International Journal of Precision Engineering and Manufacturing

Korean Society for Precision Engineering (한국정밀공학회)
권호 표지

Self-assembly of Fine Particles Applied to the Production of Antireflective Surfaces

  • Kobayashi, Hayato (Graduate school of System Design, Tokyo Metropolitan University) ;
  • Moronuki, Nobuyuki (Graduate school of System Design, Tokyo Metropolitan University) ;
  • Kaneko, Arata (Graduate school of System Design, Tokyo Metropolitan University)
  • Published : 2008.01.01
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Abstract

We introduce a new fabrication process for antireflective structured surfaces. A 4-inch silicon wafer was dipped in a suspension of 300-nm-diameter silica particles dispersed in a toluene solution. When the wafer was drawn out of the suspension, a hexagonally packed monolayer structure of particles self-assembled on almost the complete wafer surface. Due to the simple process, this could be applied to micro- and nano-patterning. The self-assembled silica particles worked as a mask for the subsequent reactive ion etching. An array of nanometer-sized pits could be fabricated since the regions that correspond to the small gaps between particles were selectively etched off. As etching progressed, the pits became deeper and combined with neighboring pits due to side-etching to produce an array of cone-like structures. We investigated the effect of etching conditions on antireflection properties, and the optimum shape was a nano-cone with height and spacing of 500 nm and 300 nm, respectively. This nano-structured surface was prepared on a $30\;{\times}\;10-mm$ area. The reflectivity of the surface was reduced 97% for wavelengths in the range 400-700 nm.

Keywords

References

  1. Song, J. Y., Park, H. Y., Kim, H. J. and Jung. Y. W., 'Development of Defect Inspection System for PDP ITO Patterned Glass,' International Journal of Precision Engineering and Manufacturing, Vol. 7, No.3, pp. 18-23, 2006
  2. Toyoda, H., Takahara, K., Okano, M., Yotsuya, T. and Kikuta, H., 'Fabrication of microcone array for antireflection structured surface using metal doted pattern,' Japanese Journal of Applied Physics, Vol. 40, No. 7B, pp. 747-749, 2001 https://doi.org/10.1143/JJAP.40.L747
  3. Kanamori. Y., Kikuta, H. and Hane, K., 'Broadband antireflection gratings for glass substrates fabricated by fast beam etching,' Japanese Journal of Applied Physics, Vol. 39, No. 7B, pp. 735-737, 2000 https://doi.org/10.1143/JJAP.39.L735
  4. Zhou, J., Yang, G., 'Nanohole Fabrication using FIB, EB and AFM for Biomedical Applications,' International Journal of Precision Engineering and Manufacturing, Vol. 7, No. 4, pp. 18-22, 2006
  5. Lee, G. I., Kim, K., Jeon, S. C., Kim, J. S. and Lee, H. M., 'Nanophotonics of Hexagonal Lattice GaN Crystals Fabricated using an Electron Beam Nanolithography Process,' International Journal of Precision Engineering and Manufacturing, Vol. 7, No. 4, pp. 14-17, 2006
  6. Kanamori, Y., Sasaki, M. and Hane, K., 'Broadband antireflection gratings fabricated upon silicon substrates,' Optics Letters, Vol. 24, No. 20, pp. 1422-1424, 1999 https://doi.org/10.1364/OL.24.001422
  7. Denkov, N. D., Velev, O. D., Kralchevsky, P. A., Ivanov, I. B., Yoshimura, H. and Nagayama, K., 'Two-dimensional crystallization,' Nature, Vol. 361, No. 6407, p. 26, 1993
  8. Kaneko, A., Moronuki, N., Mogi, M. and Yamamura, Y., 'Fabrication of self-assembled microstrcuture on using controlled liquid spreading on textured surface,' Proceedings of the 11th International Conference on Precision Engineering, pp. 191-196, 2006
  9. Han, S., Hao, Zhibiao., Wang, J. and Luo, Y., 'Controllable two dimensional photonic crystal patterns fabricated by nanosphere lithography,' Journal of Vacuum Science and Technology, Vol. 23, No. 4, pp. 1585-1588, 2005 https://doi.org/10.1116/1.1978892
  10. Cheung, C. L., Nikolic, R. J., Reinhardt, C. E. and Wang, T. F., 'Fabrication of nanopillars by nanosphere lithography,' Nanotechnology, Vol. 17, Issue 5, pp. 1339-1343, 2006 https://doi.org/10.1088/0957-4484/17/5/028
  11. Hulteen, J. C., Treichel, D., Smith, M., Duval, M.., Jensen, T. and Duyne, R., 'Nanosphere lithography: Size-tunable silver nanoparticle and surface cluster arrays,' Journal of Physical Chemistry B, Vol. 103, Issue 19, pp. 3854-3863, 1999 https://doi.org/10.1021/jp9904771
  12. Wellner, A., Preece, P. R., Fowler, J. C. and Palmer, R. E., 'Fabrication of ordered arrays of silicon nanopillars in silicon-on-insulator wafers,' Microelectronic Engineering, Vol. 57-58, pp. 919-924, 2001 https://doi.org/10.1016/S0167-9317(01)00457-9
  13. Astilean, S., 'Fabrication of periodic metallic nanostructures by using nanosphere lithography,' Romanian Reports in Physics, Vol. 56, No. 3, pp. 340-345, 2004
  14. Cheng, S. L., Lu, S. W., Li, C. H., Chang, Y. C., Huang, C. K., and Chen, H., 'Fabrication of periodic nickel silicide nanodot arrays using nanosphere lithography,' Thin Solid Films, Vol. 494, Issue 1-2, pp. 307-310, 2006 https://doi.org/10.1016/j.tsf.2005.08.158
  15. Nakanishi, T., Hiraoka, T., Fujimoto, A., Saito, S. and Asakawa, K., 'Nano-patterning using an embedded particle monolayer as an etch mask,' Microelectronic Engineering, Vol. 83, Issue 4-9, pp. 1503-1508, 2006 https://doi.org/10.1016/j.mee.2006.01.193