• Journal of information and communication convergence engineering
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• v.21 no.1
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• pp.82-89
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• 2023

Various machine-learning models may yield high predictive power for massive time series for time series prediction. However, these models are prone to instability in terms of computational cost because of the high dimensionality of the feature space and nonoptimized hyperparameter settings. Considering the potential risk that model training with a high-dimensional feature set can be time-consuming, we evaluate a feature-importance-based feature selection method to derive a tradeoff between predictive power and computational cost for time series prediction. We used two machine learning techniques for performance evaluation to generate prediction models from a retail sales dataset. First, we ranked the features using impurity- and Local Interpretable Model-agnostic Explanations (LIME) -based feature importance measures in the prediction models. Then, the recursive feature elimination method was applied to eliminate unimportant features sequentially. Consequently, we obtained a subset of features that could lead to reduced model training time while preserving acceptable model performance.

• Nuclear Engineering and Technology
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• v.55 no.4
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• pp.1210-1217
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• 2023

The assessment of radiation fields in the lithium loop pipes and dump tank during the operation were performed for International Fusion Materials Irradiation Facility - DEMO-Oriented NEutron Source (IFMIF-DONES) in order to obtain the radiation dose-rate maps in the component surroundings. Variance reduction techniques such as weight window mesh (produced with the ADVANTG code) were applied to bring the statistical uncertainty down to a reasonable level. The biological dose was given in the study, and potential shielding optimization is suggested and more thoroughly evaluated. The MCNP Monte Carlo was used to simulate a gamma particle transport for radiation shielding purposes for the current Li Systems' design. In addition, the shielding efficiency was identified for the Impurity Control System components and the dump tank. The analysis reported in this paper takes into account the radiation decay source from and activated corrosion products (ACPs), which is created by d-Li interaction. As a consequence, the radiation (resulting from ACPs and Be-7) shielding calculations have been carried out for safety considerations.

• Journal of the Korean Magnetic Resonance Society
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• v.27 no.4
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• pp.28-34
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• 2023

We study the linear-nonlinear quantum transport theory of Wannier-Landau transition system in the confinement of electrons by a square well confinement potential. We use the projected Liouville equation method with the ensemble density projection technique. We select the dynamic value under a linearly oscillatory external field. We derive the dynamic value formula and the memory factor functions in three electron phonon coupling systems and electron impurity coupling systems of two transition types, the intra-band transitions and inter-band transitions. We obtain results that can be applied directly to numerical analyses. For simple example of application, we analyze the absorption power and line-widths of ZnO, through the numerical calculation of the theoretical result in the Landau system.

• JSTS:Journal of Semiconductor Technology and Science
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• v.7 no.3
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• pp.196-208
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• 2007

An analytical model is proposed for an optically controlled Metal Semiconductor Field Effect Transistor (MESFET), known as Optical Field Effect Transistor (OPFET) considering the diffusion fabrication process. The electrical parameters such as threshold voltage, drain-source current, gate capacitances and switching response have been determined for the dark and various illuminated conditions. The Photovoltaic effect due to photogenerated carriers under illumination is shown to modulate the channel cross-section, which in turn significantly changes the threshold voltage, drainsource current, the gate capacitances and the device switching speed. The threshold voltage $V_T$ is reduced under optical illumination condition, which leads the device to change the device property from enhancement mode to depletion mode depending on photon impurity flux density. The resulting I-V characteristics show that the drain-source current IDS for different gate-source voltage $V_{gs}$ is significantly increased with optical illumination for photon flux densities of ${\Phi}=10^{15}\;and\;10^{17}/cm^2s$ compared to the dark condition. Further more, the drain-source current as a function of drain-source voltage $V_{DS}$ is evaluated to find the I-V characteristics for various pinch-off voltages $V_P$ for optimization of impurity flux density $Q_{Diff}$ by diffusion process. The resulting I-V characteristics also show that the diffusion process introduces less process-induced damage compared to ion implantation, which suffers from current reduction due to a large number of defects introduced by the ion implantation process. Further the results show significant increase in gate-source capacitance $C_{gs}$ and gate-drain capacitance $C_{gd}$ for optical illuminations, where the photo-induced voltage has a significant role on gate capacitances. The switching time ${\tau}$ of the OPFET device is computed for dark and illumination conditions. The switching time ${\tau}$ is greatly reduced by optical illumination and is also a function of device active layer thickness and corresponding impurity flux density $Q_{Diff}$. Thus it is shown that the diffusion process shows great potential for improvement of optoelectronic devices in quantum efficiency and other performance areas.

• Journal of the Korean Ceramic Society
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• v.49 no.4
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• pp.380-384
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• 2012

This paper deals with the recent developments of high thermal conductivity silicon nitride ceramics. First, the factors that reduce the thermal conductivity of silicon nitride are clarified and the potential approaches to realize high thermal conductivity are described. Then, the recent achievements on the silicon nitride fabricated through the reaction bonding and post sintering technique are presented. Because of a smaller amount of impurity oxygen, the obtained thermal conductivity is substantially higher, compared to that of the conventional gas-pressure sintered silicon nitride, while the microstructures and bending strengths are similar to each other between these two samples. Moreover, further improvement of the thermal conductivity is possible by increasing ${\beta}/{\alpha}$ phase ratio of the nitrided sample, resulting in a very high thermal conductivity of 177 W/($m{\cdot}K$) as well as a high fracture toughness of 11.2 $MPa{\cdot}m^{1/2}$.

• Proceedings of the Korean Vacuum Society Conference
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• 2012.02a
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• pp.561-561
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• 2012

Graphene, two dimensional single layer of carbon atoms, has tremendous attention due to its superior property such as fast electron mobility, high thermal conductivity and optical transparency, and also found many applications such as field-effect transistors (FET), energy storage and conversion, optoelectronic device, electromechanical resonators and chemical sensors. Several techniques have been developed to form the graphene. Especially chemical vapor deposition (CVD) is a promising process for the large area graphene. For the electrically isolated devices, the graphene should be transfer to insulated substrate from Cu or Ni. However, transferred graphene has serious drawback due to remaining polymeric residue during transfer process which induces the poor device characteristics by impurity scattering and it interrupts the surface functionalization for the sensor application. In this study, we demonstrate the characteristics of solution-gated FET depending on the removal of polymeric residues. The solution-gated FET is operated by the modulation of the channel conductance by applying a gate potential from a reference electrode via the electrolyte, and it can be used as a chemical sensor. The removal process was achieved by several solvents during the transfer of CVD graphene from a copper foil to a substrate and additional annealing process with H2/Ar environments was carried out. We compare the properties of graphene by Raman spectroscopy, atomic force microscopy(AFM), and X-ray Photoelectron Spectroscopy (XPS) measurements. Effects of residual polymeric materials on the device performance of graphene FET will be discussed in detail.

• Journal of the Korea Academia-Industrial cooperation Society
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• v.7 no.1
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• pp.7-11
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• 2006

Through SCM modeling, we found that the depletion layer in silicon was of a form of a spherical capacitor with the SCM tip biased. Two-dimensional (2D) finite differential method code with a successive over relaxation (SOR) solver has been developed to model the measurements by SCM of a semiconductor wafer that contains an ion-implanted impurity region. Then, we theoretically analyzed the spherical capacitor and determined the total depleted-volume charge Q, capacitance C, and the rate of capacitance change with bias dC/dV. It is very important to observe the depleted carriers' movement in the silicon layer by applying the bias to the tip. So, we calculated the depleted-volume charge, considering different factors such as tip size, oxide thickness, and applied bias (dc+ac), which have an influence on potential and depletion charges.

• Proceedings of the Korean Vacuum Society Conference
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• 2013.08a
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• pp.76.1-76.1
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• 2013

Atomic Layer Deposition (ALD) has remarkably developed in semiconductor and nano-structure applications since early 1990. Now, the advantages of ALD process are well-known as controlling atomic-level-thickness, manipulating atomic-level-composition control, and depositing impurity-free films uniformly. These unique properties may accelerate ALD related industries and applications in various functional thin film markets. On the other hand, one of big markets, Display industry, just starts to look at the potential to adopt ALD functional films in emerging display applications, such as transparent and flexible displays. Unlike conventional ALD process strategies (good quality films and stable precursors at high deposition processes), recently major display industries have suggested the following requirements: large area equipment, reasonable throughput, low temperature process, and cost-effective functional precursors. In this talk, it will be mentioned some demands of display industries for applying ALD processes and/or functional films, in terms of emerging display technologies. In fact, the AMOLED (active matrix organic light emitting diode) Television markets are just starting at early 2013. There are a few possibilities and needs to be developing for AMOLED, Flexible and transparent Display markets. Moreover, some basic results will be shown to specify ALD display applications, including transparent conduction oxide, oxide semiconductor, passivation and barrier films.

• Nuclear Engineering and Technology
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• v.54 no.5
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• pp.1560-1569
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• 2022

Liquid fueled molten salt reactors (MSRs) have seen renewed interest because of their inherent safety features, higher thermal efficiency and potential for efficient thorium utilisation for power generation. Thorium fluoride is one of the salts used in liquid fueled MSRs employing Th-U cycle. In the present study, ThF₄ was prepared by hydro-fluorination of ThO₂ using anhydrous HF gas. Process parameters viz. bed depth, hydrofluorination time and hydrofluorination temperature, were optimized for the preparation of ThF₄ in a static bed reactor setup. The products were characterized with X-Ray diffraction and experimental conditions for complete conversion to ThF₄ were established which also corroborated with the yield values. Hydrofluorination of ThO₂ at 450 ℃ for half an hour at a bed depth of 6 mm gave the best result, with a yield of about 99.36% ThF₄. No unconverted oxide or any other impurity was observed. Rietveld refinement was performed on the XRD data of this ThF₄, and Chi2 value of 3.54 indicated good agreement between observed and calculated profiles.

• Journal of the Korea Institute of Information and Communication Engineering
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• v.18 no.8
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• pp.1925-1930
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• 2014

This paper has analyzed the relation of conduction path and subthreshold swing for doping profile in channel of asymmetric double gate(DG) MOSFET. Since the channel size of asymmetric DGMOSFET is greatly small and number of impurity is few, the high doping channel is analyzed. The analytical potential distribution is derived from Possion's equation, and Gaussian distribution function is used as doping profile. The conduction path and subthreshold swing are derived from this analytical potential distribution, and those are investigated for variables of doping profile, projected range and standard projected deviation, according to the change of channel length and thickness. As a result, subthreshold swing is reduced when conduction path is approaching to top gate, and that is increased with a decrease of channel length and a increase of channel thickness due to short channel effects.