• Title/Summary/Keyword: rate dependent

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Optimal Preventive Replacement under Periodic Inspections for an Item in Preparedness (정기검사하에서 준비태세의 부품에 대한 최적예방교환)

  • Kong, Myung-Bock;Won, Young-Cheol
    • Journal of Korean Institute of Industrial Engineers
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    • v.22 no.4
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    • pp.651-662
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    • 1996
  • This paper concerns with preventive replacement under periodic inspections for an item (system) which is in a state of preparedness. The item is subject to wear. The item fails randomly but the failure rate depends on the accumulated wear. The item is preventively replaced if it survives a certain wear limit at periodic inspections. The foiled item is, however, replaced at periodic inspections. Given the costs for replacements and inspections, and the penalty cost of the time elapsed between failure und its detection, the optimal wear limit according to the long-run expected cost per unit time criterion is derived. It has been proved that the optimal wear limit is unique if an item has increasing weer-dependent failure rate. A numerical example for a stationary gamma wear process with Weibull distributed failure is given to show its applicability.

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Etch characteristics of ITO(Indium Tin Oxide)using ${SF_6}/{O_2}$-gas ECR(Electron Cyclotron Resonance) plasmas (ECR을 이용한 ${SF_6}/{O_2}$ 가스 플라즈마에 의한 ITO의 식각 특성연구)

  • 권광호;강승열;김곤호;염근영
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.13 no.7
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    • pp.563-567
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    • 2000
  • We presented the etch results of indium-tin oxide thin films by using SF$_{6}$/O$_2$gas electron cyclotron resonance plasma and conducted X-ray phtoelectron spectroscopy and quadrupole mass spectrometer analyses for the etch characteristics. The etch rate of the films was greatly dependent on that of oxygen which was the major constituent element of the films. The oxygen was removed by the forms like $O_2$or SOF$_2$. We examined the ratio of atomic content of O and In and the change of this ratio was related to the removal rate of InF$_{x}$ and the S-metal bonding.ing.

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Relationship between Substituents of Aminoazobenzene Disperse Dyes and Dyeing Properties (아미노아조벤젠계 분산염료의 치환기와 염색성과의 관계)

  • Kim, Sung Dong;Kwak, Tae Soo;Lee, In Yeol
    • Textile Coloration and Finishing
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    • v.9 no.6
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    • pp.1-9
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    • 1997
  • Four aminoazobenzene disperse dyes derived from different N-ethyl-N-substitutedalkylanilines and 2-chloro-4-nitroaniline, were synthesized and their chemical structure were analyzed by 500 MHz NMR spectroscopy. The wavelength of maximum absorption of the synthesized dyes, which was dependent on the electron withdrawing ability of the substituent, was in the range of 499.5~526.0nm. As terminal substituent became polar, the dyeing rate of disperse dye increased, and the exhaustion rate of dyes having cyano or hydroxy group became lower, that of the dye having acetoxy group higher. The wash fastness of polyester fabric dyed with disperse dyes possessing the polar group improved probably due to the increased dye-fiber interaction.

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Video Watermarking Algorithm using the Frame-dependent Key (프레임에 기반한 키를 이용한 동영상 워터마킹)

  • 안일영;박성한
    • Journal of Broadcast Engineering
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    • v.8 no.4
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    • pp.501-504
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    • 2003
  • In this out watermarking method, a key is determined by quantizing the maximum motion difference between frames. We have a problem the key value for embedding and detection are different in 1 to 3% frames of all frames. This problem can be easily solved by using a new key according to bit error rate of the extracted watermark. Since the watermark is embedded in each frame nth different keys and detected In all the frames, out method is resistant against attacks such as the frame averaging and frame drop.

High Temperature Erosion Properties of Silicon Nitride Fabricated by GPS and HP Method (GPS와 HP법으로 제조된 질화규소의 고온 Erosion 특성)

  • 최현주;안정욱;임대순;박동수
    • Proceedings of the Korean Society of Tribologists and Lubrication Engineers Conference
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    • 2000.11a
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    • pp.304-309
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    • 2000
  • Si$_3$N$_4$-6wt%Y$_2$O$_3$-lwt%Al$_2$O$_3$was prepared by hot pressed and gas pressure sintering to investigate the effect of microstructure on erosion behaviors. Hardness and fracture toughness were measured with prepared specimens to study the high temperature erosion properties. A gas blast type erosion tester was used In examine erosion behavior of the specimens up to 700$^{\circ}C$. In case of GPS silicon nitride, the erosion rate increases up to 500$^{\circ}C$ and decreases over 500$^{\circ}C$. Maximum erosion rate was observed at 300$^{\circ}C$ for HP silicon nitride. The principal factors affecting the high temperature erosive wear of brittle materials are largely dependent on high temperature properties of grain boundaries.

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Quantitative Analysis of Mechano-luminescence and Its Mechanism in SAO (SAO 압광 소재의 발광 현상 및 그 기구에 대한 정량적 해석)

  • Timilsina, S.;Lee, C.J.;Jang, I.Y.;Kim, J.S.
    • Transactions of Materials Processing
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    • v.21 no.4
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    • pp.246-251
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    • 2012
  • The mechanism for mechano-luminescence(ML) in SAO phosphor was investigated quantitatively by measuring the emission intensity under three different tensile conditions. It was found that the ML of SAO was strongly dependent on the dynamic loading rate rather than by the applied load itself. The mechano-luminescent emission in SAO was evaluated based on the trap-releasing process. It was found that the shape of the ML curve in the transient regime obtained from the rate equation has good agreement with the experimental data.

Theoretical Investigation of the Vibrational Relaxation of NO(${\upsilon}=1-7$) in Collisions with $O_{2}\;and\;N_{2}$

  • Jongbaik Ree
    • Bulletin of the Korean Chemical Society
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    • v.14 no.1
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    • pp.47-52
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    • 1993
  • The vibrational relaxation rate constants of NO(v = 1-7) by $O_2\;and\;N_2$ have been calculated in the temperature range of 300-1000 K using the solution of the time-dependent Schrodinger equation. The calculated relaxation rate constants by $O_2$ increase monotonically with the vibrational energy level v, which is compatible with the experimental data, while those by $N_2$ are nearly independent of v in the range of $3.40 {\pm}1.60{\times}10_{-16} cm^3$/molecule-sec at 300 K. Those for NO(v) + $N_2$ are about 2-3 orders of magnitude smaller than those for NO(v) + $O_2$, because the latter is an exothermic processes while the former an endothermic. Relaxation processes can be interpreted by single-quantum V-V transition. The contributions of V-T/R transition and double-quantum V-V transition to the relaxation are negligible over the entire temperature range.

Regeneration of Spent Carbon by a Novel Oxidative Thermal Process

  • 류건상;Shybender Kapila
    • Bulletin of the Korean Chemical Society
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    • v.18 no.8
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    • pp.811-814
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    • 1997
  • An oxidative thermal regeneration process was developed and evaluated for its potential applicability in several environmental areas. The feasibility of the process is affected strongly by the gradual carbon loss, energy consumption, physical changes of carbon, and effective destruction efficiency of adsorbed materials during the regeneration. The aim of the study is to determine the optimum conditions to maintain acceptable destruction efficiency for adsorbed organics, controlling oxidant flow rate. Prior to its applications, various preliminary tests were carried out to determine the effects of experimental parameters on the process. The tests performed were reaction temperature, carbon loss, surface area, surface structure, and adsorptive property. The results of these tests show that the parameters are dependent on oxidant flow rate, and suggest that the process is comparable and, in some ways, possibly superior to conventional regeneration techniques because the oxidative process is a single step and less energy intensive.

Application of a Membrane Desolvator to the Analysis of Organic Solvents in Inductively Coupled Plasma Atomic Emission Spectrometry

  • Lee, J. S.;Lim, H. B.
    • Bulletin of the Korean Chemical Society
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    • v.20 no.9
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    • pp.1040-1044
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    • 1999
  • A micro porous PTFE membrane desolvator (MMD) was built and evaluated for the on-line removal of organic solvents to facilitate the determination of trace metal contaminants in the solvents by ICP-AES. Three organic solvents, isopropyl alcohol (IPA), methanol, and dimethy sulfoxide (DMSO) were studied. The MMD reduced organic solvent concentration in the sample aerosol stream by 82% to 89%, as indicated by monitoring C(I) emission. Net signal intensity of Fe, Al, and Cu was increasing with higher organic solvent concentration, with the rate of increase being solvent dependent. The signal intensities for Mg and Pb followed the trend with the C(I) signal. Changing the sweep gas flow rate affected the optimum signal intensity. Wine samples were analyzed by the method of standard addition. The concentrations of B, Al, and Mg were determined with a relative precision of less than 2.3%.

2-Hydroxyacetophenone-aroyl Hydrazone Derivatives as Corrosion Inhibitors for Copper Dissolution in Nitric Acid Solution

  • A. S. Fouda;M. M. Gouda;S. I. Abd El-Rahman
    • Bulletin of the Korean Chemical Society
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    • v.21 no.11
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    • pp.1085-1089
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    • 2000
  • The effect of 2-hydroxyacetophenone-aroyl hydrazone derivatives on the inhibition of copper corrosion in 3N nitric acid solution at 303 K was investigated by galvanostatic polarization and thermometric techniques. A significant decrease in the cor rosion rate of copper was observed in the presence of the investigated compounds. The corrosion rate was found to depend on the nature and concentrations of the inhibitors. The degree of surface coverage of the adsorbed inhibitors is determined from polarization measurements, and it was found that the results obey the Frumkin adsorption isotherm. The inhibitors acted as mixed-type inhibitors, but the cathode is more polarized. The relative inhibitive efficiency of these compounds has been explained on the basis of structure dependent electron donor properties of the inhibitors and the nature of the metal-inhibitor interaction at the surface. Also, some thermodynamic data for the adsorption process ( ΔGa* and f ) are calculated and discussed.