• Title/Summary/Keyword: sputtering film

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Flexible CdS Films for Selective control of Transmission of Electromagnetic Wave (유연성 기판위에 스퍼터링법으로 제조한 CdS 박막의 전자파차폐 특성평가)

  • Hur, Sung-Gi;Cho, Hyun-Jin;Jung, Hyun-Jun;Ahn, Jun-Ku;Yoon, Soon-Gil
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2009.06a
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    • pp.27-27
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    • 2009
  • Non-stochiometric CdS:H films grown on polyethersulfon (PES) flexible polymer substrates at room temperature by R.F. sputtering technique. They exhibited a dark- and photo-sheet resistance of $2.7\times10^5$ and $\sim\;50\;{\Omega}$/square, respectively. These values were realized by an optimum control of both hydrogen doping-levels and the surface morphologies of the films. The comparison between the real and the simulated results for the shielding and the transmission by the free space measurement system in the X-band frequency range (8.2 - 12.4 GHz) was also addressed in this study. Samples overlapped with 13 layers of CdS:H/PES were consistent with the transmission results of pure aluminum metal films ($0.1\;{\Omega}$/square) deposited on PES substrates. As a result, by the simples tacking of the CdS:H/PES layers, the perfect control of the shielding and the transmission of the EM wave in the range of X-band frequency is possible by avisible light alone, and their results are especially very outstanding findings in the stealth function of the radome(Radar+Dome) such as aircrafts, ships, and missiles.

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Effects of ICP Power on the Properties of TiCrN Films (유도결합플라즈마의 전력이 TiCrN 코팅층에 미치는 영향)

  • Cha, B.C.;Kim, J.H.;Lee, B.S.;Kim, S.K.;Kim, D.W.;Kim, D.;You, Y.Z.
    • Journal of the Korean Society for Heat Treatment
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    • v.22 no.5
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    • pp.307-311
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    • 2009
  • In this study, TiCrN films were deposited on STS 316 Land Si (100) wafer by inductively coupled plasma (ICP) assisted D.C. magnetron sputtering. The effect R.F. power for ICP discharge on the mechanical properties of TiCrN films was investigated. XRD, XPS and FE-SEM were used for the structure analysis. Also the Micro-Knoop hardness tester and profilometer were used for measuring hardness of coatings and film stress respectively. As increasing the R.F. power for ICP discharge, thickness of coating was decreased from 1633 nm to 1288 nm but hardness was increased about $Hk_{5g}$ 4200 at 400 W. All of the XRD patterns showed (111), (200) and (220) peaks of TiCrN films. Surface morphology was studied using the profilometer. FE-SEM was used to know morphology and cross-section of the films. Structure of the films was changed dense as increased ICP power.

Crystalline Structure and Cu Diffusion Barrier Property of Ta-Si-N Films (Ta-Si-N박막의 조성에 따른 결정구조 및 구리 확산 방지 특성 연구)

  • Jung, Byoung-Hyo;Lee, Won-Jong
    • Korean Journal of Materials Research
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    • v.21 no.2
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    • pp.95-99
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    • 2011
  • The microstructure and Cu diffusion barrier property of Ta-Si-N films for various Si and N compositions were studied. Ta-Si-N films of a wide range of compositions (Si: 0~30 at.%, N: 0~55 at.%) were deposited by DC magnetron reactive sputtering of Ta and Si targets. Deposition rates of Ta and Si films as a function of DC target current density for various $N_2/(Ar+N_2)$ flow rate ratios were investigated. The composition of Ta-Si-N films was examined by wavelength dispersive spectroscopy (WDS). The variation of the microstructure of Ta-Si-N films with Si and N composition was examined by X-ray diffraction (XRD). The degree of crystallinity of Ta-Si-N films decreased with increasing Si and N composition. The Cu diffusion barrier property of Ta-Si-N films with more than sixty compositions was investigated. The Cu(100 nm)/Ta-Si-N(30 nm)/Si structure was used to investigate the Cu diffusion barrier property of Ta-Si-N films. The microstructure of all Cu/Ta-Si-N/Si structures after heat treatment for 1 hour at various temperatures was examined by XRD. A contour map that shows the diffusion barrier failure temperature for Cu as a function of Si and N composition was completed. At Si compositions ranging from 0 to 15 at.%, the Cu diffusion barrier property was best when the composition ratio of Ta + Si and N was almost identical.

DLC Structure Layer for Piezoelectric MEMS Switch (압전 MEMS 스위치 구현을 위한 DLC 구조층에 관한 연구)

  • Hwang, Hyun-Suk;Lee, Kyong-Gun;Yu, Young-Sik;Lim, Yun-Sik;Song, Woo-Chang
    • Journal of Satellite, Information and Communications
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    • v.6 no.1
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    • pp.28-31
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    • 2011
  • In this paper, a new set of structural and sacrificial material that is diamond like carbon (DLC)/photoresist for high performance piezoelectric RF-MEMS switches which are actuated in d33 mode is suggested. To avoid curing problem of photoresist sacrificial layer, DLC structure layer is deposited at room temperature by radio frequency plasma enhanced chemical vapor deposition (RF-PECVD) method. And lead zirconate titanate (PZT) piezoelectric layer is deposited on structure layer directly at room temperature by rf magnetron sputtering system and crystallized by rapid thermal annealing (RTA) equipment. Particular attention is paid to the annealing of PZT film in order to crystallize into perovskite and the variation of mechanical properties of DLC layer as a function of annealing temperature. The DLC layer shows good performance for structure layer in aspect to Young's modulus and hardness. The fabrication becomes much simpler and cheaper with use of a photoresist.

The Influence of Al Underlayer on the Optical and Electrical Properties of GZO/Al Thin Films

  • Kim, Sun-Kyung;Kim, So-Young;Kim, Seung-Hong;Jeon, Jae-Hyun;Gong, Tae-Kyung;Kim, Daeil;Choi, Dong-Hyuk;Son, Dong-Il
    • Transactions on Electrical and Electronic Materials
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    • v.14 no.6
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    • pp.321-323
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    • 2013
  • 100 nm thick Ga doped ZnO (GZO) thin films were deposited with DC and RF magnetron sputtering at room temperature on glass substrate and Al coated glass substrate, respectively. and the effect of the Al underlayer on the optical and electrical properties of the GZO films was investigated. As-deposited GZO single layer films had an optical transmittance of 80% in the visible wavelength region, and sheet resistance of 1,516 ${\Omega}/{\Box}$, while the optical and electrical properties of GZO/Al bi-layered films were influenced by the thickness of the Al buffer layer. GZO films with 2 nm thick Al film show a lower sheet resistance of 990 ${\Omega}/{\Box}$, and an optical transmittance of 78%. Based on the figure of merit (FOM), it can be concluded that the thin Al buffer layer effectively increases the performance of GZO films as a transparent and conducting electrode without intentional substrate heating or a post deposition annealing process.

Electrical and structural properties of back reflecting layer with AZO-Ag bilayer structure on a stainless steel substrate for thin film Si based solar cell applications (Flexible 박막 Si태양전지 응용을 위한 SUS기판 위의 AZO-Ag 이중구조 배면전극의 전기/구조적 특성)

  • Hong, ChangWoo;Choi, YoungSung;Park, Jaecheol;Lee, JongHo;Kim, TaeWon
    • 한국신재생에너지학회:학술대회논문집
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    • 2011.05a
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    • pp.125.1-125.1
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    • 2011
  • 빛 에너지를 전기에너지로 변환하는 발전소자인 태양전지는 청정 재생 에너지원으로 최근 Si 박막 태양전지의 고 효율화를 위해 여러 기술적인 면에서 개발되어지고 있다. 현재 박막형 태양전지는 실리콘계가 주류를 이루고 있으며, 유리 혹은 유연성기판(금속 or 고분자)에 비정질 실리콘 박막을 형성시킨 태양전지와 실리콘웨이퍼의 양면에 태양전지를 형성함으로써 효율을 극대화시킨 이종접합태양전지 등이 연구되고 있다. 특히 flexible 태양전지는 hard 기판에 비해 비교적 저가인 플라스틱 필름과 금속 foil을 기판으로 이용함으로서 저가화가 용이하며, 가볍고 유연성을 갖추고 있어 휴대와 시공에 있어 매우 우수한 장점을 가지고 있다. 본 연구에서는 flexible 기판(stainless steel)을 이용하여 태양전지 내 반사막 층이 미치는 영향을 알아보기 위하여 AZO/Ag 이중구조 박막의 특성을 연구하였다. RF magnetron sputtering system을 이용하였으며, 상온에서 Ag/AZO 이중구조 박막을 제조하였다. stainless steel 기판 위에 Ag층을 25nm 두께로 증착하였으며 연속공정으로 AZO 박막을 100~500nm의 두께경사를 가지도록 성장시켰다. 이 때의 AZO/Ag 이중구조 박막의 표면 morphology는 AFM 분석결과 7nm~3nm의 값을 나타내었으며, AZO 박막의 두께가 증가할수록 rms 값이 감소하는 경향을 보여주었다. 본 발표에서는 flexible 기판 상에 성장된 AZO/Ag 이중구조 박막의 전기적, 광학적 특성 등에 관하여 추가적으로 토론한 후 태양전지 효율 중 흡수층 내 반사막 층이 미치는 역할을 알아보겠다.

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Gas sensing properties of polyacrylonitrile/metal oxide nanofibrous mat prepared by electrospinning

  • Lee, Deuk-Yong;Cho, Jung-Eun;Kim, Ye-Na;Oh, Young-Jei
    • Journal of Sensor Science and Technology
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    • v.17 no.4
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    • pp.281-288
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    • 2008
  • Polyacrylonitrile(PAN)/metal oxide(MO) nanocomposite mats with a thickness of 0.12 mm were electrospun by adding 0 to 10 wt% of MO nanoparticles ($Fe_2O_3$, ZnO, $SnO_2$, $Sb_2O_3-SnO_2$) into PAN. Pt electrode was patterned on $Al_2O_3$ substrate by DC sputtering and then the PAN(/MO) mats on the Pt patterned $Al_2O_3$ were electrically wired to investigate the $CO_2$ gas sensing properties. As the MO content rose, the fiber diameter decreased due to the presence of lumps caused by the presence of MOs in the fiber. The PAN/2% ZnO mat revealed a faster response time of 93 s and a relatively short recovery of 54 s with a ${\Delta}R$ of 0.031 M${\Omega}$ at a $CO_2$ concentration of 200 ppm. The difference in sensitivity was not observed significantly for the PAN/MO fiber mats in the $CO_2$ concentration range of 100 to 500 ppm. It can be concluded that an appropriate amount of MO nanoparticles in the PAN backbone leads to improvement of the $CO_2$ gas sensing properties.

Fabrication and Evaluation of the SnO2 Based Gas Sensor for CO and NOx Detection (SnO2를 이용한 CO 및 NOx 가스 감지 센서 제작 및 특성 연구)

  • Kim, Man Jae;Lee, Yu-Jin;Ahn, Hyo-Jin;Lee, Sang Hoon
    • Transactions of the Korean Society of Automotive Engineers
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    • v.23 no.5
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    • pp.515-523
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    • 2015
  • In this paper, we fabricated and evaluated the gas sensor for the detection of CO gas and $NO_X$ gas among the vehicle exhaust emission gasses. The $SnO_2$ (tin dioxide) layer is used as the detection material, and the thin-film type and the nano-fiber type layers are deposited with various thicknesses using sputtering method and electro spinning method, respectively. The experiments are performed in the chamber where the gas concentration is controlled with mass flow controller. The fabricated devices are applied to the CO and $NO_X$ gas, where the device with the thinner $SnO_2$ layer shows better sensitivity. The nano-fiber has the larger surface area, and the shorter response time and recovery time are obtained. From the experimental results, both types of gas sensors successfully detect CO and $NO_X$ gases, which can be applied to measure those gases from the vehicle emissions.

Fabrication and Characteristics of FET-type Pressure Sensor Using Piezoelectric PZT Thin Film (압전체 PZT 박막을 이용한 FET형 압력 센서의 제작과 그 특성)

  • Kim, Young-Jin;Lee, Young-Chul;Kwon, Dae-Hyuk;Sohn, Byung-Ki
    • Journal of Sensor Science and Technology
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    • v.10 no.3
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    • pp.173-179
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    • 2001
  • The currently used semiconductor pressure sensors are piezoresistive and capacitive type. Especially, semiconductor micro pressure sensors have a great deal of attention because of their small size. However, its fabrication processes are difficult, so that its yield is poor. For the purpose of resolving the drawbacks of the existing silicon pressure sensors, we demonstrate a new type of pressure sensor using PSFET(pressure sensitive field effect transistor) and investigate its operational characteristics. We used PZT(Pb(Zr,Ti)$O_3$) as a pressure sensing material. PZT thin films were deposited on a gate oxide of MOSFET by an rf-magnetron sputtering method. To abtain the stable phase, perovskite structure, furnace annealing technique have been employed in PbO ambient. The sensitivity of the PSFET was 0.38 mV/mmHg.

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Effect of Ar Ion Irradiation on the Hydrogen Gas Sensitivity of SnO2 Thin Films (Ar 이온빔 조사에 따른 SnO2 박막의 물성 연구)

  • Heo, S.B.;Lee, Y.J.;Kim, S.K.;You, Y.Z.;Choi, D.H.;Lee, B.H.;Kim, M.G.;Kim, Daeil
    • Journal of the Korean Society for Heat Treatment
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    • v.25 no.6
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    • pp.279-282
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    • 2012
  • $SnO_2$ thin films were prepared on the Si substrate by radio frequency (RF) magnetron sputtering and then surface of the films were irradiated with intense Ar ion beam to investigate the effect of Ar ion irradiation on the properties and hydrogen gas sensitivity of the films. From atomic force microscope observation, it is supposed that intense Ar bombardments promote rough surface and increase gas sensitivity of $SnO_2$ films for hydrogen gas. The films that Ar ion beam irradiated at 6 keV show the higher sensitivity than the films were irradiated at 3 keV and 9 keV. These results suggest that the $SnO_2$ thin films irradiated with optimized Ar ion beam are promising for practical high-performance hydrogen gas sensors.