• 제목/요약/키워드: 전기화학적 식각정지

검색결과 19건 처리시간 0.019초

인가 바이어스 조건이 전기화학적 식각정지 특성에 미치는 영향 (Effects of Applied Bias Conditions on Electrochemical Etch-stop Characteristics)

  • 정귀상;강경두;김태송;이원재;송재성
    • 한국전기전자재료학회논문지
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    • 제14권4호
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    • pp.263-268
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    • 2001
  • This paper describes the effects of applied bias conditions on electrochemical etch-stop characteristics. THere are a number of key issues such as diode leakage and ohmic losses which arise when applying the conventional 3-electrochemical etch-stop to fabricated some of he MEMS(microelectro mechanical system) and SOI(Si-on-insulator) structures which employ SDB(Si-wafer direct bonding). This work allows to perform anin situ diagnostic to predict whether or not an electrochemical etch-stop would fail due to diode-leakage-induced premature passivation. In addition, it presents technology which takes into account the effects of ohmic losses and allows to calculate the appropriate bias necessary to obtain a successful electrochemical etch-stop.

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전기화학적 식각정지에 의한 SDB SOI의 박막화에 관한 연구 (A Study on thinning of SDB SOI by electrochemical etch-stop)

  • 김일명;이승준;강경두;정수태;주병권;정귀상
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 1999년도 추계학술대회 논문집
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    • pp.362-365
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    • 1999
  • This paper describes on thinning SDB SOI substrates by SDB technology and electrochemical etch-stop. The surface of the fabricated SDB SOI substrates is more uniform than that grinding or polishing by mechanical method, and this process is possible to accurate SOI thickness control. During Electrochemical etch-stop, leakage current versus voltage curves were measured for analysis of the open current potential (OCP) point and the passivation potential (PP) poin and determinated to anodic substrates were analyzed by using AFM and SEM, respectivelv.

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실리콘 직접 접합 / 전기화학적 식각정지를 이용한 실리콘 다이아프램의 형성과 실리콘 압력센서 제조에의 응용 (Formation of Silicon Diaphragm Using Silicon-wafer Direct Bonding / Electrochemical Etch-stopping and Its Application to Silicon Pressure Sensor Fabrication)

  • 주병권;하병주;김근섭;송만호;김성환;김철주;차균현;오명환
    • 센서학회지
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    • 제3권3호
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    • pp.45-53
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    • 1994
  • 실리콘의 직접 접합 방법과 2단계 전기화학적 식 정지 방법을 이용하여 새로운 구조의 실리콘 다이아프램을 제조하였다. 이러한 다이아프램 구조를 기계량 센서에 이용하면 공동의 깊이와 다이아프램의 두께를 보다 정교하게 조절할 수 있다. 또한, 접합 계면에서 발생하는 응력이 다이아프램의 표면으로 전달되는 것을 피할 수 있다. 최종적으로, 제조된 다이아프램을 이용하여 암저항형 실리콘 압력 센서를 제작하였고 압력 단위의 표시가 가능한 디지탈 압력 측정기를 구현하였다.

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TMAH/IPA/Pyrazine용액에 있어서 전기화학적 식각정지 특성 (Electrochemical Etch-stop Characteristics of TMAH:IPA:Pyrazine Solutions)

  • 정귀상;이채봉
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2000년도 춘계학술대회 논문집 전자세라믹스 센서 및 박막재료 반도체재료 일렉트렛트 및 응용기술
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    • pp.147-151
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    • 2000
  • This paper presents the electrochemical etch-stop characteristics of single-crystal silicon in a tetramethyl ammonium hyciroxide(TMAH):isopropyl alcohol(IPA):pyrazine solution. Addition of pyrazine to a TMAH:IPA etchant increases the etch-rate of (100) silicon, thus the elapsed time for etch-stop was shortened. The current-voltage(I-V) characteristics of n- and p-type silicon in a TMAH:IPA:pyrazine solution were obtained, respectively. Open circuit potential(OCP) and passivation potential(PP) of n- and p-type silicon, respectively, were obtained and applied potential was selected between n- and p-type silicon PP. The electrochemical etch-stop is applied to the fabrication of 801 microdiaphragms having $20\;{\mu}m$ thickness on a 5-inch silicon wafer. The averge thicknesses of 801 microdiaphragms fabricated on the one wafer were $20.03\;{\mu}m$ and standard deviation was ${\pm}0.26{\mu}m$. The silicon surface of the etch-stopped microdiaphragm was extremely flat without noticeable taper or other nonuniformities. The benefits of the electrochemical etch-stop in a TMAH:IPA:pyrazine solution become apparent when reproducibility in the microdiaphragm thickness for mass production is considered. These results indicate that the electrochemical etch-stop in a TMAH:IPA:pyrazine solution provides a powerful and versatile alternative process for fabricating high-yield silicon microdiaphragms.

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SDB와 전기화학적 식각정지에 의한 벌크 마이크로머신용 3차원 미세구조물 제작 (Fabrication of 3-Dimensional Microstructures for Bulk Micromachining by SDB and Electrochemical Etch-Stop)

  • 정귀상;김재민;윤석진
    • 한국전기전자재료학회논문지
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    • 제15권11호
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    • pp.958-962
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    • 2002
  • This paper reports on the fabrication of free-standing microstructures by DRIE (deep reactive ion etching). SOI (Si-on-insulator) structures with buried cavities are fabricated by SDB (Si-wafer direct bonding) technology and electrochemical etch-stop. The cavity was formed the upper handling wafer by Si anisotropic etch technique. SDB process was performed to seal the formed cavity under vacuum condition at -760 mmHg. In the SDB process, captured air and moisture inside of the cavities were removed by making channels towards outside. After annealing (100$0^{\circ}C$, 60 min.), the SDB SOI structure with a accurate thickness and a good roughness was thinned by electrochemical etch-stop in TMAH solution. Finally, it was fabricated free-standing microstructures by DRIE. This result indicates that the fabrication technology of free-standing microstructures by combination SDB, electrochemical etch-stop and DRIE provides a powerful and versatile alternative process for high-performance bulk micromachining in MEMS fields.

전기화학적 식각정지에 의한 고수율 실리콘 박막 멤브레인 제작 (Fabrication of High-yield Si Thin-membranes by Electrochemical Etch-stop)

  • 정귀상;박진상;이원재;송재성
    • 한국전기전자재료학회논문지
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    • 제14권3호
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    • pp.223-227
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    • 2001
  • In this paper, the authors present the fabrication of high-yield Si thin-membranes by electrochemical etch-stop in tetramethyl ammonium hydroxide (TMAH): isopropyl alcohol (IPA):pyrazine solutions. The current-voltage (I-V) characteristics of n- and p-type Si in TMAH:IPA;pyrazine solutions were analysed, repsectively. Open circuit potential (OCP)and passivation potential (PP) of n- and p-type Si, respectively, were obtained and applied potential was selected between n- and p-type Si PPs. The electrochemical etch-stop method was applied to the fabrication of 801 micro-membranes with 20.0 $\mu\textrm{m}$ thickness on a 5" Si wafer. The average thickness of fabricated 801 micro-membranes on one wafer 20.03$\mu\textrm{m}$ and the standard deviation was ${\pm}$0.26$\mu\textrm{m}$. The Si surface of the etch-stopped micro-membranes was extremely flat with no noticeable taper or nonuniformity. The results indicate that use of the electrochemical etch-stop method for the etching of Si in TMAH:IPA;pyrazine solutions provides a powerful and versatile alternative process for fabricating high-yield Si micro-membranes.

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TMAH/IPA/pyrazine용액에 있어서 전기화학적 식각정지법의 압력센서에의 응용 (Application of Electrochemical Etch-stop in TMAH/IPA/pyrazine Solution to Pressure Sensors)

  • 박진성;정귀상
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 1998년도 춘계학술대회 논문집
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    • pp.423-426
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    • 1998
  • Piezoresistive pressure sensors have fabricated using electrochemical etch-stop technique. Si diaphragm having thickness of n-epi. layer was fabricated and used to detect pressure range from 0 to 1 kg/$\textrm{cm}^2$. Piezoresistors were diffused 3${\times}$10$\^$18/ cm$\^$-3/ and placed at diaphragm edge for maximum pressure detection. The characteristics of electrochemical etch-stop in TMAH/lPA/pyrazine solution were also discussed. I-V curves of n and p-type Si in TMAH/lPA/pyrazine solution were obtained. Etching rate is highest at optimum etching condition, TMAH 25wt.%/IPA 17vo1.%/pyrazine 0.1/100m1, thus the elapsed time of etch-stop was reduced.

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TMAH/IPA/Pyrazine 수용액에서 전기화학적 식각정지법을 이용한 Si 기판의 미세가공 (Micromachining of Si substrate Using Electrochemical Etch-Stop in Aqueous TMAH/IPA/pyrazine Solution)

  • 박진성;정귀상
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 1997년도 추계학술대회 논문집
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    • pp.397-400
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    • 1997
  • This paper presentes the characteristics of Si anisotropic etching and electrochemical etch-stop in aqueous TMAH/IPA/pyrazine solution. (100) Si etching rate of 0.747 $\mu\textrm{m}$/min which faster 86% than TMAH 25 wt.%/IPA 17 vol.% solution was obtained using best etching condition at TMAH 25 wt.%/IPA 17 vol.%/pyrazine 0.1 g and the etching rate of (100) Si was decreased with more additive quantity of pyrazine. I-V curve of p-type Si in TMAH/IPA/pyrazine was obtained. OCP(Open Circuit Potential) and PP(Passivation Potential) were -2 V and -0.9 V, respectively. Si diaphragms were obtained by electrochemical etch-stop in aqueous TMAH/IPA/pyrazine solution.

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과부하 방지용 마이크로머시닝 세라믹 박막형 압력센서의 제작과 그 특성 (Fabrication of a micromachined ceramic thin-film type pressure sensor for high overpressure tolerance and Its characteristics)

  • 김재민;정귀상
    • 센서학회지
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    • 제12권5호
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    • pp.199-204
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    • 2003
  • 본 논문에서는 Ta-N 스트레인게이지를 이용한 극한 환경용 세라믹 박막형 압력센서의 제작 및 특성에 관하여 연구하였다. 압력감지부로 Ta-N 스트레인게이지를 사용하였으며, SDB(Si-wafer Direct Bonding)와 전기화학적 식각정지법을 이용하여 매몰 cavity를 가지는 저가격 고수율의 Si 박막 다이어프램을 제작하였다. 또한, 실리콘 박막 다이어프램상에 박막형 스트레인게이지를 형성하여 세라믹 박막형 압력센서를 제작하였다. 제작된 세라믹 박막형 압력 센서는 기존의 스트레인 게이지를 이용한 로드셀에 비해서 온도특성이 우수하고 재현성, 소형화, 집적화 및 저가격화가 가능하기 때문에 고온, 고압 등의 각한 환경에서도 사용이 가능할 것으로 기대된다.