• Proceedings of the Korean Society of Propulsion Engineers Conference
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• 2004.03a
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• pp.588-592
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• 2004

This paper presents the preliminary fabrication results of colloid thrusters which can provide thrust of the order of micro to milli-Newtons. MEMS technology has been used for fabrication, and four essential fabrication techniques - deep etching with nested masks, isotropic plasma etching, anisotropic reactive ion etching, and direct fusion wafer bonding - have been newly developed. Among diverse models which have been designed and fabricated, the fabrication results of 4-inch wafer-based colloid thrusters are presented.

• Proceedings of the KWS Conference
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• 1993.05a
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• pp.132-134
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• 1993

The conventional way of molten nugget size measurement in welding process have utilized the metal-microscope by examining the micro sectioned weld specimen after micro-etching procedure. This paper proposes a new method for exact measurement of molten nugget size with the aid of the digital image processing unit and some developed software. This method proved to be convenient and precise in that resulting resolution and accuracy are as good as that of the conventional method.

• Proceedings of the Optical Society of Korea Conference
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• 1990.02a
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• pp.207-210
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• 1990

The mechanisms of the meltback etching and regrowth processes are studied experimentally. The depth and time of the meltback is poltted with the experimental data and fitted with some functions. The method to reduce the anisotropy and elliminate the gallium is lands are also developed. It is possible to fabricate the AlGaAs micro-lens array by the use of the process and apply it to a new optical devices.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2002.10a
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• pp.160-163
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• 2002

Micro via hole Fabrication is studied by means of minimizing method to circuit size as many electric products developed to portable and minimize. Most of currently micro via hole fabrication using laser is that fabricate insulator layer using CO2 Laser after Cu layer by etching, or fabricate insulator layer using IR after trepanning Cu by UV. In this paper, it was performed that a metal layer and insulator layer were worked upon only one UV laser, and increase to processing speed by experiment.

• Transactions of Materials Processing
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• v.20 no.1
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• pp.17-22
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• 2011

Recently, analyzing system is studying for applying to biomedical engineering field, actively. Micro fluidics control system has been manufactured using LIGA (Lithographie Galvanoformung und Abformung), Etching, Lithography and Laser etc. However, it is difficult that above-mentioned methods are applied to fabrication of precision mold master efficiently because of long processing time and rising cost of equipments. Therefore, in this study, micro EDM and micro WEDG system were developed to analyze machining characteristics with tool wear, surface roughness and process time. Then, optimal machining conditions could be obtained from the results of analysis. As the results, mold master of staggered herringbone mixer which has a high mixing efficiency, one of passive mixer of Lab-on-a-chip, could be fabricated from micro pattern(< 50um) using micro EDM successfully.

• The Transactions of the Korean Institute of Electrical Engineers C
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• v.48 no.5
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• pp.396-401
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• 1999

In this study, $Ar^+$ ion laser etching process of single/poly-crystalline Si with $CCl_2F_2$ gas is investigated for MEMS applications. In general, laser direct etching process is useful in microelectronic process, fabrication of micro sensors and actuators, rapid prototyping, and complementary processing because of the advantages of 3D micromachining, local etching/deposition process, and maskless process with high resolution. In this study, a pyrolytic method, in which $CCl_2F_2$ gasetches molten Si by the focused laser, was used. In order to analyze the temperature profile of Si by the focused laser, the 3D heat conduction equation was analytically solved. In order to investigate the process parameters dependence of etching characteristics, laser power, $CCl_2F_2$ gas pressure, and scanning speed were varied and the experimental results were observed by SEM. The aspect ratio was measured in multiple scanning and the simple 3D structure was fabricated. In addition, the etching characteristics of $6\mum$ thick poly-crystalline Si on the insulator was investigated to obtain flat bottom and vertical side wall for MEMS applications.

• Transactions of Materials Processing
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• v.18 no.4
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• pp.310-316
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• 2009

Micro lens array(MLA) is widely used in information technology(IT) industry fields for various applications such as a projection display, an optical power regulator, a micro mass spectrometer and for medical appliances. Recently, MLA have been fabricated and developed by using a reflow method having the processes of micro etching, electroplating, micro machining and laser local heating. Laser thermal relaxation method is introduced in marking of microdots on the surface of densified glass. In this paper, we have proposed a new direct fabrication process using UV laser local thermal-expansion(UV-LLTE) and investigated the optimal processing conditions of MLA on the surface of negative photo-resist material. We have also studied the 3D shape of the micro lens obtained by UV laser irradiation and the optimal process conditions. And then, we made chrome mold by electroplating. After that, we made MLA using chrome mold by hot embossing processing. Finally, we have measured the opto-physical properties of micro lens and then have also tested the possibility of MLA applications.

• Transactions of the Korean Society of Mechanical Engineers A
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• v.30 no.12 s.255
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• pp.1642-1648
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• 2006

This paper describes enhancement of the mixing efficiency of a multilamination micro mixer by adding a number of recirculation zones downstream of the mixing zone. Numerical simulation was employed to estimate the mixing efficiency and the pressure drop under various conditions. Numerical results indicated that recirculation micro mixer brought about not only the increase of the mixing efficiency but also the decrease of the pressure drop. Micro mixers were fabricated using photosensitive glass by anisotropic wet etching technique. The width and height of the micro channel were $150{\mu}m$ and $500{\mu}m$, respectively. The performance of micro mixer was measured using color intensity variation of the fluid. Except for extremely low Re below 40, the recirculation micro mixer of the present study showed improved mixing. And the enhancement of the mixing increased as Re rose. When Re increased beyond 400, more than 90% of the mixing was observed in the experiment.

• International Journal of Precision Engineering and Manufacturing
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• v.9 no.1
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• pp.25-29
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• 2008

We introduce a new fabrication process for antireflective structured surfaces. A 4-inch silicon wafer was dipped in a suspension of 300-nm-diameter silica particles dispersed in a toluene solution. When the wafer was drawn out of the suspension, a hexagonally packed monolayer structure of particles self-assembled on almost the complete wafer surface. Due to the simple process, this could be applied to micro- and nano-patterning. The self-assembled silica particles worked as a mask for the subsequent reactive ion etching. An array of nanometer-sized pits could be fabricated since the regions that correspond to the small gaps between particles were selectively etched off. As etching progressed, the pits became deeper and combined with neighboring pits due to side-etching to produce an array of cone-like structures. We investigated the effect of etching conditions on antireflection properties, and the optimum shape was a nano-cone with height and spacing of 500 nm and 300 nm, respectively. This nano-structured surface was prepared on a $30\;{\times}\;10-mm$ area. The reflectivity of the surface was reduced 97% for wavelengths in the range 400-700 nm.

• Transactions of the Society of Information Storage Systems
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• v.1 no.2
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• pp.182-187
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• 2005

A large area micro mirror is an optical element that functions as changing an optical path by reflection in integrated optical system. We fabricated the large area silicon mirror by anisotropic etching using MEMS for implementation of integrated optical pickup. In this work, we report the optimum conditions to better fabricate and design, greatly improve mirror surface quality. To obtain mirror surface of $45^{\circ},\;9.74^{\circ}$ off-axis silicon wafer from (100) plane was used in etching condition of $80^{\circ}C$ with 40wt.% KOH solution. After wet etching, polishing process by MR fluid was applied to mirror surface for reduction of roughness. In the next step, after polymer coating on the polished Si wafer, the Si mirror was fabricated by UV curing using a trapezoid bar-type way structure. Finally, we obtained peak to valley roughness about 50 nm in large area of $mm^2$ and it is applicable to optical pickup using blu-ray wavelength as well as infrared wavelength.