• Title/Summary/Keyword: $RfC_w$

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A study on Improving Intermodulaton Signal of the RF Power Amplifier Using Microwave Absorber (전파흡수체에 의한 전력증폭기의 혼변조 신호의 개선 효과에 관한 연구)

  • 양승국;전중성;김민정;예병덕;김동일
    • Proceedings of the Korean Institute of Navigation and Port Research Conference
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    • 2003.05a
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    • pp.92-96
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    • 2003
  • In this paper, 30 W power Amplifier for IMT-2000 repeater was developed gain flatness and the third IMD (Intermodulation distortion) by Microwave absorber. The absorption ability of the absorber is measured up to -10 ㏈ and -4 ㏈ at 3.6 ㎓, 2.3 ㎓ band respectively. Non using absorber power amplifier has the gain over 57 ㏈, the gain flatness of ${\pm}$0.33 ㏈ and the third IMD of 27 ㏈c at 33.3 W output. Otherwise, using absorber power amplifier has the gain over 58㏈, the gain flatness of less than ${\pm}$0.9, the third IMD over 29 ㏈c at the same output power. As a result, the characteristic of the different type show improvement of 1 ㏈ in gain, 0.3 ㏈ in Gain flatness and 1.77 ㏈c in IMD.

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Reel-to-reel Deposition of $Y_2O_3$ Buffer Layer on Ni-W Metal Substrates by the RF-sputtering (RF-스퍼터링법을 이용하여 Ni-W 금속기판에 연속공정으로 증착된 $Y_2O_3$ 완충층 특성 연구)

  • Chung, K.C.;Jeong, T.J.;Choi, G.C.;Kim, Y.K.;Wang, X.L.;Dou, S.X.
    • Progress in Superconductivity
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    • v.11 no.2
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    • pp.100-105
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    • 2010
  • Reel-to-reel deposition of $Y_2O_3$ has been performed on Ni-5%W metal substrates using the RF-sputtering method. The epitaxial orientation of $Y_2O_3$ buffer layers to the base bi-axially textured substrate was well identified using ${\theta}-2{\theta}$, out-of-plane ($\omega$), and in-plane ($\phi$) scans in X-ray diffraction analysis. The optimization of $Y_2O_3$ seed layers in reel-to-reel fashion were investigated varying the deposition temperature, sputtering power, and pressure for its significant roles for the following buffer stacks and superconducting layers. $Y_2O_3$ were all grown epitaxially on bi-axially textured metal substrates at 380 watts and 5 mTorr in the temperature range of $600-740^{\circ}C$ with higher $Y_2O_3$ (400) intensities at ${\sim}710^{\circ}C$. It was found that the $\Delta\omega$ values were $1-2^{\circ}$ lower but the $\Delta\phi$ values were above $1^{\circ}$ higher than that of Ni-W substrates. As the sputtering power increased from 340 to 380 watts, $\Delta\omega$ and $\Delta\phi$ values showed decreased tendency. Even in the small window of deposition pressure of 3-7 mTorr, the $Y_2O_3$ (400) intensities increased and $\Delta\omega$ and $\Delta\phi$ values were reduced as sputtering pressure increased.

Effect of plasmid curing on the production of siderophore from glutamic acid as both carbon and nitrogen sole sources in Acinetobacter sp. B-W (글루탐산을 유일한 탄소 원과 질소 원으로 이용하는 Acinetobacter sp. B-W의 글루탐산으로부터의 시드로포어 생산에 미치는 플라스미드 제거 효과)

  • Kim, Kyoung-Ja;Lee, Jae-Rim;Yang, Yong-Joon
    • Korean Journal of Microbiology
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    • v.54 no.3
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    • pp.266-271
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    • 2018
  • Effect of plasmid curing of Acinetobacter sp. B-W on the production of siderophore from glutamic acid as both carbon and nitrogen sole sources was investigated. Plasmid cured mutant of strain B-W lost the ability to produce siderophore from glutamic acid at $28^{\circ}C$. Transformant E. coli $DH5{\alpha}$ harboring 20 kb plasmid, that was isolated from wild type of strain B-W produced siderophore from glutamic acid as both carbon and nitrogen sole sources at $28^{\circ}C$, but, not at $36^{\circ}C$. Production of siderophore from glutamic acid by transformant E. coli $DH5{\alpha}$ was completely inhibited by $10{\mu}M\;FeCl_3$. In previous report, catechol nature of siderophore produced from glutamic acid by strain B-W was detected by Arnow test. The siderophore produced from glutamic acid by transformant E. coli $DH5{\alpha}$ was also catechol type. Rf value of siderophore produced from transformant E. coli $DH5{\alpha}$ grown in medium glutamic acid as both carbon and nitrogen sole sources at $28^{\circ}C$ was 0.32 in butanol-acetic acid-water (12:3:5) as developing solvent. Rf value of the siderophore was the same with that of wild type of strain B-W. Thus a single plasmid of 20 kb seemed to be involved in the production of siderophore from glutamic acid.

LC Alignment Effects using a-C:H Thin Film as Working Gas at Bias Condition (바이어스 조건하에서 증착한 a-C:H 박막을 이용한 액정배향 효과)

  • 황정연;조용민;서대식;노순준;백홍구
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.16 no.11
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    • pp.1019-1022
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    • 2003
  • We studied the nematic liquid crystal (NLC) aligning capabilities using the new alignment material of a-C:H thin film as working gas at 30W rf bias condition. A high pretilt angle of about 5$^{\circ}$ by ion beam(IB) exposure on the a-C:H thin film surface was measured. A good LC alignment by the IB alignment method on the a-C:H thin film surface was observed at annealing temperature of 250$^{\circ}C$, and the alignment defect of the NLC was observed above annealing temperature of 300$^{\circ}C$. Consequently, the high LC pretilt angle and the good thermal stability of LC alignment by the IB alignment method on the a-C:H thin film surface as working gas at 30W rf bias condition can be achieved.

Reliability Measurements and Thermal Stabilities of W-C-N Thin Films Using Nanoindenter (Nanoindenter를 이용한 W-C-N 박막의 신뢰도 측정과 열적 안정성 연구)

  • Kim, Joo-Young;Oh, Hwan-Won;Kim, Soo-In;Choi, Sung-Ho;Lee, Chang-Woo
    • Journal of the Korean Vacuum Society
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    • v.20 no.3
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    • pp.200-204
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    • 2011
  • In this paper, we deposited the tungsten carbon nitride (W-C-N; nitrogen gas flow of 2 sccm) and tungsten carbon (W-C) thin film on silicon substrate using rf magnetron sputter. Then the thin films annealed at $800^{\circ}C$ during 30 minute ($N_2$ gas ambient) for thermal damage. Nano-indenter was executed 16 points on thin film surface to measure the thermal stability, and we also propose the elastic modulus and the Weibull distribution, respectively. This nanotribology method provides statistically reliable information. From these results, the W-C-N thin film included nitrogen gas flow is more stable for film uniformities, physical properties and crystallinities than that of not included nitrogen gas flow.

Measurement of Grain Moisture Content using RF Impedance (I) - Electrical Properties of Grain - (고주파 임피던스를 이용한 곡류의 함수율 측정에 관한 연구 (I) - 곡류의 전기적 특성 구명 -)

  • 김기복;노상하
    • Journal of Biosystems Engineering
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    • v.24 no.2
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    • pp.123-134
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    • 1999
  • The electrical properties such as dielectric constant, dielectric loss factor and AC conductivity of grain were presented to measure the moisture content of grain using RF impedance. At frequency ranging from 1 to 10MHz and room temperature, $20^{\circ}C$, vector network analyzer(HP4195) and coaxial type sample holder were used to analyze the electrical properties of paddy(11∼24%w.b.), brown rice(11∼18%w.b.), barley(11∼21%w.b.) and wheat(11∼23%w.b.) depending on the moisture content, frequency and bulk density. The dielectric constant and AC conductivity of grain samples increased with moisture content and bulk density. The dielectric constants decreased with frequency and could be expressed as function of the moisture density(decimal moisture $content{\times}bulk$ density).

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Fabrication and Characterization of Buried Resistor for RF MCM-C (고주파 MCM-C용 내부저항의 제작 및 특성 평가)

  • Cho, H. M.;Lee, W. S.;Lim, W.;Yoo, C. S.;Kang, N. K.;Park, J. C.
    • Journal of the Microelectronics and Packaging Society
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    • v.7 no.1
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    • pp.1-5
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    • 2000
  • Co-fired resistors for high frequency MCM-C (Multi Chip Module-Cofired) were fabricated and measured their RF properties from DC to 6 GHz. LTCC (Low Temperature Co-fired Ceramics) substrates with 8 layers were used as the substrates. Resisters and electrodes were printed on the 7th layer and connected to the top layer by via holes. Deviation from DC resistance of the resistors was resulted from the resister pastes, resistor size, and via length. From the experimental results, the suitable equivalent circuit model was adopted with resistor, transmission line, capacitor, and inductor. The characteristic impedance $Z_{o}$ of the transmission line from the equivalent circuit can explain the RF behavior of the buried resistor according to the structural variation.

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V-I Characteristics of $(Sr_{0.85}Ca_{0.15})TiO_3$ Thin Film by RF Sputtering Method (RF 스퍼터링법에 의한 $(Sr_{0.85}Ca_{0.15})TiO_3$ 박막의 전압-전류 특성)

  • Kim, J.S.;Cho, C.N.;Shin, C.G.;Choi, W.S.;Kim, C.H.;Lee, J.U.
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2000.04b
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    • pp.88-91
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    • 2000
  • The $(Sr_{0.85}Ca_{0.15})TiO_3$(SCT) thin films are deposited on Pt-coated electrode(Pt/TiN/$SiO_2$/Si) using RF sputtering method. The crystallinity of SCT thin films is increased with increase of substrate temperature in the temperature range of 200~500$[^{\circ}C]$. V-I characteristics of SCT thin films show the increasing leakage current with the increases of deposition temperature. The conduction mechanism of the SCT thin films observed in the temperature range of 25~100$[^{\circ}C]$ can be divided into four characteristic regions with different mechanism by the increasing current.

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An Open Bridcage RF coil for Magnetic Rresonance Imaging (자기공명영상을 위한 개방형 새장 고주파코일)

  • Lee, S.Y.;Yi, J.H.;Yi, W.;Mun, C.W.;Cho, M.H.
    • Journal of the Korean Institute of Telematics and Electronics S
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    • v.35S no.5
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    • pp.42-47
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    • 1998
  • Bridcage RF coil is one of the most widely used RF coils in MRI. In order to use birdcage RF coils in open MRI systems, an open tructured birdcage RF coil has been investigated. By opening the ring structure of an original birdcage RF coil and driving the coil at two opening ends, the original birdcage RF coil can be modified to an open structured coil. In order to improve magnetic field uniformity of the open birdcage RF coil, driving voltage phases at the two opening ends can be controlled to be in-phase or out-of-phase each other. Operating frequency of the open birdcage RF coil has been theoretically derived, and the theoretical derivation has been verified by experiments.

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a-Si TFT 제작시 RF-power 가변에 따른 전기적 특성

  • Baek, Gyeong-Hyeon;Jeong, Seong-Uk;Jang, Gyeong-Su;Yu, Gyeong-Yeol;An, Si-Hyeon;Jo, Jae-Hyeon;Park, Hyeong-Sik;Lee, Jun-Sin
    • Proceedings of the Korean Vacuum Society Conference
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    • 2011.02a
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    • pp.116-116
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    • 2011
  • 오늘날 표시장치는 경량, 고밀도, 고해상도 대면적화의 요구에 의해 TFT-LCD의 발전이 이루어졌다. TFT에는 반도체 재료로서, Poly-Si을 사용하는 Poly-Si TFT와 a-Si:H를 이용하는 a-Si;H TFT가 있는데 a-Si는 $350^{\circ}C$ 이하의 저온으로 제작이 가능하여 많이 사용되고 있다. 이러한 방향에 맞추어 bottom gate 구조의 a-Si TFT 실험을 진행하였다. P-type silicon substrate ($0.01{\sim}0.02{\Omega}-cm$)에 gate insulator 층인 SiNx (SiH4 : NH3 = 6:60)를 200nm 증착하였다. 그리고 그 위에 active layer 층인 a-Si (SiH4 : H2 : He =2.6 : 10 : 100)을 다른 RF power를 적용하여 100 nm 증착하였다. 그 위에 Source와 Drain 층은 Al 120 nm를 evaporator로 증착하였다. active layer, gate insulator 층은 ICP-CVD 장비를 이용하여 증착하였으며, 공정온도는 $300^{\circ}C$ 로 고정하였다. active layer층 증착시 RF power는 100W, 300W, 500W, 600W로 가변하였고, width/length는 100 um/8um로 고정하였다. 증착한 a-Si layer층을 Raman spectroscope, SEM 측정 하였으며, TFT 제작 후, VG-ID, VD-ID 측정을 통해 전기적 특성인 Threshold voltage, Subthreshold swing, Field effect mobility, ON/OFF current ratio를 비교해 보았다.

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