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A Study on the 3-D Airflow and Dynamic Cross Contamination in the Photolithography Process Cleanroom

광식각공정이 있는 클린룸에서의 3차원 기류 및 동적교차오염에 관한 연구

  • 노광철 (서울시립대학교 대학원 기계정보공학과) ;
  • 오명도 (서울시립대학교 기계정보공학과) ;
  • 이승철 (동해대학교 자동차공학과)
  • Published : 2004.05.01

Abstract

We performed the numerical study on the characteristics of the 3-D airflow and dynamic cross contamination in the photolithography process cleanroom. The nonunifurmity, the deflection angle and the global cross contamination were used for analyzing the characteristics and performances of cleanroom. From the numerical results, we knew that the airflow characteristics of the cleanrooms are largely affected by the porosity of panel and the adjustment of dampers and the global cross contamination varies with the location of source and the passage of time through the concentration ratio.

Keywords

References

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