volume density for Cl atoms and by the concurrence of two etching mechanisms such as physical sputtering and chemical reaction with formation of low-volatile products, which can be desorbed only by ion bombardment. The variation of volume density for Cl, F and Ar atoms and ion current density were measured by the optical emission spectroscopy and Langmuir probe. To evaluate the physical damage due to plasma, X-ray diffraction and atomic force microscopy analysis carried out. After etching process, P-E hysteresis loops were measured by ferroelectric workstation.

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Electrocaloric Effect of (Bi0.5Na0.5)TiO3 Ceramics ((Bi0.5Na0.5)TiO3 세라믹스의 유전 및 전기열량 특성)

  • Han, Jong-Dae;Yoo, Ju-Hyun;Jeong, Yeong-Ho
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.30 no.5
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    • pp.284-287
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    • 2017
  • The electrocaloric effect in $0.94(Bi_{0.5}Na_{0.5})TiO_3+0.06KNbO3+0.9wt%$ G.F.ferroelectricceramics was observed in terms of the temperature change (${\Delta}T$) of the fabricated ceramics, Curie temperature $T_c$, and applied electric field. The specimens were fabricated by a conventional solid-state reaction. $T_c$ appeared near $165{\sim}170^{\circ}C$. The P-E hysteresis showed a tendency to slim down with a temperature increase and finally was slimmest near $150^{\circ}C$. With the increase of temperature, the polarization revealed a gradual decrease, and a sharp decline near $T_c$. When an electric field of 45 kV/cm was applied, the largest polarization was shown. The maximum value of the temperature change (${\Delta}T=0.31^{\circ}C$) was obtained at $165^{\circ}C$ under an applied electric field of 45 kV/cm.

The effect of rapid thermal annealing treatment for ferroelectric properties of PZT thin films (RTA를 이용한 후열처리가 PZT 박막의 강유전 특성에 미치는 영향)

  • Ju, Pil-Yeon;Park, Young;Jeong, Kyu-Won;Lim, Dong-Gun;Song, Joon-Tae
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1999.11a
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    • pp.136-139
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    • 1999
  • The post-annealing treatments on RF (Radio Frequency) magnetron sputtered PZI(Pb$\_$1.05/(Zr$\_$0.52/, Ti$\_$0.48/)O$_3$thin films(4000${\AA}$) have been investigated. for a structure of PZT/Pt/Ti/SiO$_2$/Si Crystallization pproperties of PZT films were strongly dependent on RTA(Rapid Thermal Annealing) annealing temperature. We were able to obtain a perovskite structure of PZT at a low temperature of 600$^{\circ}C$. P-E curves of Pd/PZT/Pt capacitor annealed at 700$^{\circ}C$ demonstrate typical hysteresis loops. The measured values of P$\_$r/, E$\_$c/, by post annealed at 700$^{\circ}C$ were 12.1 ${\mu}$C/$\textrm{cm}^2$, 120KV/cm respectively.

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A study on PZT capacitor on the glass substrate (유리 기판 위에서의 PZT 캐패시터에 관한 연구)

  • Ju, Pil-Yeon;Park, Young;Jeong, Kyu-Won;Song, Joon-Tae
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2000.04b
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    • pp.80-83
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    • 2000
  • The post-annealing treatments on rf magnetron sputtered PZT($Pb_{1.05}(Zr_{0.52},\;Ti_{0.48})O_3$) thin films($4000{\AA}$) have been investigated for a structure of PZT/Pt/Ti/Coming glass(1737). Crystallization properties of PZT films were strongly dependent on RTA(Rapid Thermal Annealing) annealing temperature and time. We were able to obtain a perovskite structure of PZT at $650^{\circ}C$ and 10min. P-E curves of Pd/PZT/Pt capacitor demonstrate typical hysteresis loops. The measured values of $P_r$, $E_c$ were $8.1[{\mu}C/cm^2]$, 95[kV/cm] respectively. Polarization value decrease about 25% after $10^9$ cycles.

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Characteristics of PZT thin film on the g1ass substrate (유리 기판 위에서의 PZT 박막의 특성에 관한 연구)

  • Ju, Pil-Yeon;Jeong, Kyu-Won;Park, Young;Park, Ki-Yeop;Song, Joon-Tae
    • Proceedings of the KIEE Conference
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    • 2000.07c
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    • pp.1477-1479
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    • 2000
  • The annealing treatments on rf magnetron sputtered PZT($Pb_{1.05}(Zr_{0.52},Ti_{0.48})O_3$) thin films(4000${\AA}$) have been investigated for a structure of PZT/Pt/Ti/ITO coated glass. Crystallization properties of PZT films were strongly dependent on RTA(Rapid Thermal Annealing) annealing temperature and time. We were able to obtain a perovskite structure of PZT at 650$^{\circ}C$ and 10min. P-E curves of Pd/PZT/Pt capacitor demonstrate typical hysteresis loops. The measured values of $P_r$, $E_c$ were 15.8[${\mu}C/cm^2$], 95[kV/cm] respectively. Polarization value decrease about 10% after $10^9$ cycles.

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Characterization of Pb(Zr0.2Ti0.8)O3 Thin Films Deposited at Various Temperatures on SrRuO3/SrTiO3 Substrates by Pulsed Laser Deposition (Pulsed Laser Deposition에 의해 SrRuO3/SrTiO3 기판위에 여러 가지 증착온도에서 증착된 Pb(Zr0.2Ti0.8)O3 박막의 특성)

  • Lee, Woo-Sung;Jung, Gwan-Ho;Kim, Do-Hun;Kim, Si-Won;Kim, Hyeong-Jun;Park, Jong-Ryong;Song, Young-Pil;Yoon, Hui-Kun;Lee, Sae-Min;Choi, In-Hyuk;Yoon, Soon-Gil
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.18 no.9
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    • pp.810-814
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    • 2005
  • [ $Pb(Zr_{0.2}Ti_{0.8})O_3/SrRuO_3$ ] heteroepitaxial thin films were deposited at various temperatures on single crystal $SrTiO_3$ substrates by pulsed laser deposition and characterized for the microstructural and ferroelectric properties. The $SrTiO_3$ substartes etched by buffered oxide etch $(pH{\thickapprox}5.8)$ solution for 20s followed by the thermal annealing at $1000^{\circ}C$ for 1h showed the terrace ledges with a 0.4nm height. The $SrRuO_3$ bottom electrodes with a thickness of 52nm grown on $SrTiO_3$ single crystal also exhibit a terrace ledge similar to that of $SrTiO_3$. The PZT thin films were grown with an epitaxial relationship and showed typical P-E hysteresis loops shown at the epitaxial films. The 56nm thick-PZT films deposited at $650^{\circ}C$ exhibit a remanent polarization $(p_r)$ of $80{\mu}C/cm^2$ and a coercive field $(E_c)$ of 160kV/cm.

Electrical Properties of (Pb, LaITiO$_3$ Thin Films fabricated by Sol-Gel Processing (Sol-Gel 법에 의한 (Pb, La)TiO$_3$ 박막의 전기적 특성)

  • 구본혁;박정흠;장낙원;마석범;박창엽
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1997.11a
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    • pp.48-51
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    • 1997
  • (Pb. La)TiO$_3$ thin films were fabricated by sol-gel Processing and spin-coated on the Pt substrate. The spin-coated PLT films were sintered at 75$0^{\circ}C$ for 5min by rapid thermal ann La content dependence of the electrical properties of the PLT thin films are discussed. Wit La mole% from 20 to 36mo1e%. the dielectric constant of the PLT thin films decreased f 570. P-E hysteresis loops changed from ferroelectric to paraelectric. and the charge storage charging time decreased. The Curie Point decreased with increasing La content. The leak density also decreased and La 36mo1% species shows mood characteristics less than 10- electric field 500 (KV/cm) Because of the broad range of composition-controlled ferroelectric PLT thin films are suitable for memory application.

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