Characteristics and Gas Barrier Properties of Mg-Zn-F Films in Various Ratio of $MgF_2$ to Zn

  • Lee, Sung-Youp (Dept. of Nano-Science and Technology, Kyungpook National University) ;
  • Kim, Do-Eok (School of Electrical Engineering and Computer Science, Dept. Kyungpook National University) ;
  • Shin, Byong-Wook (Dept. of Physics, Kyungpook National University) ;
  • Kang, Byoung-Ho (School of Electrical Engineering and Computer Science, Dept. Kyungpook National University) ;
  • Hong, Seok-Min (Dept. of Sensor an Display Engineering, Kyungpook National University) ;
  • Kang, Shin-Won (School of Electrical Engineering and Computer Science, Dept. Kyungpook National University) ;
  • Lee, Hyeong-Rag (Dept. of Nano-Science and Technology, Kyungpook National University)
  • Published : 2009.10.12

Abstract

The magnesium fluoride ($MgF_2$) has very higher optical transmission than oxide or nitride material applied for gas barrier, so we manufactured Mg-Zn-F films with Mg-Zn-F target mixed in the various ratio of $MgF_2$ to Zn and characterized films' properties. Zn is used to increase packing density of barrier film. Thickness and optical transmission of Mg-Zn-F are 200 nm and over 90 %, respectively. The result of water vapor transmission rate at 38, RH 90 ~ 100% of the Mg-Zn-F film deposited with 4 : 6 ($MgF_2$ : Zn) ratio target reached below $1{\times}10^{-3}g$/($m^2{\cdot}day$), measuring limit of instrument.

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