• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.25 no.1
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• pp.15-19
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• 2012

Presented herein are the results of the study that was conducted on the electrical characteristics of organic field-effect transistors based on poly(3-hexylthiophene), particularly the thickness and annealing temperature of their active layer is varied. The changes in field-effect mobility and current on/off ratio were explored. It was observed that both increasing annealing temperature from $60^{\circ}C$ to $100^{\circ}C$ and various concentrations influence the trade-off relations between the mobility and current on/off ratio. The surface morphology of the 2-${\mu}m^2$ area with various thicknesses was scanned via atomic-forcemicroscopy(AFM) to verify the relationship between surface morphology, which is related to the thickness of the film, and device performance.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.24 no.5
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• pp.364-369
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• 2011

Analyzing electrical degradation of polycrystalline silicon transistor to applicable at several environment is very important issue. In this research, after fabricating p channel poly crystalline silicon TFT (thin film transistor) electrical characteristics were compare and analized that changed by gate bias with first measurement. As a result on and off current was reduced by variation of gate bias and especially re duce ratio of off current was reduced by $7.1{\times}10^1$. On/off current ratio, threshold voltage and electron mobility increased. Also, when channel length gets shorter on/off current ratio was increased more and thresh old voltage increased less. It was cause due to electron trap and de-trap to gate silicon oxide by variation of gate bias.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.22 no.2
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• pp.107-113
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• 2009

In order to improve air stability, we proposed a new active layer of an organic TFT by synthesizing P3HT/POSS conjugated polymer. P3HT/POSS OTFTs with the various P3HT/POSS volume ratios were fabricated and characterized. With the P3HT/POSS volume ratio of 1:1, we achieved the field-effect mobilities of ${\sim}1.19{\times}10^{-3}\;cm^2/v{\cdot}sec$ in the saturation region and the current on/off ratio of ${\sim}2.51{\times}10^2$. The resulting current on-off ratio was much higher than that of the P3HT-based OTFTs and resulted from the dramatic decrease of the off-current. Since the off-current can be reduced by preventing oxygen in atmosphere from doping the P3HT/POSS active layers, this new active layer shows its ability to avoid oxygen doping in atmosphere. Therefore, the improvement of the air stability can be achieved by employing the P3HT/POSS active layers.

• Proceedings of the Korea Concrete Institute Conference
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• 1998.10b
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• pp.668-673
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• 1998

The specimen of current study has the same type with the 3-span slabs of Burns et al used in the study by Mojtahedi/Gamble, which laid a ground for the revision of the ACI318-77 code to the ACI 318-83 code. But those specimens was failed prematurely before it reached the ultimate strength which the specimen had. The reason is that bonded reinforcements were cut off where there is no need for the flexural reinforcement. As results. the slabs failed ultimately where the reinforcements was cut off. Thus, the tendon stresses of failure may have been much smaller than the values which culd reach if the bonded reinforcements were extended beyond the theoretical cut off points. On the based on the fact mentioned above. the specimens which had the same conditions as the specimens of Burns et al were used in the current study, but in which the reinforcements were distributed in a sequence for the reinforcements not to be cut anywhere in the 3-span. As a results, it was known that the current ACI code, revised by the result of Mojtahedi/Gamble's study, overestimated the effect of span/depth ratio on the members with high span/depth ratio. Thus it was concluded that the effect of span/depth ratio on the ultimate stress of unbonded tendon regulated by the current ACI code must be reconsidered and reevaluated.

• 한국정보디스플레이학회:학술대회논문집
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• 2009.10a
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• pp.560-562
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• 2009

In this paper, we proposed a simple method of decreasing the off current generated by degradation for improve the electrical characteristics such as mobility and on/off current ratio by making the line patterns on the pentacene surface between the electrodes using atomic force microscope (AFM) lithography.

• Journal of the Institute of Electronics Engineers of Korea SD
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• v.44 no.12
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• pp.43-53
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• 2007

We have analyzed low current operation characteristics of a VCSEL transmitter operating at fixed Current over wide temperature range. Used 850 nm oxide VCSEL has low temperature dependence of the threshold current and $d^2I_{th}/dT^2$ is approximately $1.346\times10^{-4}mA/^{\circ}C^2$. We fixed on-current so that output power from the chip is 1 mW at $20^{\circ}C$ and investigated the turn-on, turn-off characteristics and eye-diagram of the 850 nm oxide VCSEL transmitter with varying ambient temperature and off-current. We measured rise time, fall time, extinction ratio and timing jitter by changing tile ambient temperature and off-current. With the fixed off-current of around $0.1\sim0.2mA$ lower than the lowest threshold current the transmitter successfully operated at 1.25 Gbps over a wide temperature range from $-20^{\circ}C$ to $80^{\circ}C$.

• Journal of the Institute of Electronics Engineers of Korea TE
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• v.37 no.2
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• pp.12-16
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• 2000

The electrical characteristics of n-channel LDD structured poly-Si TFT's have been systematically investigated. It have been found that the LDD regions act as the effect of series resistance and reducing the electric field. Kink effect is disappeared and off current is greatly reduced, while on current is slightly reduced. On/off current ratio graph shows that LDD device's switching characteristic is better than that of conventional device. As a result of study, it is concluded that the effect of electric field's reduction is more dominant than that of series resistance.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.11 no.7
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• pp.522-526
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• 1998

We have fabricated a LDD structured polysilicon thin film transistor with low leakge current and the optimized LDD length has been obtained. The device performance is improved is improved by hydrogen passivation process. The on.off current ratio of poly0Si TFT s with $0.5{\mu}m$ and $1.0{\mu}m$ LDD length is much higher than that of conventional structured device due to the decrease of leakege current. The optimized LDD length may be $0.5{\mu}$ from the experimental data such as on/off current ratio, threshold voltage and hydrogenation effect.

• Nuclear Engineering and Technology
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• v.54 no.2
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• pp.501-506
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• 2022

Long turn-off time limits high frequency operation of Bipolar Junction Transistors (BJTs). Turn-off time decreases with increases in the recombination rate of minority carriers at switching transients. Fast neutron irradiation on a Si BJT incurs lattice damages owing to the displacement of silicon atoms. The lattice damages increase the recombination rate of injected holes with electrons, and decrease the hole lifetime in the base region of pnp Si BJT. Fast neutrons generated from a beryllium target with 30 MeV protons by an MC-50 cyclotron were irradiated onto pnp Si BJTs in experiment. The experimental results show that the turn-off time, including the storage time and fall time, decreases with increases in fast neutron fluence. Additionally, it is confirmed that the base current increases, and the collector current and base-to-collector current amplification ratio decrease due to fast neutron irradiation.

• Journal of the Korean Institute of Telematics and Electronics A
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• v.33A no.3
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• pp.96-106
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• 1996

One of the major problems for poly-Si TFTs is the large off state leakage current. LDD (lightly doped drain) and offset gated structures have been employed in order to reduce the leakage current. However, these structures also redcue the oN current significantly due to the extra series resistance caussed by the LDD or offset region. It is desirable to have a device which would have the properties of the offset gated structure in the OFF state, while behaving like a fully gated device in the oN state. Therefore, we propose a new thin film transistor with pnp junction gate which reduce the leakage curretn during the OFF state without sacrificing the ON current during the ON state.