• Journal of Korean Society of Occupational and Environmental Hygiene
• /
• v.19 no.3
• /
• pp.280-287
• /
• 2009

High-tech microelectronics industry is known as one of the most chemical-intensive industries. In Korea, Microelectronics industry occupied 38% of export and 16% of working employees work in microelectronics industry. But, chemical information and health hazards of high-tech microelectronics manufacturing are poorly understood because of rapid development and its penchant for secrecy. We need to investigate on chemical use and exposure control. We Site-visits to 6 high-tech microelectronics manufacturing company which have cleanroom work using over 1,000kg organic solvents (5 semi-conductor chips and its related parts company, 1 liquid crystal display (LCD)). We reviewed their data on chemical use and ventilation system, and measured TVOCs (Total Volatile Organic Compounds) and carbon dioxide concentration. All cleanroom air passed through hepa filters to acheive low particle levels and only 1 cleanroom uses carbon filters to minimize the organic solvents exposures In TVOC screening test, Cleanroom for semi-conductor chips and its related parts company with laminar down flow system (e.g. class 1~100) showed nondetectable level of TVOCs concentration, but Cleanroom for liquid crystal display (LCD) with conventional flow system (e.g. class 1,000~10,000) showed 327 ppm as TVOCs. Acetone concentration in cleanroom for Jig cleaning, LC Injection, Sealing processes were 18.488ppm (n=14), 49.762 ppm (n=15), 8.656 ppm (n=14) as arithmetric mean. Acetone concentration in cleanroom for LCD inspection process was 40ppm (n=55) as geometric mean, where the range was 7.8~128.7ppm and weakly correlated with ventilation rate efficiency(r=0.44, p<0.05). To control organic solvents in cleanrooms, chemical and carbon filters should be installed with hepa filters. Even though their volatile organic compounds concentration was not exceed to occupational exposure limits, considering of entrance limited cleanroom environment, long-term period exposure effects and adverse health effects of cleanroom worker need further reseach.

• Korean Journal of Air-Conditioning and Refrigeration Engineering
• /
• v.22 no.4
• /
• pp.225-233
• /
• 2010

We performed 3 dimensional numerical study on the improvement of the airflow deflection in the cleanroom of Class 1000, which is presently operated for the manufacturing process in Korea. The Deflection angle and the non-uniformity were investigated to analyze the airflow characteristics and the performance of cleanroom with variations of the cleanroom occupancy state, the filters' arrangement, and the floor return air system. From the numerical results, we found out that the airflow pattern of the cleanroom is more unidirectional and stable in the condition of at-rest than in the condition of as~built. It is due to that the equipments installed in the cleanroom play a role like partitions, which prevent the airflow from inclining toward the recirculation air duct. And it is needed to arrange the filter units parallel to the equipments array without a gap between them for maintaining the unidirectional airflow pattern. Finally, we knew that it is very important to install the partition like the eyelid above the equipment to keep the unidirectional airflow around the equipments and remove the contaminants quickly.

• Proceedings of the Korean Society for Noise and Vibration Engineering Conference
• /
• 2002.05a
• /
• pp.778-784
• /
• 2002

FFU are used increasingly by the microeleceronics industry to provide clean recirculating air for the fabrication of integrated circuits and laminar flow air. There may be several hundred ffu in a large cleanroom, covering 100% of the ceiling area. Hence, there is of often knowledge in the inside and outside of the country the flu give rise to noise & vibration trouble to microelectronics industry. Noise ＆ Vibration control for satisfication about noise ＆ vibration criteria in TFT-LCD factory cleanroom be in need of exact noise & vibration data of accurence from utility & equipment that can be exert a bad influence upon cleanroom. In this pater, hence we found out noise and vibration properities of ffu by using experimental method. And, we performed noise ＆ vibration analysis about noise it vibration level in cleanroom using semiempirical method for quantative approach about noise ＆ vibration level in cleanroom.

• Korean Journal of Air-Conditioning and Refrigeration Engineering
• /
• v.18 no.12
• /
• pp.1033-1038
• /
• 2006

We carried out the experiments on particle deposition onto the cleanroom wall panels. And then we investigated the particle deposition characteristic coefficients for electrostatic voltages and particle size. It was found that there is little difference in characteristics of the particle deposition between the steel panel and the anti-static coating panel. In case of that the particle size is under $1.0{\mu}m$, the particle deposition characteristic coefficient becomes larger as the electrostatic voltage induced to the cleanroom wall panel is increasing. Where in case of that the particle size is over $3.0{\mu}m$, the particle deposition characteristic coefficients do not show any differences with the electrostatic voltages. It is due to that the electrostatic force is the major particle transport mechanism for submicron particles, while the gravitational settling is the major particle transport mechanism for overmicron particles when the electro-static voltages are induced to the cleanroom wall panel.

• Journal of Korean Society of Industrial and Systems Engineering
• /
• v.36 no.2
• /
• pp.1-7
• /
• 2013

Cleanroom could be largely classified into industrial cleanroom that can be contaminated by particles and bio-cleanroom that can be contaminated by biological particles. Electrical manufacturing companies producing precision machines and electrical parts essentially have industrial cloom facilities and clean technologies to produce defects free products due to particles. Industrial cleanroom should be controlled in respect of 4M1E to prevent from foreign materials of sub-micro unit and to keep out contamination sources from outside. In this paper, a concept for a quantitative methodology to measure the particles from running components was suggested by combining both newly making clean booth such as wear tester and laser particle counter.

• Proceedings of the KSME Conference
• /
• 2007.05b
• /
• pp.2333-2337
• /
• 2007

The practical studies on the method of particle contamination control for yield enhancement in the cleanroom were carried out. The method of the contamination control was considered, which is composed of data collection, data analysis, improvement action, verification, and implement control. The composition analysis for data collection and data analysis was used in the cellular phone module packaging lines. And this method was evaluated by the variation of yield loss between before and after improvement action. In case that the composition analysis was applied, the critical sources were selected and yield loss reduction through improvement actions was also investigated. From these results, it is concluded that the composition analysis is effective solutions for particle contamination control in the cleanroom.

• Proceedings of the KSME Conference
• /
• 2007.05b
• /
• pp.2338-2343
• /
• 2007

The practical studies on the method of particle contamination control for yield enhancement in the cleanroom were carried out. The method of the contamination control was proposed, which are composed of data collection, data analysis, improvement action, verification, and implement control. The partition check method for data collection and data analysis was used in the cellular phone module production lines. And this method was evaluated by the variation of yield loss between before and after improvement action. In case that the partition check method was applied, the critical process step was selected and yield loss reduction through improvement actions was observed. From these results, it is concluded that the partition check method is effective solution for particle contamination control in the cleanroom production lines.

• Transactions of the Korean Society of Mechanical Engineers B
• /
• v.28 no.5
• /
• pp.560-568
• /
• 2004

We performed the numerical study on the characteristics of the 3-D airflow and dynamic cross contamination in the photolithography process cleanroom. The nonunifurmity, the deflection angle and the global cross contamination were used for analyzing the characteristics and performances of cleanroom. From the numerical results, we knew that the airflow characteristics of the cleanrooms are largely affected by the porosity of panel and the adjustment of dampers and the global cross contamination varies with the location of source and the passage of time through the concentration ratio.

• Proceedings of the KSME Conference
• /
• 2003.11a
• /
• pp.151-156
• /
• 2003

We performed the numerical study on the characteristics of the airflow and cross contamination in the photolithography process cleanroom. The nonuniformity, the deflection angle and the global cross contamination were used for analyzing the characteristics and performances of cleanroom. We knew that the airflow characteristics of the cleanrooms are largely affected by the porosity of panel and the adjustment of dampers. And the numerical result showed that the global cross contamination varies with the location of source and the passage of time.

• Journal of the Korean Society of Clothing and Textiles
• /
• v.26 no.2
• /
• pp.337-348
• /
• 2002

Based upon literature survey and questionnaire survey, this research tries to develop four new Cleanroom Garment in semiconductor industrial environment. The designs emphasize to minimize workers disconmfort so that they can not only cover human body fully but also reduce dust as much as possible during work hour in clean room. The new designs characteristics and results from both function test and dust emission test are as follows: 1. In order to reduce dust-emission, we develop new designs with hood, kimono sleeve, and back zipper. The designs with hood face positive test results in term of motion suitability and dust-omission. The design with seam in front, in particular, is effective to control dust-emission. 2. For the purpose of reducing dust-emission, we also emphasize to minimize ease of dust-proof wear, with reference to previous research and clothing experiment. The experiment participants report that the new wears are not so comfortable as existing ones, but they accept the new wears positive as effective in reducing dust-emission owing to reduced ease of Cleanroom Garment and sleeves. 3. A1so to reduce dust-emission in inner wear, we put inner wear in both Cleanroom Garments and inner wear, resulting to remove discomfort of wearers when changing clothes and of tight waist due to inner-trousers. 4. We develop new designs with elastic bands in both waist through the side lines and with velcro only at the back side. To remove twist in front contributes to reduce emission arising out of friction, also to free the appearance minding woman workers from worrying about exposed stomach. The new designs need to be accepted as a valuable alternative of Cleanroom Garment, in that they are highly effective to reduce dust-emission, which is the most important factor in the wear, in spite of some drawbacks in terms of motion-suitability, ease and appearance as shown in wearing test.