Journal of the Korean Society for Heat Treatment (열처리공학회지)

The Korean Society for Heat Treatment (한국열처리공학회)
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Effects of ICP Power on the Properties of TiCrN Films

유도결합플라즈마의 전력이 TiCrN 코팅층에 미치는 영향

  • Cha, B.C. (School of Material Science and Engineering, University of Ulsan) ;
  • Kim, J.H. (School of Material Science and Engineering, University of Ulsan) ;
  • Lee, B.S. (School of Material Science and Engineering, University of Ulsan) ;
  • Kim, S.K. (School of Material Science and Engineering, University of Ulsan) ;
  • Kim, D.W. (School of Material Science and Engineering, University of Ulsan) ;
  • Kim, D. (School of Material Science and Engineering, University of Ulsan) ;
  • You, Y.Z. (School of Material Science and Engineering, University of Ulsan)
  • 차병철 (울산대학교 첨단소재공학부) ;
  • 김준호 (울산대학교 첨단소재공학부) ;
  • 이병석 (울산대학교 첨단소재공학부) ;
  • 김선광 (울산대학교 첨단소재공학부) ;
  • 김대욱 (울산대학교 첨단소재공학부) ;
  • 김대일 (울산대학교 첨단소재공학부) ;
  • 유용주 (울산대학교 첨단소재공학부)
  • Published : 2009.09.30
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Abstract

In this study, TiCrN films were deposited on STS 316 Land Si (100) wafer by inductively coupled plasma (ICP) assisted D.C. magnetron sputtering. The effect R.F. power for ICP discharge on the mechanical properties of TiCrN films was investigated. XRD, XPS and FE-SEM were used for the structure analysis. Also the Micro-Knoop hardness tester and profilometer were used for measuring hardness of coatings and film stress respectively. As increasing the R.F. power for ICP discharge, thickness of coating was decreased from 1633 nm to 1288 nm but hardness was increased about $Hk_{5g}$ 4200 at 400 W. All of the XRD patterns showed (111), (200) and (220) peaks of TiCrN films. Surface morphology was studied using the profilometer. FE-SEM was used to know morphology and cross-section of the films. Structure of the films was changed dense as increased ICP power.

Keywords

References

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