JSTS:Journal of Semiconductor Technology and Science

The Institute of Electronics and Information Engineers (대한전자공학회)
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Fabrication of 3D Microstructures with Single uv Lithography Step

  • Han, Man-Hee (Department of Mechanical Engineering, Pohang University of Science and Technology) ;
  • Lee, Woon-Seob (Department of Mechanical Engineering, Pohang University of Science and Technology) ;
  • Lee, Sung-Keun (Department of Mechanical Engineering, Pohang University of Science and Technology) ;
  • Lee, Seung S. (Department of Mechanical Engineering, Pohang University of Science and Technology)
  • Published : 2002.12.01
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Abstract

This paper presents a novel microfabrication technology of 3D microstructures with inclined/rotated UV lithography using negative photoresist, SU-8. In some cases, reflected UV as well as incident UV is used to form microstructures. Various 3D microstructures are simply fabricated such as embedded channels, bridges, V-grooves, truncated cones, and so on.

Keywords

References

  1. K. Ikuta, S. Maruo, and S. Kojima, 'New micro stereo lithography for freely movable 3D micro structure', Proc. IEEE Int. Workshop on Micro Electro Mechanical System, Heidelberg, Germany, pp. 290-295, Jan., 1998 https://doi.org/10.1109/MEMSYS.1998.659770
  2. J.G.E. Gardeniers, J. W. Berenschot, M. J. de Boer, Y. Yeshurun, M. Hefetz, R. van't Oever, and A. van den Berg, 'Silicon micro machined hollow microneedles for transdermal liquid transfer', Proc. IEEE Int. Conference on Micro Electro Mechanical System, Las vegas, USA, pp. 141-144, Jan., 2002 https://doi.org/10.1109/MEMSYS.2002.984224
  3. O. Tabata, N. Matsuzuka, T. Yamaji, S. Uemura, and K. Yamamoto, '3D Fabrication by moving mask deep x-ray lithography $(M^2DXL)$ with multiple stages', Proc. IEEE Int. Conference on Micro Electro Mechanical System, Las vegas, USA, pp. 180-183, Jan., 2002 https://doi.org/10.1109/MEMSYS.2002.984234
  4. W. Ehrfeld and A. Schmidt, 'Recent developmensts in deep x-ray lithography', J. Vac. Sci. Technol. B., Vol. 16, pp. 3526-3534, 1998 https://doi.org/10.1116/1.590490
  5. C. Beuret, G.-A. Racine, J. Gobet, R. Luthier, and N. F. de Rooij, 'Microfabrication of 3D multidirectional inclined structures by UV lithography and electroplating', Proc. IEEE Int. Workshop on Micro Electro Mechanical System, Oiso, Japan, pp. 81-85, Jan., 1994 https://doi.org/10.1109/MEMSYS.1994.555602
  6. W. Ehrfeld and A. Schmidt, “Recent developmensts indeep x-ray lithography", J. Vac. Sci. Tεchnol. B., Vol. 16,pp. 3526-3534, 1998.