• Title/Summary/Keyword: Bipolar device

Search Result 223, Processing Time 0.029 seconds

Bipolar Transport Model of Single Layer OLED for Embedded System

  • Lee, Jung-Ho;Han, Dae-Mun;Kim, Yeong-Real
    • Proceedings of the Korea Society of Information Technology Applications Conference
    • /
    • 2005.11a
    • /
    • pp.237-241
    • /
    • 2005
  • We present a device model for organic light emitting diodes(OLEDs) which includes charge injection, transport, recombination, and space charge effects in the organic materials. The model can describe both injection limited and space charge limited current flow and the transition between them. Calculated device current, light output, and quantum and power efficiency are presented for different cases of material and device parameters and demonstrate the improvements in device performance in bilayer devices. These results are interpreted using the calculated spatial variation of the electric field, charge density and recombination rate density in the device. We find that efficient OLEDs are possible for a proper choice of organic materials and contact parameters.

  • PDF

VBIC Model Application and Parameter Extraction and Optimization for SiGe HBT

  • Lee, Sang-Heung;Park, Chan-Woo;Lee, Seung-Yun;Lee, Ja-Yol;Kang, Jin-Yeong
    • The Journal of Korean Institute of Communications and Information Sciences
    • /
    • v.28 no.8A
    • /
    • pp.650-656
    • /
    • 2003
  • In 1995, a group of representatives from the integrated circuits and computer-aided design industries presented a industry standard bipolar model called the VBIC model. The VBIC model includes the improved Early effect, quasi-saturation, substrate parasitic, avalanche multiplication, and self-heating which are not available in the conventional SGP model. This paper applies VBIC model for SiGe HBT device and develops an accurate and efficient methodology to extract all the DC and AC parameters of the VBIC model for SiGe HBT device at room temperature. Simulated results by the extracted VBIC model parameter are compared with the measurement data and show very good agreement in both DC and s-parameters prediction.

A Novel Inserted Trench Cathode IGBT Device with High Latching Current (높은 latch-up 전류특성을 갖는 트랜치 캐소드 삽입형 IGBT)

  • 조병섭;곽계달
    • Journal of the Korean Institute of Telematics and Electronics A
    • /
    • v.30A no.7
    • /
    • pp.32-37
    • /
    • 1993
  • A novel insulated gate bipolar transister (IGBT), called insulated trench cathode IGBT (ISTC-IGBT), is proposed. ISTC-IGBT has a trenched well with the shallow P$^{+}$ juction in the conventional IGBT structure. The proposed structure has the capability of effectively suppressing the parasitic thyristor latchup. The holding current of ISTC-IGBT is about 2.2 times greater than that of the conventional IGBT. Detailed analysis of the latchup characteristics of ISTC-IGBT is performed by using the two-dimensional device simulator, PISCES-II B.

  • PDF

Study of Characteristics of Dual Channel Trench IGBT (Dual Channel을 가진 Trench Insulated Gate Biploar Transistor(IGBT)특성 연구)

  • Moon, Jin-Woo;Chung, Sang-Koo
    • Proceedings of the KIEE Conference
    • /
    • 2001.07c
    • /
    • pp.1469-1471
    • /
    • 2001
  • A Dual Channel Trench IGBT (Insulated Gate Bipolar Transistor) is proposed to improve the latch-up characteristics. Simulation results by MEDICI have shown that the latching current density of proposed device was found to be 2850 A/$cm^2$ while that of conventional device was 1610 A/$cm^2$. The latching current desity of the proposed strucutre was 77.02% higher than that of conventional structre.

  • PDF

Structure Optimization of ESD Diodes for Input Protection of CMOS RF ICs

  • Choi, Jin-Young
    • JSTS:Journal of Semiconductor Technology and Science
    • /
    • v.17 no.3
    • /
    • pp.401-410
    • /
    • 2017
  • In this work, we show that the excessive lattice heating problem due to parasitic pnp transistor action in the diode electrostatic discharge (ESD) protection device in the diode input protection circuit, which is favorably used in CMOS RF ICs, can be solved by adopting a symmetrical cathode structure. To explain how the recipe works, we construct an equivalent circuit for input human-body model (HBM) test environment of a CMOS chip equipped with the diode protection circuit, and execute mixed-mode transient simulations utilizing a 2-dimensional device simulator. We attempt an in-depth comparison study by varying device structures to suggest valuable design guidelines in designing the protection diodes connected to the $V_{DD}$ and $V_{SS}$ buses. Even though this work is based on mixed-mode simulations utilizing device and circuit simulators, the analysis given in this work clearly explain the mechanism involved, which cannot be done by measurements.

The Design of the High-frequency SAVEN Device and the 500MHz Latched Comparator using this device (High-frequency SAVEN 소자 설계 및 이를 이용한 500MHz Latched Comparator 설계)

  • Cho, Jung-Ho;Koo, Yong-Seo;Lim, Sin-Il;An, Chul
    • Proceedings of the IEEK Conference
    • /
    • 1999.11a
    • /
    • pp.212-215
    • /
    • 1999
  • High-speed device is essential to optoelectric IC for optical storage system such as CD-ROM, DVD, and to ADC for high-speed communication system. This paper represents the BiCMOS process which contains high-speed SAVEN bipolar transistor and analyzes the frequency and switching characteristics of it briefly. Finally, to prove that the SAVEN device is adequate for high-speed system, latched comparator operating at 500MHz is designed with the SPICE parameter extracted from BiCMOS device simulation.

  • PDF

Simulation Study on Effect of Ge Profile Shape on SiGe HBT Characteristics (Ge profile 변화에 의한 SiGe HBT 소자 특성 시뮬레이션)

  • 김성훈;이미영;김경해;염병렬;황만규;이흥주;이준신
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
    • /
    • 2000.07a
    • /
    • pp.55-58
    • /
    • 2000
  • SiGe heterojuction bipolar transistors (HBT) have been studied and applied for advanced high speed integrated circuits. Device characteristics of SiGe HBT depending on the Ge profile of the transistor base region have been analysed using a device simulator, ATLAS/BLAZE. The models and parameters have been calibrated to the measured characteristics of the device, having a trapeziodal base profile, including the cut-off frequency of 45GHz and the dc current gain of 200. The Ge concentration which increases linearly, exponentially, or root-functionally from the emitter-base junction to the base-collector junction, has been tried to find out the influence on the device characteristics. The cut-off frequency and gain rather strongly depends on the exponential and root-functional Ge base profiles, respectively.

  • PDF

The Optimal Design of High Voltage Field Stop IGBT (고전압 Field Stop IGBT의 최적화 설계에 관한 연구)

  • Ahn, Byoung-Sup;Zhang, Lanxiang;Liu, Yong;Kang, Ey Goo
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
    • /
    • v.28 no.8
    • /
    • pp.486-489
    • /
    • 2015
  • Power semiconductor device has a very long history among semiconductor, since the invention of low-pressure bipolar transistor 1947, and so far from small capacity to withstand voltage-current, high-speed and high-frequency characteristics have been developed with high function. In this study, the PWM IC Switch to the main parts used in IGBT (insulated gate bipolar transistor) for the low power loss and high drive capability of the simulator to Synopsys' T-CAD used by the 1,700 V NPT Planar IGBT, 1,700 V FS was a study of the Planar IGBT, the results confirmed that IGBT 1,700 V FS Planar is making about 11 percent less than the first designed NPT Planar IGBT.

Improvement of Switching Speed of a 600-V Nonpunch-Through Insulated Gate Bipolar Transistor Using Fast Neutron Irradiation

  • Baek, Ha Ni;Sun, Gwang Min;Kim, Ji suck;Hoang, Sy Minh Tuan;Jin, Mi Eun;Ahn, Sung Ho
    • Nuclear Engineering and Technology
    • /
    • v.49 no.1
    • /
    • pp.209-215
    • /
    • 2017
  • Fast neutron irradiation was used to improve the switching speed of a 600-V nonpunch-through insulated gate bipolar transistor. Fast neutron irradiation was carried out at 30-MeV energy in doses of $1{\times}10^8n/cm^2$, $1{\times}10^9n/cm^2$, $1{\times}10^{10}n/cm^2$, and $1{\times}10^{11}n/cm^2$. Electrical characteristics such as current-voltage, forward on-state voltage drop, and switching speed of the device were analyzed and compared with those prior to irradiation. The on-state voltage drop of the initial devices prior to irradiation was 2.08 V, which increased to 2.10 V, 2.20 V, 2.3 V, and 2.4 V, respectively, depending on the irradiation dose. This effect arises because of the lattice defects generated by the fast neutrons. In particular, the turnoff delay time was reduced to 92 nanoseconds, 45% of that prior to irradiation, which means there is a substantial improvement in the switching speed of the device.