Fig. 1. X-ray diffraction patterns of BFO and BEFVO thin films deposited on Pt(111)/Ti/SiO2/Si(100) substrates and (b) 2θ=22.5° and (c) 2θ=32°.
Fig. 2. Raman Spectra of BFO, co-doped BEFVO thin films measured at room temperature.
Fig. 3. FE-SEM morphologies of BFO, co-doped BEFVO thin films with cross-section micrographs.
Fig. 4. Leakage current densities of BFO and BEFVO thin films measured at room temperature.
Fig. 5. P-E hysteresis loops of BFO and BEFVO thin films at 1 kHz.
References
- W. Prellier, M. P. Singh, and P. Murugavel, J. Phys.: Condens. Matter, 17, R803 (2005). [DOI: https://doi.org/10.1002/chin.200602223]
- M. Bibes and A. Barthelemy, Nat. Mater., 7, 425 (2008). [DOI: https://doi.org/10.1038/nmat2189]
- T. Zhao, A. Scholl, F. Zavaliche, K. Lee, M. Barry, A. Doran, M. P. Cruz, Y. H. Chu, C. Ederer, N. A. Spaldin, R. R. Das, D. M. Kim, S. H. Back, C. B. Eom, and R. Ramesh, Nat. Mater., 5, 823 (2006). [DOI: https://doi.org/10.1038/nmat1731]
- L. W. Martin, Y. H. Chu, and R. Ramesh, Mater. Sci. Eng., 68, 89 (2010). [DOI: https://doi.org/10.1016/j.mser.2010.03.001]
- D. K. Pradhan, R.N.P. Choudhary, C. Rinaldi, and R. S. Katiyar, J. Appl. Phys., 106, 024102 (2009). [DOI: https://doi.org/10.1063/1.3158121]
- Z. Hu, M. Li, B. Yu, L. Pei, J. Liu, J. Wang, and X. Zhao, J. Phys. D: Appl. Phys., 42, 185010 (2009). [DOI: https://doi.org/10.1088/0022-3727/42/18/185010]
- B. Yu, M. Li, J. Liu, D. Guo, L. Pei, and X. Zaho, J. Phys. D: Appl. Phys., 41, 065003 (2008). [DOI: https://doi.org/10.1088/0022-3727/41/6/065003]
- B. Yu, M. Li, J. Wang, L. Pei, D. Guo, and X. Zhao, J. Phys. D: Apply. Phys., 41, 185401 (2008). [DOI: https://doi.org/10.1088/0022-3727/41/18/185401]
- T. Kawae, H. Tsuda, H. Naganuma, S. Yamada, M. Kumeda, S. Okamura, and A. Morimoto, Jpn. J. Appl. Phys, 47, 7586 (2008). [DOI: https://doi.org/10.1143/jjap.47.7586]
- X. Qi, J. Dho, R. Tomov, M. G. Blamire, and J. L. MacManus-Driscoll, Appl. Phys. Lett., 86, 062903 (2005). [DOI: https://doi.org/10.1063/1.1862336]
- R. D. Shannon, Acta Crystallogr., Sect. A: Found. Adv., A32, 751 (1976). [DOI: https://doi.org/10.1107/s0567739476001551]
- Y. J. Kim, J. W. Kim, C. M. Raghavan, J. J. Oak, H. J. Kim, W. J. Kim, M. H. Kim, T. K. Song, and S. S. Kim, Ceram. Int., 39, S195 (2013). [DOI: https://doi.org/10.1016/j.ceramint.2012.10.061]
- P. Godara, A. Agarwal, N. Ahlawat, S. Sanghi, and K. Kaswan, J. Magn. Magn. Mater., 406, 76 (2016). [DOI: https://doi.org/10.1016/j.jmmm.2015.12.089]
- I. Vrejoiu, G. Le Rhun, L. Pintilie, D. Hesse, M. Alexe, and U. Gosele, Adv. Mater., 18, 1657 (2006). [DOI: https://doi.org/10.1002/adma.200502711]
- Z. Zhong and H. Ishiwara, Appl. Phys. Lett., 95, 112902 (2009). [DOI: https://doi.org/10.1063/1.3231073]
- J. W. Kim, D. Do, and S. S. Kim, Thin Solid Films, 518, 6514 (2010). [DOI: https://doi.org/10.1016/j.tsf.2010.02.001]