• Title/Summary/Keyword: 4.3 Incident

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The Impact of Corporate Social Responsibility in Food Incidents (식품안전사고시 기업의 사회적 책임활동이 미치는 영향)

  • Lim, Jeehyun;Yoon, Yohan;Lee, Soomin;Youn, Hyewon
    • Journal of Food Hygiene and Safety
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    • v.30 no.4
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    • pp.315-322
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    • 2015
  • This study was performed to investigate the influence of Corporate Social Responsibility (CSR) activity on corporate image and repurchase intention (pre and post measure) after the news of food incident. A questionnaire survey was carried out for 235 college students in Seoul, Korea. The participants were given an instruction with CSR activity of company in food industry and completed the survey. We collected the survey and did the statistical analysis by SPSS. The result of this study was as follows: Significant differences (p < 0.05) were found between the two groups, one was aware of corporation's CSR activity and the other was not. The ranges of score of each question on corporate images after and before providing CSR information were 3.21-3.94 and 3.89-4.62, respectively. Also, the ranges of score of each question on repurchase intention after and before providing CSR information were 3.11-4.64 and 3.60-4.67, respectively. Thus, the result confirms that the previous studies' conclusion which explains CSR can shield consumers' negative attitude toward the company. The finding of this study emphasizes the importance of CSR activity to the companies in food industry and the need for making public awareness of CSR activity.

Verification and validation of ShipMo3D ship motion predictions in the time and frequency domains

  • Mctaggart, Kevin A.
    • International Journal of Naval Architecture and Ocean Engineering
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    • v.3 no.1
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    • pp.86-94
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    • 2011
  • This paper compares frequency domain and time domain predictions from the ShipMo3D ship motion library with observed motions from model tests and sea trials. ShipMo3D evaluates hull radiation and diffraction forces using the frequency domain Green function for zero forward speed, which is a suitable approach for ships travelling at moderate speed (e.g., Froude numbers up to 0.4). Numerical predictions give generally good agreement with experiments. Frequency domain and linear time domain predictions are almost identical. Evaluation of nonlinear buoyancy and incident wave forces using the instantaneous wetted hull surface gives no improvement in numerical predictions. Consistent prediction of roll motions remains a challenge for seakeeping codes due to the associated viscous effects.

Fabrication of 3D Microstructures with Single uv Lithography Step

  • Han, Man-Hee;Lee, Woon-Seob;Lee, Sung-Keun;Lee, Seung S.
    • JSTS:Journal of Semiconductor Technology and Science
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    • v.2 no.4
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    • pp.268-272
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    • 2002
  • This paper presents a novel microfabrication technology of 3D microstructures with inclined/rotated UV lithography using negative photoresist, SU-8. In some cases, reflected UV as well as incident UV is used to form microstructures. Various 3D microstructures are simply fabricated such as embedded channels, bridges, V-grooves, truncated cones, and so on.

Reactive Ion Etching Characteristics of Aluminum Oxide Films Prepared by PECVD in $CCl_4$ Dry Etch Plasma (플라즈마 화학증착한 알루미늄 산화박막의 $CCl_4$ 플라즈마에서의 반응성 이온식각 특성)

  • 김재환;김형석;이원종
    • Journal of the Korean Ceramic Society
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    • v.31 no.5
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    • pp.485-490
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    • 1994
  • The reactive ion etching characteristics of aluminum oxide films, prepared by PECVD, were investigated in the CCl4 plasma. The atomic chlorine concentration and the DC self bias were determined at various etching conditions, and their effects on the etch rate of aluminum oxide film were studied. The bombarding energy of incident particles was found to play the more important role in determining the etch rate of aluminum oxide rather than the atomic chlorine concentration. It is considered to be because the bombardment of ions or neutral atoms breaks the strong Al-O bonds of aluminum oxide to help activate the formation reaction of AlCl3 which is the volatile etch product.

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3D Characteristics of Dynamic Response of Seabed around Submerged Breakwater Due to Wave Loading (파랑하중에 의한 잠제 주변 해저지반의 3차원 동적응답 특성)

  • Hur, Dong-Soo;Park, Jong-Ryul;Lee, Woo-Dong
    • Journal of Ocean Engineering and Technology
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    • v.28 no.4
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    • pp.331-337
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    • 2014
  • We analyzed the 3-D characteristics of the dynamic response of seabed around a submerged breakwater due to wave loading using a 3-D numerical scheme (LES-WASS-3D). Using our model, which considers the wave-structure-sandy seabed interactions in a 3-D wave field, we were able to investigate the 3-D characteristics of the pore-water pressure in the seabed around the submerged breakwater under various incident wave conditions. To verify the 3-D numerical analysis method suggested in this study, we compared the numerical results with the existing experimental results and found good agreement between them. The numerical analysis reveals that high pore-water pressure in the seabed is generated below a large wave height at the front slope of the submerged breakwater. It was also shown that the non-dimensional pore-water pressure in the seabed increases as the wave period increases because the wave energy dissipation decreases on the submerged breakwater and seabed as the wave period increases.

A Study on the Comparison of HPGe Detector Response Data for Low Energy Photons Using MCNP, EGS, and ITS Codes (MCNP, EGS, ITS코드를 이용한 고순도 게르마늄 검출기의 저에너지 광자에 대한 반응 비교연구)

  • Kim, Soon-Young;Kim, Jong-Kyung;Kim, Jong-Oh;Kim, Bong-Hwan
    • Journal of Radiation Protection and Research
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    • v.21 no.2
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    • pp.125-129
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    • 1996
  • The energy response of HPGe detector for low energy Photons was determined by using three Monte Carlo codes. MCNP4A. EGS4, and CYLTRAN in ITS3. In this study. bare HPGe detector$(100 mm^2{\times}10mm)$ was used and a pencil beam was incident perpendicularly on the center of the detector surface. The photopeak efficiency, $K_{\alpha}$ and $K_{\beta}$ escape fractions were calculated as a function of incident X-ray energies ranging from 12 to 60 keV in 2-keV increments. Since the Compton. elastic. ana penetration fraction were negligible in this energy range. they were ignored in the calculation. Although MCNP. EGS, and CYLTRAN codes calculated slightly different energy response of HPGe detector for low energy Photons, it appears that the three Monte Carlo codes can Predict the low energy Photon scattering Processes accurately. The MCNP results, which are generally known as to be less accurate at low energy ranges than the EGS and ITS results. are comparable to the results of EGS and ITS and are applicable to the calculation of the low energy response data of a detector.

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Experimental Cutting Performance Evaluation of LGP using Vibration Assisted High Speed Shaping (도광판의 고속 진동절삭 특성에 관한 연구)

  • Kang, DongBae;Ahn, JungHwan;Son, SeongMin
    • Journal of the Korea Academia-Industrial cooperation Society
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    • v.15 no.4
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    • pp.1871-1878
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    • 2014
  • PMMA (Polymethyle-methacrylate) optical components have recently been increasingly used as one of the important part of the high precision equipments. This research presents comparatively the surface preparation of light incident plane, LIP (Light Incident Plane) of LGP (Light Guide Panel) by end milling, high speed shaping, and vibration assisted high speed shaping. From several experiments, the results show that the surface quality was improved in high speed shaping and the vibration assisted HSS show not only decreasing waviness and breakage also raising the straightness property. For applying high speed shaping and vibration assisted HSS, an additional tool post was developed and experimentally used.

Micropatterning by Low-Energy Focused ton Beam Lithography(FIBL) (저에너지 집속이온빔리소그라피(FIBL)에 의한 미세패턴 형성)

  • 이현용;김민수;정홍배
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1995.11a
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    • pp.224-227
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    • 1995
  • The micro-patterning by a Bow energy FIB whish has been conventionally utilized far mask-repairing was investigated. Amorphous Se$\_$75/Gee$\_$25/ resist irradiated by 9[keV]-defocused Ga$\^$+/ ion beam(∼10$\^$15/[ions/$\textrm{cm}^2$]) resulted in increasing the optical absorption, which was also observed also in the film exposed by an optical dose of 4.5${\times}$10$\^$20/[photons/$\textrm{cm}^2$]. The ∼0.3[eV] edge shift for ion-irradiated film was about twice to that obtained for photo-exposed. These large shift could be estimated as due to an increase in disorder from the decrease in the sloop of the Urbach tail. For Ga$\^$+/ FIB irradiation with a relatively low energy, 30[keV] and above the amount of dose of 1.4${\times}$10$\^$16/[ions/$\textrm{cm}^2$], the irradiated region in a-Se$\_$75/Ge$\_$25/ resist was perfectly etched in acid solution for 10[sec], which is relatively a short development time. A contrast was about 2.5. In spite of the relatively low incident energy,∼0.225[$\mu\textrm{m}$] pattern was clearly obtained by the irradiation of a dose 6.5${\times}$10$\^$16/[ions/$\textrm{cm}^2$] and a scan diameter 0.2[$\mu\textrm{m}$], from which excellent results were expected fur incident energies above 50[keV] which was conventionally used in FIBL.

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TEM study on a-axis outgrowth formation in c-axis oriented YBa$_2$Cu$_3$O$_{7-{\delta}}$ thin films

  • Hahn, T.S.;Hong, K.S.;Kim, C.H.
    • 한국초전도학회:학술대회논문집
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    • v.10
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    • pp.51-55
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    • 2000
  • Using modified melt-textured grown targets, YBa$_2$Cu$_3$O$_{7-{\delta}}$ thin films were prepared by pulsed laser deposition technique at the laser energy density from 1 J/cm$_2$ to 4 J/cm$_2$. All the films showed c-axis preferred orientations, however, a-axis outgrowths on the film surface were considerably increased with an increase of the laser energy density. To examine the origin of the a-axis outgrowth formation, the microstructures of films deposited at 2 J/cm$_2$ and 4 J/cm$_2$ were investigated using X-ray diffraction, transmission electron microscopy, and high-resolution electron microscopy. It was shown that a significant number of Y$_2$O$_3$ inclusions were formed during the growth of c-axis oriented films at 4 J/cm$_2$. These inclusions formed nucleation sites for the a-axis outgrowths. It is considered that, due to the unstable growth conditions with a high flux density of incident vapor species and the strain induced by the surrounding c-axis films, the Y$_2$O$_3$ inclusions would prefer the nucleation of α-axis grains.

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Surface analysis of reactively ion-etched aluminum films in $CF_4$ plasma ($CF_4$ 플라즈마에서 반응성 이온식각한 알루미늄 박막의 표면분석)

  • 김동원;이원종
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.5 no.4
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    • pp.351-357
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    • 1995
  • The surface layer of the aluminum film reactively ion etched in $CF_4$ plasma was ana alyzed by using XPS. $AlF_3$ which is nonvolatile is formed at the aluminum surface. As the analyzed depth increases, the intensity of the $Al_{2p}$ peak of Al - F bonds decreases while that of a aluminum metallic bond increases. The thickness of the $AlF_x$ surface layer is 50~100 $\AA$ and the deep penetration of fluorine atoms is attributed to the mixing effect by the bombardment of incident particles. For the aluminum oxide film which is etched in $CF_4$ plasma under the same conditions, oxygen atoms are substituted by fluorine atoms to form $$AIF_x$ surface layer, which is m much thinner than that formed on aluminum surface.

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