Journal of the Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회논문지)

The Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회)
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LC Alignment Effects using a-C:H Thin Film as Working Gas at Bias Condition

바이어스 조건하에서 증착한 a-C:H 박막을 이용한 액정배향 효과

  • 황정연 (연세대학교 전기전자공학과) ;
  • 조용민 (연세대학교 전기전자공학과) ;
  • 서대식 (연세대학교 전기전자공학과) ;
  • 노순준 (연세대학교 재료공학부) ;
  • 백홍구 (연세대학교 재료공학부)
  • Published : 2003.11.01
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Abstract

We studied the nematic liquid crystal (NLC) aligning capabilities using the new alignment material of a-C:H thin film as working gas at 30W rf bias condition. A high pretilt angle of about 5$^{\circ}$ by ion beam(IB) exposure on the a-C:H thin film surface was measured. A good LC alignment by the IB alignment method on the a-C:H thin film surface was observed at annealing temperature of 250$^{\circ}C$, and the alignment defect of the NLC was observed above annealing temperature of 300$^{\circ}C$. Consequently, the high LC pretilt angle and the good thermal stability of LC alignment by the IB alignment method on the a-C:H thin film surface as working gas at 30W rf bias condition can be achieved.

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References

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