• Title/Summary/Keyword: Doping density

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Charge Doping Revealing Molecular Diffusion of Sulfuric Acid and Water through a Graphene-Silica Interface

  • An, Gwang-Hyeon;Lee, Dae-Eung;Ryu, Sun-Min
    • Proceedings of the Korean Vacuum Society Conference
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    • 2014.02a
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    • pp.197.2-197.2
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    • 2014
  • 그래핀(graphene)의 라만 스펙트럼은 전하밀도(charge density)와 기계적 변형(strain)에 민감하여 연구에 널리 활용되고 있다. 본 연구에서는 기계적 박리법으로 만든 그래핀에 황산 수용액으로 p-형 화학도핑(chemical doping)을 유발시키고 전하밀도의 변이에 따른 라만 스펙트럼의 변화를 조사하였다. 이러한 변화를 통해 황산과 물 분자의 계면 확산을 이해하고, $SiO_2/Si$ 기판의 화학적 특성이 미치는 영향을 파악하고자 하였다. 분자의 효율적인 계면 확산을 위해 고온 산화반응을 이용하여 그래핀의 기저면에 나노공(nanopore)을 만든 후, 액상에서 라만 스펙트럼을 측정하였다. 증류수 속에 담궜을 때 물 분자가 그래핀-기판 계면 사이로 확산되면서 열처리에 의해 유발된 정공이 사라짐을 확인하고, D-봉우리의 가역적인 변화로부터 그래핀의 구조적 변화를 유추하였다. 황산 농도를 증가시켰을 때 G와 2D-봉우리의 진동수가 상호간에 일정한 비율로 증가하여 정공의 밀도가 증가함 알 수 있었다. 동일한 시료에 대해 황산의 농도를 감소시킴으로써 p-형 도핑을 제거하고 동일한 반응을 가역적으로 반복할 수 있었다. 상기한 분자의 2차원 확산 현상은 나노공의 유무와 기판의 전처리 조건에 따라 크게 달라진다는 사실을 확인 할 수 있었다. 또한 여러 파장에서 측정된 전하밀도와 기계적 변형에 의한 G와 2D-봉우리의 진동수 변화로부터 다른 연구자들이 활용할 수 있는 검정곡선을 제시하였다.

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nBn Based InAs/GaSb Type II Superlattice Detectors with an N-type Barrier Doping for the Infrared Detection

  • Kim, Ha-Sul;Lee, Hun;Hwang, Je-Hwan;Lee, Sang-Jun;Klein, B.;Myers, S.;Krishna, S.
    • Proceedings of the Korean Vacuum Society Conference
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    • 2014.02a
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    • pp.128.2-128.2
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    • 2014
  • Long-wave infrared detectors using the type-II InAs/GaSb strained superlattice (T2SL) material system with the nBn structure were designed and fabricated. The band gap energy of the T2SL material was calculated as a function of the thickness of the InAs and GaSb layers by the Kronig-Penney model. Growth of the barrier material (Al0.2Ga0.8Sb) incorporated Te doping to reduce the dark current. The full width at half maximum (FWHM) of the 1st satellite superlattice peak from the X-ray diffraction was around 45 arc sec. The cutoff wavelength of the fabricated device was ${\sim}10.2{\mu}m$ (0.12eV) at 80 K while under an applied bias of -1.4V. The measured activation energy of the device was ~0.128 eV. The dark current density was shown to be $1.2{\times}10^{-5}A/cm^2$ at 80 K and with a bias -1.4 V. The responsivity was 1.9 A/W at $7.5{\mu}m$ at 80K and with a bias of -1.9V.

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A Study on the Characteristics of Ammonia Doped Plasma Polymer Thin Film with a Controlled Plasma Power

  • Seo, Hyeon-Jin;Hwang, Gi-Hwan;Ju, Dong-U;Yu, Jeong-Hun;Lee, Jin-Su;Jeon, So-Hyeon;Nam, Sang-Hun;Yun, Sang-Ho;Bu, Jin-Hyo
    • Proceedings of the Korean Vacuum Society Conference
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    • 2014.02a
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    • pp.242.2-242.2
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    • 2014
  • Plasma-polymer thin films (PPTF) have been deposited on a Si(100) wafer and glass under several conditions such as different RF power by using plasma-enhanced chemical vapor deposition (PECVD) system. Ethylcyclohexane, ammonia gas, hydrogen and argon were utilized as organic precursor, doping gas, bubbler gas and carrier gases, respectively. PPTFs were grown up with RF (ratio frequency using 13.56 MHz) powers in the range of 20~60 watt. PPTFs were characterized by FT-IR (Fourier Transform Infrared), FE-SEM (Scanning Electron Microscope), AFM (Atomic Force Microscope), Contact angle and Probe station. The result of FT-IR measurement showed that the PPTFs have high cross-link density nitrogen doping ratio was also changed with a RF power increasing. AFM and FE-SEM also showed that the PPTFs have smooth surface and thickness. Impedance analyzer was utilized for the measurements of C-V curves having different dielectric constant as RF power.

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Characterization of AI-doped ZnO Films Deposited by DC Magnetron Sputtering (DC 마그네트론 스퍼터링에 의해 증착한 AZO 박막의 특성)

  • Park, Yi-Seop;Lee, Seung-Ho;Song, Pung-Keun
    • Journal of the Korean institute of surface engineering
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    • v.40 no.3
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    • pp.107-112
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    • 2007
  • Aluminum doped zinc oxide (AZO) films were deposited on non-alkali glass substrate by DC magnetron sputtering with 3 types of AZO targets (doped with 1.0 wt%, 2.0 wt%, 3.0 wt% $Al_2O_3$). Electrical, optical properties and microstructure of AZO films have been investigated by Hall effect measurements, UV/VIS/NIR spectrophotometer, and XRD, respectively. Crystallinity of AZO films increased with increasing substrate temperature ($T_s$) and doping ratio of Al. Resistivity and optical transmittance in visible light were $8.8{\times}10^{-4}{\Omega}cm$ and above 85%, respectively, for the AZO film deposited using AZO target (doped with 3.0 wt% $Al_2O_3$) at $T_s$ of $300^{\circ}C$. On the other hand, transmittance of AZO films in near-infrared region decreased with increasing $T_s$ and doping ratio of Al, which could be attributed to the increase of carrier density.

Fabrication of Boron-Doped Polycrystalline Silicon Films for the Pressure Sensor Application (압력센서용 Boron이 첨가된 다결정 Silicom 박막의 제조)

  • 유광수;신광선
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.3 no.1
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    • pp.59-65
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    • 1993
  • The boron-doped polycrystalline silicon films which can be used in pressure sensors were fabricated in a high-vacuum resistance heating evaporator. Poly-Si films were deposited on quartz substrates at various temperatures and the boron was doped to the silicon film in a diffusion furnace using BN wafer. The silicon films deposited at $500^{\circ}C$ was amorphous, began to show crystalline at $600^{\circ}C$, and became polycrystalline at $700^{\circ}C$. After doping boron at $900^{\circ}C$for 10 minutes, the resistivity of the films was in the range of $0.1{\Omega}cm~1.5{\Omega}cm$, the boron density was $9.4\times10^{15}~2.1\times{10}^{17}cm^{-3}$, and the grain size was $107{\AA}~191{\AA}$.

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Recent Development in the Rate Performance of Li4Ti5O12

  • Lin, Chunfu;Xin, Yuelong;Cheng, Fuquan;Lai, Man On;Zhou, Henghui;Lu, Li
    • Applied Science and Convergence Technology
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    • v.23 no.2
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    • pp.72-82
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    • 2014
  • Lithium-ion batteries (LIBs) have become popular electrochemical devices. Due to the unique advantages of LIBs in terms of high operating voltage, high energy density, low self-discharge, and absence of memory effects, their application range, which was primarily restricted to portable electronic devices, is now being extended to high-power applications, such as electric vehicles (EVs) and hybrid electrical vehicles (HEVs). Among various anode materials, $Li_4Ti_5O_{12}$ (LTO) is believed to be a promising anode material for high-power LIBs due to its advantages of high working potential and outstanding cyclic stability. However, the rate performance of LTO is limited by its intrinsically low electronic conductivity and poor $Li^+$ ion diffusion coefficient. This review highlights the recent progress in improving the rate performance of LTO through doping, compositing, and nanostructuring strategies.

Low-Frequency Noise Characteristics of SiGe pMOSFET Depending upon Channel Structures and Bias Conditions (SiGe pMOSFET의 채널구조와 바이어스 조건에 따른 잡음 특성)

  • Choi, Sang-Sik;Yang, Hun-Duk;Kim, Sang-Hoon;Song, Young-Joo;Cho, Kyoung-Ik;Kim, Jeonng-Huoon;Song, Jong-In;Shim, Kyu-Hwan
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2005.07a
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    • pp.5-6
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    • 2005
  • High performance SiGe heterostructure metal-oxide-semiconductor field effect transistors(MOSFETs) were fabricated using well-controlled delta-doping of boron and SiGe/Si heterostructure epitaxal layers grown by reduced pressure chemical vapor deposition. In this paper, we report 1/f noise characteristics of the SiGe MOSFETs measured under various bias conditions of the gate and drain voltages changing in linear operation regions. From the noise spectral density, we found that the gate and drain voltage dependence of the noise represented same features, as usually scaled with $f^1$. However, 1/f noise was found to be much lower in the device with boron delta-doped layer, by a factor of $10^{-1}\sim10^{-2}$ in comparion with the device fabricated without delta-doped layer. 1/f noise property of delta-doped device looks important because the device may replace bipolar transistors most commonly embedded in high-frequency oscillator circuits.

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Properties of ZnO:Al thin films prepared by a single target sputtering

  • An, Ilsin;Ahn, You-Shin;Taeg, Lim-Won
    • Journal of Korean Vacuum Science & Technology
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    • v.2 no.2
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    • pp.78-84
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    • 1998
  • ZnO:Al films were prepared by an rf magnetron sputtering and targets for the experiments were fabricated by sintering the mixture of ZnO and Al2O3. The most conductive film was obtained from the target with 2.0∼2.2 wt.% of Al2O3. Optical properties studied with spectroscopic ellipsometry showed band gap widening, i.e., the Burstein-Moss shift, with aluminum doping as well as with the elevation of deposition temperature. And it is found that the optical and electrical properties were related to the density of states as well as the variation of donor level. when hydrogen atoms were introduced into the films, the activation energy for the generation of oxygen vacancy was smaller for the films showing higher conductivity. This indicates that the optimum deposition condition for highly conductive ZnO:Al film has strong relation to the optimum doping condition.

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Structural and Electrical Properties of BiFeO3 Thin Films by Eu and V Co-Doping (Eu와 V 동시 도핑에 의한 BiFeO3 박막의 구조와 전기적 특성)

  • Chang, Sung-Keun;Kim, Youn-Jang
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.32 no.3
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    • pp.229-233
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    • 2019
  • Pure $BiFeO_3$ (BFO) and (Eu, V) co-doped $Bi_{0.9}Eu_{0.1}Fe_{0.975}V_{0.025}O_{3+{\delta}}$ (BEFVO) thin films were deposited on $Pt(111)/Ti/SiO_2/Si(100)$ substrates by chemical solution deposition. The effects of co-doping were observed by X-ray diffraction, Raman spectroscopy, and scanning electron microscopy (SEM). The electrical properties of the BEFVO thin film were improved as compared to those of the pure BFO thin film. The remnant polarization ($2P_r$) of the BEFVO thin film was approximately $26{\mu}C/cm^2$ at a maximum electric field of 1,190 kV/cm with a frequency of 1 kHz. The leakage current density of the co-doped BEFVO thin film ($4.81{\times}10^{-5}A/cm^2$ at 100 kV/cm) was two orders of magnitude lower than of that of the pure BFO thin film.

Effect of activator types on cement mortar with polymeric aluminum chloride waste residue

  • Ping Xu;Yuhao Cui;Dong Han;Minxia Zhang;Yahong Ding
    • Advances in concrete construction
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    • v.15 no.3
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    • pp.149-159
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    • 2023
  • Water glass (WG) and sodium sulfate (SS) were used to prepare polymeric aluminum chloride residue cement mortar (PACRM) by single and compound blending with polymeric aluminum chloride waste residue, respectively. The structural strength and textural characteristics examinations showed that PACRM consistency increased by incorporating WG, but decreased by incorporating SS. When WG and SS were compounded, the mortar consistency initially rose before falling. The compressive strength of PACRM increased and then decreased as WG was increased. The mechanical properties of PACRM were better enhanced by SS than WG, showing no strength deterioration. The main reason for the improved mechanical properties of polymeric aluminum chloride waste residue in the presence of activators is the increased precipitation of reactive substances, such as C-S-H gels, calcium silica, and Ca(OH)2. The density of the specimens with PACRM and the degree of aggregation of hydration products were significantly enhanced by generating more hydration products in the mortar. Further, the cracks and pores were significantly reduced, and the matrix structure was continuous and dense at 5% SS doping and 3% compound doping.