• Title/Summary/Keyword: source resistance

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Accurate Non-Quasi-Static Gate-Source Impedance Model of RF MOSFETs

  • Lee, Hyun-Jun;Lee, Seonghearn
    • JSTS:Journal of Semiconductor Technology and Science
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    • v.13 no.6
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    • pp.569-575
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    • 2013
  • An improved non-quasi-static gate-source impedance model including a parallel RC block for short-channel MOSFETs is developed to simulate RF MOSFET input characteristics accurately in the wide range of high frequency. The non-quasi-static model parameters are accurately determined using the physical input equivalent circuit. This improved model results in much better agreements between the measured and modelled input impedance than a simple one with a non-quasi-static resistance up to 40GHz, verifying its accuracy.

A System on the Digital-Control Algorithm of a High-Speed PWM Power System for MRI System (고속 PWM을 이용한 MRI 용 전원의 디지털 제어 알고리즘에 관한 연구)

  • Heo, Hyun-Gu;Baek, Kwang-Ryul
    • Journal of Institute of Control, Robotics and Systems
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    • v.6 no.3
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    • pp.235-240
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    • 2000
  • In this paper a digital-control algorithm of a power system suing a high-speed PWM for a MRI system is proposed. The MRI system requires an elaborate ladder-shaped current source. And the load of current source is the inductance with resistance. For the inductive load a voltage output of the power system has hi호 frequency components. Therefore this system requires high-speed PWM above 80KHz, A high speed PWM control algorithm which satisfies those conditions is designed. Finally the performance of proposed control algorithm is shown by simulation.

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Current Saturation Improvement of Poly-Si TFTs for Analog Circuit Integration

  • Nam, Woo-Jin;Han, Sang-Myeon;Lee, Hye-Jin;Han, Min-Koo
    • 한국정보디스플레이학회:학술대회논문집
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    • 2005.07a
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    • pp.289-292
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    • 2005
  • New poly-Si TFTs have been proposed and fabricated in order to increases the output channel resistance ($r_o$). The counter-doped($p^+$) source is tied to the $n^+$ source and is extended into the channel region so that it employs the reverse bias depletion in the channel. As $V_{DS}$ is increased, the depletion width is increased and the effective channel width is reduced. Therefore, the output current saturates well and the $r_o$ is increased successfully. The proposed CMOS devices may improve the amplifier gain of data driver in active-matrix displays

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Fully Cu-based Gate and Source/Drain Interconnections for Ultrahigh-Definition LCDs

  • Kugimiya, Toshihiro;Goto, Hiroshi;Hino, Aya;Nakai, Junichi;Yoneda, Yoichiro;Kusumoto, Eisuke
    • 한국정보디스플레이학회:학술대회논문집
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    • 2009.10a
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    • pp.1193-1196
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    • 2009
  • Low resistivity interconnection and high-mobility channel are required to realize ultrahigh-definition LCDs such as 4k ${\times}$ 2k TVs. We evaluated fully Cu-based gate and Source/Drain interconnections, consisting of stacked pure-Cu/Cu-Mn layers for TFT-LCDs, and found the underlying Cu-Mn alloy film has superior adhesion to glass substrates and CVD-SiOx films. It was also confirmed that wet etching of the Cu/Cu-Mn films without residues and low contact resistance with both channel IGZO and pixel ITO films can be obtained. It is thus considered that the stacked Cu/Cu-Mn structure is one of candidates to replacing conventionally pure-Cu/refractory metal.

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A Method for Real Time Monitoring of Oxide Thickness in Plasma Electrolytic Oxidation of Titanium

  • Yoo, Kwon-Jong;Lee, Yong-K.;Lee, Kang-Soo
    • Corrosion Science and Technology
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    • v.9 no.1
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    • pp.8-11
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    • 2010
  • During PEO (plasma-electrolytic-oxidation) treatment of titanium, the relationship between the thickness of oxide film and the measured electrical information was investigated. A simple real time monitoring method based on the electrical information being gathered during PEO treatment is proposed. The proposed method utilizes the current flowing from a high frequency voltage source to calculate the resistance of an oxide film, which is converted into the thickness of an oxide film. This monitoring method can be implemented in PEO system in which an oxide film is grown by constant or pulsed voltage/current sources.

C-V Characteristics of Cobalt Polycide Gate formed by the SADS(Silicide As Diffusion Source) Method (SADS(Siliide As Diffusion Source)법으로 형성한 코발트 폴리사이트 게이트의 C-V특성)

  • 정연실;배규식
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.13 no.7
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    • pp.557-562
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    • 2000
  • 160nm thick amorphous Si and polycrystalline Si were each deposited on to 10nm thick SiO$_2$, Co monolayer and Co/Ti bilayer were sequentially evaporated to form Co-polycide. Then MOS capacitors were fabricated by BF$_2$ ion-implantation. The characteristics of the fabricated capacitor samples depending upon the drive-in annel conductions were measured to study the effects of thermal stability of CoSi$_2$and dopant redistribution on electrical properties of Co-polycide gates. Results for capacitors using Co/Ti bilayer and drive-in annealed at 80$0^{\circ}C$ for 20~40sec. showed excellent C-V characteristics of gate electrode.

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Reverse annealing of boron doped polycrystalline silicon

  • Hong, Won-Eui;Ro, Jae-Sang
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.02a
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    • pp.140-140
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    • 2010
  • Non-mass analyzed ion shower doping (ISD) technique with a bucket-type ion source or mass-analyzed ion implantation with a ribbon beam-type has been used for source/drain doping, for LDD (lightly-doped-drain) formation, and for channel doping in fabrication of low-temperature poly-Si thin-film transistors (LTPS-TFT's). We reported an abnormal activation behavior in boron doped poly-Si where reverse annealing, the loss of electrically active boron concentration, was found in the temperature ranges between $400^{\circ}C$ and $650^{\circ}C$ using isochronal furnace annealing. We also reported reverse annealing behavior of sequential lateral solidification (SLS) poly-Si using isothermal rapid thermal annealing (RTA). We report here the importance of implantation conditions on the dopant activation. Through-doping conditions with higher energies and doses were intentionally chosen to understand reverse annealing behavior. We observed that the implantation condition plays a critical role on dopant activation. We found a certain implantation condition with which the sheet resistance is not changed at all upon activation annealing.

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Codeposition of Al and Cr by pack cementation (팩 세멘테이션에 의한 Al 및 Cr의 동시 코팅)

  • Sohn, Hee-Sik;Lee, Yoon-Je;Kim, Moon-Il
    • Journal of the Korean Society for Heat Treatment
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    • v.8 no.2
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    • pp.127-136
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    • 1995
  • The simultaneous addition of Al and Cr to the surface of Ni-and Fe-base alloy provides enhanced resistance to oxidation and corrosion in high temperatures. However, because of the large differences in thermodynamic stabilities of the volatile halides of Al and Cr, the codeposition of Al and Cr by halideactivated pack cementation is only possible for very specific, limited combinations of conditions. In this study, the experiments on the combinations of various metallic source powders and activators were conducted in order to obtain codeposition layers of Al and Cr on Ni with adequate composition by pack cementation. When Cr-Al masteralloy was used as a source powder, it was not easy to control Al and Cr content sensitively in the coating layers. On the other hand, when pure Cr and Al powder was used, ${\beta}$-NiAl layer containing about 20wt % Cr was obtained.

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Fire simulation by HRRPUA method for composite material body structure train coach (표면열복사율을 이용한 복합차체 철도차량 화재시뮬레이션)

  • Kim, Woo-Tae;Lee, Duck-Hee;Jung, Woo-Sung;Lee, Chang-Hyun;Woo, Mun-Chun
    • Proceedings of the KSR Conference
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    • 2008.11b
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    • pp.596-601
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    • 2008
  • Larger amount of composite materials are used for light train. These days even the body structure of the coach was made by composite materials. In this study, we made the fire simulation with FDS by HRRPUA method for the passenger coach of carbon-epoxy composite material body structure. For the body structure fire resistance verification, 1.8 liters of gasoline were selected for fire source. For the interior fire case, 4.0 liters of gasoline fire source was selected as Daegu fire accident case.

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Free Convective Heat Transfer in a Vertical Channel with Heat Source at the Wall (벽에서 열원이 있는 수직채널안의 자연대류열전달)

  • Pak, Hi-Yong;Doo, Min-Soo
    • The Magazine of the Society of Air-Conditioning and Refrigerating Engineers of Korea
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    • v.14 no.2
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    • pp.108-117
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    • 1985
  • In this study, a numerical analysis was performed for the natural convection heat transfer in a vertical channel which was consisted of two finite-thickness vertical walls with heat source. The ratio of the thermal conductivity of wall to air played an important role in the analysis. The case for which one side wall has protrusion resistances was also examined. The governing equations for the system was discretized by control volume formulation and solved by SIMPLE method. As the result of this study, it was found that the uniform heat flux boundary condition could be applied when the conductivity ratio was below approximately 50 and the uniform temperature boundary condition could be used when the conductivity rat io was over approximately 15,000. However, when the conductivity ratio was between 50 and 15,000, the thermal conductivity ratio value should be considered for the analysis. It was also found that the existence of protrusion resistance influenced the thermal field up to the distance of 3-4 times of the protrusion length.

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