The Development of Deep Silicon Etch Process with Conventional Inductively Coupled Plasma (ICP) Etcher (범용성 유도결합 플라즈마 식각장비를 이용한 깊은 실리콘 식각)
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- Journal of the Korean Institute of Electrical and Electronic Material Engineers
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- v.17 no.7
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- pp.701-707
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- 2004