• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
• /
• 2003.11a
• /
• pp.163-166
• /
• 2003

The electrothermal simulation of high voltage LIGBT(Lateral Insulated Gate Bipolar Transistor) in thin Silicon on insulator (SOI) and Silicon on sapphire (SOS) for thermal conductivity and sink is performed by means of MEDICI. The finite element simulations demonstrate that the thermal conductivity of the buried oxide is an important parameter for the modeling of the thermal behavior of silicon-on-insulator (SOI) devices. In this paper, using for SOI LIGBT, we simulated electrothermal for device that insulator layer with $SiO_2\;and\;Al_2O_3$ at before and after latch up to measured the thermal conductivity and temperature distribution of whole device and verified that SOI LIGBT with $Al_2O_3$ insulator had good thermal conductivity and reliability

• Proceedings of the Optical Society of Korea Conference
• /
• 2000.08a
• /
• pp.246-247
• /
• 2000

Yb$^{3+}$ 이온은 InGaAs LD 및 Ti:sapphire 레이저로 펌핑할 수 있는 940 nm에서의 흡수대를 가지고 있고, 1.03 $mu extrm{m}$의 형광방출 특성을 가지고 있으며, 지금까지 알려진 1 $\mu\textrm{m}$ 파장대의 레이저 활성이온 중에서 가장 적게 열을 발생하는 특성을 가지고 있음이 알려져 최근에는 Yb$^{3+}$ 이온을 첨가한 여러 가지 레이저 매질이 연구되고 있다.[1] 그 중에서도 Yb$^{3+}$ ion doped yttrium aluminum garnet (Yb:YAG) 단결정은 충분하게 넓은 흡수선폭, 좋은 열광학적 특성, 고출력 작동을 하게 하는 stokes shift, 그리고 LD에 의한 펌핑을 가능하게 하는 940 nm 영역에서의 흡수 및 긴 여기시간을 가진 이상적인 매질로 알려져 있다.[2] 이러한 특성으로 인해 Yb:YAG 단결정은 femtosecond 레이저 등 각종 레이저 시스템의 소형화[3]를 가져왔으며, 레이저 결정의 양산 가능성 및 레이저 기기의 소형화에 따르는 시스템의 가격 감소가 가능하므로 Yb:YAG microchip 레이저는 향후 고출력 레이저 기기 산업의 중추가 될 것으로 기대된다. (중략)

• Journal of Korean Vacuum Science & Technology
• /
• v.4 no.3
• /
• pp.63-67
• /
• 2000

We have studied the photoluminescence properties of undoped epitaxial layers of GaN on sapphire substrate grown by horizontal low pressure metal organic chemical vapor deposition method in the temperature range of 9-300 K. At 9 K the spectra are dominated by the well resolved interband free excitons A and B as well as bound excitons. Temperature dependence of free exciton transitions was studied and Varshni's coefficients for the temperature variation of bandgap were determined.

• Proceedings of the Korean Vacuum Society Conference
• /
• 2013.08a
• /
• pp.291.2-291.2
• /
• 2013

Growth behavior of b-Ga2O3 nanowires (NWs) on sapphire(0001) substrates during radio-frequency magnetron sputtering is reported. Upon fabrication, flat thin films grew initially, subsequent to which, NW bundles were formed on the surface of thin film with increasing film thickness. This transition of the growth mode occurred only at temperatures greater than ${\sim}450^{\circ}C$. The b-Ga2O3 NWs were grown through the self-catalytic vapor-liquid-solid mechanism with self-assembled Ga seeds. Secondary growth of NWs, which occurred from the sides of primary NWs resulting in branched NW structures, was also observed. Finally, the room temperature photoluminescence properties of as-grown and annealed b-Ga2O3 NW samples were investigated.

• Proceedings of the Materials Research Society of Korea Conference
• /
• 1998.08a
• /
• pp.86.2-86
• /
• 1998

• Proceedings of the Korean Society of Laser Processing Conference
• /
• 2004.10a
• /
• pp.50-61
• /
• 2004

Nowadays Laser Controllable Thermo-cleaving is the most promising method of cutting FPD(Flat Panel Display) glass in mass-production line. And this method can be used to cut other brittle materials such as quartz, sapphire, ceramic and semiconductor. The concept of this method is shown in Picture 1. Laser beam heats glass up to strain point not to melting point and cooling system chills glass to make maximum thermal stress in glass and then the thermal stress generates micro thermal crack in other words blind crack. Laser Controllable Thermo-cleaving controls the thermal stress to optimize the blind crack up to level of mass-production line.

• Proceedings of the Optical Society of Korea Conference
• /
• 2003.07a
• /
• pp.62-62
• /
• 2003

Charged particles can be accelerated to relativistic high energies by high power (＞ terawatt) laser beams. We have a research project on laser and plasma-based advanced accelerators in Center for Advanced Accelerators at Korea Electrotechnology Research Institute (KERI), in which the 2 TW (1.4 J／700 fs) Ti：sapphire／Nd：glass hybrid laser system and a He plasma will be used for particle acceleration experiments. In this presentation, we introduce the ongoing research activities and the planned experiments at KERI.

• Proceedings of the Materials Research Society of Korea Conference
• /
• 2003.03a
• /
• pp.109-109
• /
• 2003

III- V ferromagnetic semiconductor has attracted great attention as a potential application for spintronics due to a successful demonstration of spin injection from ferromagnetic GaNnAs into semiconductor. GaMnN may be one of the possible candidates for room temperature operation. Samples were grown on sapphire (0001) substrate at $650^{\circ}C$ via molecular beam epitaxy with a single Precursor of (Et$_2$Ga(N$_3$)NH$_2$$CH_3$) and solid source of Mn at different Mn source temperature. The background pressure is low 10$^{-10}$ Torr and the samples growth pressure was 1.4 $\times$ 10$^{-6}$ Torr.

• Journal of the Institute of Electronics Engineers of Korea TC
• /
• v.45 no.10
• /
• pp.65-70
• /
• 2008

We design and fabricate the 94 GHz Coplanar waveguide(CPW)-to-rectangular waveguide transition that is transmits signal smoothly between the CPW, which is a popular transmission line of the planar circuits, and rectangular waveguide for the 94 GHz transceiver system. The proposed transition composed of the unilateral fin-line taper and open type CPW-to-slot-line transition is based on the hard and inflexible sapphire for the flip-chip bonding of the planar MMICs using conventional MMIC technology. We optimize a single section transition to achieve low loss by using an EM field solver of Ansoft's HFSS and fabricate the back- to-back transition that is measured by Anritsu ME7808A Vector Network Analyzer in a frequency range of $85{\sim}105$ GHz. From the measurement and do-embedding CPW with 3 mm length, an insertion and return loss of a single-section transition are 1.7 dB and more an 25 than at 94 GHz, respectively.

• Journal of the Korean Crystal Growth and Crystal Technology
• /
• v.17 no.1
• /
• pp.1-5
• /
• 2007

The structural and morphological properties of planar, nonpolar (11-20) a-plane GaN layers grown by hydride vapor phase epitaxy on (1-102) r-plan sapphire substrates are characterized. We report on the effect of low temperature ($500/550/600/660^{\circ}C$) AIN buffer layers on the structural properties of HVPE grown a-GaN kayers. and for the comparison, low temperature GaN and InGaN buffer layers are also tried for the growth of a-plane GaN layers. The structural geometry of a-GaN layers is severely affected on the growth condition of low temperature buffer layers. The most planar a-GaN could be obtained with $GaCl_3$ pretreatment at the growth temperature of $820^{\circ}C$.