A Numerical Study on the Characteristics of Airflow and Cross Contamination in the Photolithography Process Cleanroom

광식각공정 클린룸에서의 기류 및 교차오염에 대한 수치적 연구

We performed the numerical study on the characteristics of the airflow and cross contamination in the photolithography process cleanroom. The nonuniformity, the deflection angle and the global cross contamination were used for analyzing the characteristics and performances of cleanroom. We knew that the airflow characteristics of the cleanrooms are largely affected by the porosity of panel and the adjustment of dampers. And the numerical result showed that the global cross contamination varies with the location of source and the passage of time.