• Title/Summary/Keyword: thin film diode

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Improvement of Permeation of applied Multi-Layer Encapsulation of thin films on Ethylene Terephthalate(PET) (고분자 기판위의 다층 보호막의 성능 평가)

  • Kim, Jong-Hwan;Han, Jin-Woo;Kang, Hee-Jin;Kim, Jong-Yeon;Moon, Hyun-Chan;Choi, Sung-Ho;Park, Kwang-Bum;Kim, Tae-Ha;Kim, Hwi-Woon;Seo, Dae-Shik
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2006.04a
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    • pp.60-61
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    • 2006
  • In this paper, the inorganic-organic thin film encapsulation layer was newly adopted to protect the organic layer from moisture and oxygen. Using the electron beam, Sputter and Spin-Coater system, the various kinds of inorganic and organic thin-films were deposited onto the Ethylene Terephthalate(PET) and their interface properties between organic and inorganic layer were investigated. Results indicates that the SiON/PI/SiON/PI/PET barrier coatings have high potential for flexible organic light-emitting diode(OLEO) applications.

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Femtosecond laser pattering of ITO film on flexible substrate (펨토초 레이저를 이용한 플렉시블 ITO 패터닝 연구)

  • Sohn, Ik-Bu;Kim, Young-Seop;Noh, Young-Chul
    • Laser Solutions
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    • v.13 no.1
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    • pp.11-15
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    • 2010
  • Indium tin oxide (ITO) provides high electrical conductivity and transparency in the visible and near IR (infrared) wavelengths. Thus, it is widely used as a transparent electrode for the fabrication of liquid crystal displays (LCDs) and organic light emitting diode displays (OLRDs), photovoltaic devices, and other optical applications. Lasers have been used for removing coating on polymer substrate for flexible display and electronic industry. In selective removal of ITO layer, laser wavelength, pulse energy, scan speed, and the repetition rate of pulses determine conditions, which are efficient for removal of ITO coating without affecting properties of the polymer substrate. ITO coating removal with a laser is more environmentally friendly than other conventional etching methods. In this paper, pattering of ITO film from polymer substrates is described. The Yb:KGW femtosecond laser processing system with a pulse duration of 250fs, a wavelength of 1030nm and a repetition rate of 100kHz was used for removing ITO coating in air. We can remove the ITO coating using a scanner system with various pulse energies and scan speeds. We observed that the amount of debris is minimal through an optical and a confocal microscope, and femtosecond laser pulses with 1030nm wavelength are effective to remove ITO coating without the polymer substrate ablation.

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Characteristics and Gas Barrier Properties of Mg-Zn-F Films in Various Ratio of $MgF_2$ to Zn

  • Lee, Sung-Youp;Kim, Do-Eok;Shin, Byong-Wook;Kang, Byoung-Ho;Hong, Seok-Min;Kang, Shin-Won;Lee, Hyeong-Rag
    • 한국정보디스플레이학회:학술대회논문집
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    • 2009.10a
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    • pp.899-901
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    • 2009
  • The magnesium fluoride ($MgF_2$) has very higher optical transmission than oxide or nitride material applied for gas barrier, so we manufactured Mg-Zn-F films with Mg-Zn-F target mixed in the various ratio of $MgF_2$ to Zn and characterized films' properties. Zn is used to increase packing density of barrier film. Thickness and optical transmission of Mg-Zn-F are 200 nm and over 90 %, respectively. The result of water vapor transmission rate at 38, RH 90 ~ 100% of the Mg-Zn-F film deposited with 4 : 6 ($MgF_2$ : Zn) ratio target reached below $1{\times}10^{-3}g$/($m^2{\cdot}day$), measuring limit of instrument.

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Fabrication of Pd/poly 3C-SiC Schottky diode hydrogen sensors (Pd/다결정 3C-SiC 쇼트키 다이오드형 수소센서의 제작)

  • Chung, Dong-Yong;Chung, Gwiy-Sang
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2009.06a
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    • pp.236-236
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    • 2009
  • This paper describes the fabrication and characteristics of Schottky micro hydrogen sensors for high temperatures by using polycrystalline(poly) 3C - SiC thin film grown on Si substrates with thermal oxide layer using APCVD. Pd/poiy 3C-SiC Schottky diodes were made and evaluated by I-V and C-V measurements. Electric current density and barrier height voltage were $2\times10^{-3}\;A/cm^2$ and 0.58 eV, respectively. These devices could operate stably at about $400^{\circ}C$. According to $H_2$ concentrations, their barrier height($\Phi_{Bn}$) were changed 0.587 eV, 0.579 eV, 0.572 eV and 0.569 eV, respectively. the current was increased. Characteristics of implemented sensors have been investigated in terms of sensitivity, linearity of response, response rate and response time. Therefore, from these results, Pd/poly 3C-SiC Schottky devices have very high potential for high temperature chemical sensor applications.

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Application of Parylene Passivation for Top Emission Oragnic Light Emitting Diode (Top emission Organic Light Emitting Diode을 위한 Parylene 보호층의 적용)

  • Choi, Sung-Hoon;Lee, Chan-Jae;Moon, Dae-Gyu;Han, Jeong-In;Oh, Myung-Hwan
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2005.05a
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    • pp.160-163
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    • 2005
  • Top emission OLED 소자의 안정성 위하여 Parylene을 보호층으로 적용하였다. 고분자화 방법을 이용하여 증착된 Parylene은 진공공정상온에서 증착가능하기 때문에 열에 의한 OLED 소자의 열화를 방지하며 높은 광투과율과 우수한 투습습성에 의하여 고효율 장수명을 OLED 소자에 적합하다. Parylene 5 ${\mu}m$ 의 광투과율은 90 %이상 측정 되었으며 투습율은 0.4849 $g/m^2day$로 측정되었다. Parylene의 보호층로서의 영향을 살펴보기 위하여, 보호층이 형성된 소자와 보호층이 형성되지 않은 소자를 제작하여 대기중에서 그 특성을 측정 비교하였다. 두 제작된 top emission OLED 소자는 최대 휘도가 1000 $cd/m^2$ 이상 측정되었으며, parylene 보호층 공정에 의한 소자의 구동 특성 변화는 나타나지 않았다. 대기중에서 초기휘도 200 $cd/m^2$로 측정된 parylene 보호층이 형성된 소자는 수명이 5 이었고, 보호층이 형성되지 않는 소자의 수명에 비하여 2배 이상 증가하였다.

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Effect of Air Exposure on ZnO Thin Film for Electron Transport Layer of Quantum Dot Light-Emitting Diode (ZnO 박막 전자수송층의 공기 노출에 의한 양자점 발광다이오드의 특성 변화)

  • Eunyong Seo;Kyungjae Lee;Jeong Ha Hwang;Dong Hyun Kim;Jaehoon Lim;Donggu Lee
    • Journal of Sensor Science and Technology
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    • v.32 no.6
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    • pp.455-461
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    • 2023
  • We investigated the electrical characteristics of ZnO nanoparticles (NPs) with air exposure that is a widely used electron transport layer for quantum dot light-emitting diodes (QLEDs). Upon air exposure, we observed changes in the density of states (DOS) of the trap levels of ZnO NPs. In particular, with air exposure, the concentration of deep trap energy levels in ZnO NPs decreased and electron mobility significantly improved. Consequently, the air-exposed ZnO reduced leakage current by approximately one order of magnitude and enhanced the external quantum efficiency at the low driving voltage region of the QLED. In addition, based on the excellent conductivity properties, high-brightness QLEDs could be achieved.

Water Vapor Permeability of SiO2 Oxidative Thin Film by CVD (CVD로 제작된 SiO2 산화막의 투습특성)

  • Lee, Boong-Joo;Shin, Hyun-Yong
    • The Journal of the Korea institute of electronic communication sciences
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    • v.5 no.1
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    • pp.81-87
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    • 2010
  • In this paper, we have fabricated $SiO_2$ oxidation thin films by HDP-CVD(high density plasma-chemical vapor deposition) method for passivation layer or barrier layer of OLED(organic light emitting diode). We have control and estimate the deposition rate and relative index characteristics with process parameters and get optimized conditions. They are gas flow rate($SiH_4:O_2$=30:60[sccm]), 70 [mm] distance from source to substrate and no-bias. The WVTR(water vapor transmission rate) is 2.2 [$g/m^2$_day]. Therefore fabricated thin film can not be applied as passivation layer or barrier layer of OLED.

Improvement of Permeation of Solvent-free Multi-Layer Encapsulation of thin films on Ethylene Terephthalate(PET) (고분자 기판위에 유기 용매를 사용하지 않은 다층 박막 Encapsulation 기술 개발)

  • Kang, Hee-Jin;Han, Jin-Woo;Kim, Jong-Yeon;Moon, Hyun-Chan;Choi, Sung-Ho;Park, Kwang-Bum;Kim, Tae-Ha;Kim, Hwi-Woon;Seo, Dae-Shik
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2006.04a
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    • pp.56-57
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    • 2006
  • In this paper, the inorganic multi-layer thin film encapsulation was newly adopted to protect the organic layer from moisture and oxygen. Using the electron beam, Sputter, inorganic multi-layer thin-film encapsulation was deposited onto the Ethylene Terephthalate(PET) and their interface properties between inorganic and organic layer were investigated. In this investigation, the SiON SiO2 and parylene layer showed the most suitable properties. Under these conditions, the WVTR for PET can be reduced from a level of $0.57\;g/m^2/day$ (bare subtrate) to 1*10-5 g/$m^2$/day after application of a SiON and SiO2 layer. These results indicates that the PET/SiO2/SiON/Parylene barrier coatings have high potential for flexible organic light-emitting diode(OLED) applications.

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Structural Evolution of ZnO:Ga Thin Film on Profiled Substrate Grown by Radio Frequency Sputtering

  • Sun, J.H.;Kim, J.H.;Ahn, B.G.;Park, S.Y.;Jung, E.J.;Lee, J.H.;Kang, H.C.
    • Proceedings of the Korean Vacuum Society Conference
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    • 2011.02a
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    • pp.72-72
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    • 2011
  • Recently, Zinc oxide (ZnO) nano-structures have been received attractive attention because of their outstanding optical and electrical properties. It might be a promising material considered for applications to photonic and electronic devices such as ultraviolet light emitting diode, thin film transistor, and gas sensors. ZnO nano-structures can be typically synthesized by the VLS growth mode and self-assembly. In the VLS growth mode using various growth techniques, the noble metal catalysts such as Au and Sn were used. However, the growth of ZnO nano-structures on nano-crystalline Au seeds using radio frequency (RF) magnetron sputtering might be explained by the profile coating, i.e. the ZnO nano-structures were a morphological replica of Au seeds. Ga doped ZnO (ZnO:Ga) nano-structures using this concept were synthesized and characterized by XRD, AFM, SEM, and TEM. We found that surface morphology is drastically changed from initial islands to later sun-flower typed nano-structures. We will present the structural evolution of ZnO:Ga nano-structures with increasing the film thickness.

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Growth and characterization of molecular beam epitaxy grown GaN thin films using single source precursor with ammonia

  • Chandrasekar, P.V.;Lim, Hyun-Chul;Chang, Dong-Mi;Ahn, Se-Yong;Kim, Chang-Gyoun;Kim, Do-Jin
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.02a
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    • pp.174-174
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    • 2010
  • Gallium Nitride(GaN) attracts great attention due to their wide band gap energy (3.4eV), high thermal stability to the solid state lighting devices like LED, Laser diode, UV photo detector, spintronic devices, solar cells, sensors etc. Recently, researchers are interested in synthesis of polycrystalline and amorphous GaN which has also attracted towards optoelectronic device applications significantly. One of the alternatives to deposit GaN at low temperature is to use Single Source Molecular Percursor (SSP) which provides preformed Ga-N bonding. Moreover, our group succeeds in hybridization of SSP synthesized GaN with Single wall carbon nanotube which could be applicable in field emitting devices, hybrid LEDs and sensors. In this work, the GaN thin films were deposited on c-axis oriented sapphire substrate by MBE (Molecular Beam Epitaxy) using novel single source precursor of dimethyl gallium azido-tert-butylamine($Me_2Ga(N_3)NH_2C(CH_3)_3$) with additional source of ammonia. The surface morphology, structural and optical properties of GaN thin films were analyzed for the deposition in the temperature range of $600^{\circ}C$ to $750^{\circ}C$. Electrical properties of deposited thin films were carried out by four point probe technique and home made Hall effect measurement. The effect of ammonia on the crystallinity, microstructure and optical properties of as-deposited thin films are discussed briefly. The crystalline quality of GaN thin film was improved with substrate temperature as indicated by XRD rocking curve measurement. Photoluminescence measurement shows broad emission around 350nm-650nm which could be related to impurities or defects.

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