• 제목/요약/키워드: Discharge Structure

검색결과 1,048건 처리시간 0.037초

Mechanisms involved in modification of film structure and properties in ICP assisted dc and pulsed dc sputtering

  • Kusano, Eiji
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2015년도 제49회 하계 정기학술대회 초록집
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    • pp.59.2-59.2
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    • 2015
  • Modification of film structure and properties in inductively-coupled plasma (ICP) assisted dc and pulsed dc sputtering has been reported by Oya and Kusano [1] and by Sakamoto, Kusano, and Matsuda [2], showing drastic changes in films structure and properties by the ICP assistance in particular to the pulsed dc discharge. Although mechanisms involved in the modification has been reported to be the increase in energy transferred to the substrate, details of effects of low-energy ion bombardment on the modification and origin of an anomalous increase in the ion quantity by the ICP assistance to the pulsed dc discharge have not been discussed. In this presentation, mechanisms involved in film structure and property modification in ICP assisted dc and pulsed dc sputtering, in which a number of low-energy ions are formed, will be discussed based on ion energy distribution as well as effectiveness of energy transfer to the substrate by low energy particles [3]. The results discussed in this presentation will emphasize the fact that the energetic particles playing an important role in the film structure modification are those to be deposited, but not those of inert gas, when their energies range in less than 100 eV in the pressure range of magnetron sputtering.

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PMOS 소자가 삽입된 부분웰 구조의 N형 SCR 소자에서 정전기 보호 성능 향상을 위한 최적의 CPS 이온주입에 대한 연구 (Study on the Optimal CPS Implant for Improved ESD Protection Performance of PMOS Pass Structure Embedded N-type SCR Device with Partial P-Well Structure)

  • 양준원;서용진
    • 한국위성정보통신학회논문지
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    • 제10권4호
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    • pp.1-5
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    • 2015
  • PPS 소자가 삽입된 부분웰 구조의 N형 실리콘 제어 정류기(NSCR_PPS) 소자에서 정전기 보호 성능의 향상을 위한 CPS 이온주입조건의 최적화에 대해 연구하였다. 종래의 NSCR 표준소자는 on-저항, 스냅백 홀딩 전압 및 열적 브레이크다운 전압이 너무 낮아 정전기 보호소자의 필요조건을 만족시키지 못해 적용이 어려웠으나, 본 연구에서 제안하는 CPS 이온주입과 부분웰 이온주입을 동시에 적용한 변형 설계된 소자의 경우 스냅백 홀딩 전압을 동작전압 이상으로 증가시킬 수 있는 향상된 정전기 보호성능을 나타내어 고전압 동작용 마이크로 칩의 정전기보호 소자로 적용 가능함을 확인하였다.

원통형 마그네트론 스퍼터링 장비의 방전특성과 박막구조에 관한 연구 (A Study on the Discharge Characteristics of Cylindrical Sputtering Apparatus and Microstructure)

  • 오창섭;한창석
    • 열처리공학회지
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    • 제25권1호
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    • pp.1-5
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    • 2012
  • The purpose of this study is to prepare a high strength fiberglass reinforced metal. Aluminum covering was carried out over carbon materials such as carbon fiber in order to increase their wettability to molten metals such as aluminum. A sputtering apparatus with a cylindrical target was fabricated to carry out the covering. Sputtering was caused by glow discharge between the target and the two anode plates attached to its top and bottom. As the substrate for preliminary test, a thin carbon wire was used instead of carbon fiber, and the wire was placed at the central axis of the target. Aluminium coating was formed on the whole surface of the substrate. The formation rate and structure of coating were varied by controlling the electrical potential of substrate. When the substrate was electrically isolated, coating with columnar structure was formed with a formation rate of $15{\mu}m/hr$. In case of grounded substrate, coating with amorphous structure was formed with a formation rate of $7{\mu}m/hr$.

PPS 소자가 삽입된 N형 SCR 소자에서 부분웰 구조가 정전기 보호 성능에 미치는 영향 (Effects on the ESD Protection Performance of PPS(PMOS Pass Structure) Embedded N-type Silicon Controlled Rectifier Device with different Partial P-Well Structure)

  • 양준원;서용진
    • 한국위성정보통신학회논문지
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    • 제9권4호
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    • pp.63-68
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    • 2014
  • PPS 구조를 갖는 N형 실리콘 제어 정류기 소자에서 부분웰 구조가 정전기 보호 성능에 미치는 영향을 고찰하였다. 종래의 NSCR 표준소자는 온-상태 저항, 스냅백 홀딩 전압 및 열적 브레이크다운 전압이 너무 낮아 정전기 보호소자의 필요조건을 만족시키지 못해 적용이 어려웠으나, 본 연구에서 제안하는 부분웰 구조를 갖도록 변형 설계된 NSCR-PPS 소자는 안정한 정전기보호 성능을 나타내어 고전압 동작용 마이크로 칩의 정전기보호 소자로 적용 가능함을 확인하였다.

전력반도체 냉각을 위한 원통형 루프히트파이프 제작 및 성능 평가에 관한 연구 (A Study on Manufacture and Performance Evaluation of a Loop Heat Pipe System with a Cylindrical Evaporator for IGBT Cooling)

  • 기재형;유성열;성병호;김성대;최지훈;김철주
    • 한국철도학회:학술대회논문집
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    • 한국철도학회 2008년도 추계학술대회 논문집
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    • pp.1710-1716
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    • 2008
  • The Loop Heat Pipe (LHP) operates to pump the working fluid by means of the capillary force in a wick structure. Particularly, it is difficult to design and manufacture the evaporator consisted of a grooved container and a compensation chamber as well as the wick structure. This study is related to design and manufacture the grooved container coupled with wick structure, the properties of the wick structure such as the permeability, the porosity, and the maximum capillary pressure were measured to apply the cooling technology for Insulated Gate Bipolar Transistor (IGBT). The container of the LHP was manufactured by the electrical discharge process and the wick structure was sintered with the nickel particle by an axial-press apparatus with the pulse electronic discharge. As results, the properties of the wick were experimentally obtained about 60% of the porosity, 35kPa of the maximum capillary force and $1.53{\times}10-13m2$ of the permeability.

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3전극 트리거 갭 스위치 동작특성에 관한 연구 (A Study on Operation Characteristics of Three Electrode Trigger Gap Switch)

  • 홍태윤;한상보
    • 전기학회논문지
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    • 제67권4호
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    • pp.549-553
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    • 2018
  • The applications of the pulse power technology are expanding and the necessity of a large current switch as a core component of pulsed power is increasing. A trigger gap switch composed of three electrodes was fabricated and the discharge characteristics were studied according to the change of the pressure, the shape of the main electrode, and the gap distance when the trigger pulse was applied. As a main result, the stable operation range was confirmed through the discharge inception voltage according to the gap distance and electric field analysis was performed in the same structure to confirm the electric field value of the discharge inception voltage.

고전압 방전 플라즈마에 의한 질화탄소 박막 증착 시 플라즈마 영역에 가한 레이저 애블레이션의 효과 (Effect of a Laser Ablation on High Voltage Discharge Plasma Area for Carbon Nitride Film Deposition)

  • 김종일
    • 한국전기전자재료학회논문지
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    • 제15권6호
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    • pp.551-557
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    • 2002
  • Carbon nitride films have been deposited on Si(100) substrate by a high voltage discharge plasma combined with laser ablation in a nitrogen atmosphere. The films were grown both with the without the presence of an assisting focused Nd:YAG laser ablation. The laser ablation of the graphite target leads to vapor plume plasma expending into th ambient nitrogen arc discharge area. X-ray photoelectron spectroscopy and Auger electron spectroscopy were used to identify the binding structure and the content of the nitrogen species in the deposited films. The nitrogen content of the films was found to increase drastically with an increase of nitrogen pressure. The surface morphology of the films was studied using a scanning electron microscopy. Data of infrared spectroscopy and x-ray photoelectron spectroscopy indicate the existence of carbon-nitrogen bonds in the films. The x-ray diffraction measurements have also been taken to characterize the crystal properties of the obtained films.

원통형 방전소자의 방전특성 연구 (Numerical Study on the Discharge Characteristics of Cylindrical Discharge Devices)

  • 서정현;신범재
    • 전기학회논문지
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    • 제62권7호
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    • pp.980-986
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    • 2013
  • In this paper, the discharge characteristics of ac-type cylindrical discharge devices with diameters (D) in the $50{\sim}400{\mu}m$ range have been investigated numerically. The cylindrical devices have much lower breakdown voltages compared to the coplanar electrode structures. The breakdown voltage of the cylindrical structures increases with the decrease of diameters in $50{\sim}100{\mu}m$ range. In $100{\sim}200{\mu}m$ range, however, the breakdown voltage decreases slightly with the decrease of diameters. Also, as the diameter gets smaller, the electron heating efficiency is greatly improved.

High luminous efficiency Mercury-free flat light source for LCD BLU

  • Lee, Ju-Kwang;Oh, Byung-Joo;Jung, Jae-Chul;Whang, Ki-Woong
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2005년도 International Meeting on Information Displayvol.II
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    • pp.1161-1164
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    • 2005
  • A Mercury-free, flat light source which shows high luminance and luminous efficiency simultaneously has been developed. An electrodeless, dielectric barrier discharge is used to generate the plasma using Ne-Xe mixture gas of relatively low gas pressure of a few tens torr in a 4.1 inch diagonal size of flat panel. The basic properties of the long gap glow discharge and its accompanying instabilities, which prevents us from having high luminous efficiency discharge have been analyzed. A new structure and optimized driving methods have been used to generate a glow discharge which shows a wide voltage margin of a few hundred volts. The luminous efficiency and luminance could be 110 lm/W at $1300\;cd/m^2$ and 50 lm/W at $5500\;cd/m^2$.

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카본을 부극으로 사용하는 $LiMnO_2$ 전지의 전기화학적 특성 (Charge/Discharge Characteristics of $LiMnO_2$ Battery using Carbon as Anode Materials)

  • 김은미;임승규;김남인;구할본
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2008년도 추계학술대회 논문집 Vol.21
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    • pp.277-278
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    • 2008
  • Orthorhombic $LiMnO_2$(o-$LiMnO_2$) has attracted public attentions as a cathode materials of Lithium ion battery because it has low cost and high theoretical discharge capacity of 285mAh $g^{-1}$. In our study, o-$LiMnO_2$ is synthesized by quenching method. To verify their phase structure, X-ray diffraction is accomplished. Test cells are assembled to check electrochemical characteristics using acquired o-$LiMnO_2$ cathode and carbon anode. Charge/Discharge cycling was carried out for 50cycles. And impedance was measured at 1, 2, 5, 10, 30, 50cycle. During cycle test, the max discharge capacity was recorded 139mAh $g^{-1}$ at 10cycle.

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