• 제목/요약/키워드: poly-crystallization

검색결과 321건 처리시간 0.028초

Al 박막을 이용한 다결정 Si 박막의 제조에서 기판온도 영향 연구 (Effect of Substrate Temperature on Polycrystalline Silicon Film Deposited on Al Layer)

  • 안경민;강승모;안병태
    • 한국신재생에너지학회:학술대회논문집
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    • 한국신재생에너지학회 2010년도 춘계학술대회 초록집
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    • pp.96.2-96.2
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    • 2010
  • The surface morphology and structural properties of polycrystalline silicon (poly-Si) films made in-situ aluminum induced crystallization at various substrate temperature (300~600) was investigated. Silicon films were deposited by hot-wire chemical vapor deposition (HWCVD), as the catalytic or pyrolytic decomposition of precursor gases SiH4 occurs only on the surface of the heated wire. Aluminum films were deposited by DC magnetron sputtering at room temperature. continuous poly-Si films were achieved at low temperature. from cross-section TEM analyses, It was confirmed that poly-Si above $450^{\circ}C$ was successfully grown on and poly-Si films had (111) preferred orientation. As substrate temperature increases, Si(111)/Si(220) ratio was decreased. The electrical properties of poly-Si film were investigated by Hall effect measurement. Poly-Si film was p-type by Al and resistivity and hall effect mobility was affected by substrate temperature.

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임베다드 TFT 메모리 적용을 위한 결정화 방법에 따른 전기적 특성평가 (Electrical properties of poly-Si TFT by crystallization method for embedded TFT memory application)

  • 유희욱;조원주
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2010년도 하계학술대회 논문집
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    • pp.356-356
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    • 2010
  • In this paper, Poly silicon thin-film transistors (poly-Si TFTs) with employed the SPC (Solid phase crystallization) and ELA (Excimer laser annealing) methods on glass panel substrate are fabricated to investigate the electrical poperies. Poly-Si TFTs have recess-channel structure with formated source/drain regions by LPCVD n+ poly Si in low $650^{\circ}C$ temperature. the ELA-TFT show higher on/off current ratio and subthreshold swing than a-Si and SPC TFT that therefore, these results showed that the ELA-TFT might be beneficial for practical embedded TFT memory device application.

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플레티늄-실리사이드를 이용한 쇼트키 장벽 다결정 박막 트랜지스터 (Schottky Barrier Thin Film Transistor by using Platinum-silicided Source and Drain)

  • 신진욱;정홍배;이영희;조원주
    • 한국전기전자재료학회논문지
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    • 제22권6호
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    • pp.462-465
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    • 2009
  • Schottky barrier thin film transistors (SB-TFT) on polycrystalline silicon(poly-Si) are fabricated by platinum silicided source/drain for p-type SB-TFT. High quality poly-Si film were obtained by crystallizing the amorphous Si film with excimer laser annealing (ELA) or solid phase crystallization (SPC) method, The fabricated poly-Si SB-TFTs showed low leakage current level and a large on/off current ratio larger than 10), Significant improvement of electrical characteristics were obtained by the additional forming gas annealing in 2% $H_2/N_2$ ambient, which is attributed to the termination of dangling bond at the poly-Si grain boundaries as well as the reduction of interface trap states at gate oxide/poly-Si channel.

역 알루미늄 유도 결정화 공정을 이용한 실리콘 태양전지 다결정 시드층 생성 (Fabrication of Poly Seed Layer for Silicon Based Photovoltaics by Inversed Aluminum-Induced Crystallization)

  • 최승호;박찬수;김신호;김양도
    • 한국재료학회지
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    • 제22권4호
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    • pp.190-194
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    • 2012
  • The formation of high-quality polycrystalline silicon (poly-Si) on relatively low cost substrate has been an important issue in the development of thin film solar cells. Poly-Si seed layers were fabricated by an inverse aluminum-induced crystallization (I-AIC) process and the properties of the resulting layer were characterized. The I-AIC process has an advantage of being able to continue the epitaxial growth without an Al layer removing process. An amorphous Si precursor layer was deposited on Corning glass substrates by RF magnetron sputtering system with Ar plasma. Then, Al thin film was deposited by thermal evaporation. An $SiO_2$ diffusion barrier layer was formed between Si and Al layers to control the surface orientation of seed layer. The crystallinity of the poly-Si seed layer was analyzed by Raman spectroscopy and x-ray diffraction (XRD). The grain size and orientation of the poly-Si seed layer were determined by electron back scattering diffraction (EBSD) method. The prepared poly-Si seed layer showed high volume fraction of crystalline Si and <100> orientation. The diffusion barrier layer and processing temperature significantly affected the grain size and orientation of the poly Si seed layer. The shorter oxidation time and lower processing temperature led to a better orientation of the poly-Si seed layer. This study presents the formation mechanism of a poly seed layer by inverse aluminum-induced crystallization.

Pd와 Ni의 혼합물을 촉매로 이용한 금속 유도 측면 결정화에 관한 연구 (A Study on Pd/Ni Mixed Metal Induced Lateral Crystallization)

  • 최성희;윤여건;주승기
    • 한국재료학회:학술대회논문집
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    • 한국재료학회 2003년도 추계학술발표강연 및 논문개요집
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    • pp.172-172
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    • 2003
  • It has been known that Pd-MILC shows much faster and lower temperature crystallization than Ni-MILC but it can not be put into practice due to the quality issue of thus fabricated poly crystals. In this study, addition of Pd into Ni-MILC has been attempted in order to take advantages of the Pd-MILC without sacrificing of the Ni-MILC TFTs. It turns out that when 5% of Pd has been added to Ni for MILC, MILC growth rate increases two - three times faster than pure Ni-MILC. The MILC growth rate shows monotonic increase with increase the amount of Pd in Ni up to 50%. Even when small amount of Pd was added to Ni like 5%, crystallization phenomenon already follows the way of Pd-MILC. The Poly-W thus fabricated shows lower leakage current than pure Ni-MILC TFT without losing any amount of on-current This fact is very important in low temperature poly-TFTs because MILC-TFTs, especially suffer from the relatively high leakage current

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Miscibility of TPU(PCL diol)/PCL Blend and its Effect on PCL Crystallinity

  • Ajili Shadi Hassan;Ebrahimi Nadereh Golshan
    • 한국고분자학회:학술대회논문집
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    • 한국고분자학회 2006년도 IUPAC International Symposium on Advanced Polymers for Emerging Technologies
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    • pp.371-372
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    • 2006
  • Poly(${\varepsilon}-caprolactone$) (PCL) is a highly crystalline polymer that is miscible with several amorphous polymers including chlorinated polyether, poly(vinylchloride), poly(hydroxyether) and Bisphenol A polycarbonate. The crystallization behavior of miscible blend of amorphous/crystalline polymers has widely been studied. Generally a depression of the crystallization ability has been found with addition of amorphous component because of the reduction of chain mobility, the change of free energy of nucleation as a result of a specific interaction, and so on [1]. In this work, for the first time, the blend of PCL and copolymer of polyurethane containing polycaprolactone as a soft segment is considered. The structural similarity of TPU soft segment with PCL affects on formation of the miscible component and crystallization behavior of PCL in the blend. This has been studied using differential scanning calorimetry (DSC) and Wide-angle X-ray Scattering (WAXS).

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Crystallization-induced Sequential Reordering in Poly (trimethylene to rephthalate)/Polycarbonate Blends

  • Bae, Woo-Jin;Jo, Won-Ho;Park, Yeun-Hum
    • Macromolecular Research
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    • 제10권3호
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    • pp.145-149
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    • 2002
  • Transesterification between poly(trimethylene terephthalate) (PTT) and bisphenol-A-polycarbonate (PC) is studied by differential scanning calorimetry (DSC) and nuclear magnetic resonance (NMR) spectroscopy. When the blend of PTT/PC is annealed at higher temperatures, the samples do not show any melting peak at an initial stage, indicating the samples completely lose their crystallinity due to the formation of random copolymers. However, when the random copolymer is annealed at temperatures lower than the melting temperature of PTT, a melting peak is observed, indicating that the random copolymers are sequentially reordered. The melting point and the heat of fusion of crystals formed from the crystallization-induced sequential reordering depend upon the annealing temperature and time. The average sequence length determined from NMR is increased as the blocks are regenerated.

Atmospheric Metal Doping System and Application for Poly-Si Backplane

  • Shin, D.H.;Lee, J.M.;Lee, S.K.;Kim, H.J.
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2007년도 7th International Meeting on Information Display 제7권1호
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    • pp.87-90
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    • 2007
  • VIATRON TECHNOLOGIES has developed an $\underline{A}$tmospheric $\underline{M}$etal $\underline{D}$oping (AMD) system which uniformly dopes metal species onto a substrate. The AMD system injects metal-organic vapor over substrate using an injection head with a scan motion. One of important application of this system is a metalinduced crystallization of amorphous Si for manufacturing AMOLED poly-Si panels. The AMD system with a use of Ni vapor source produces doping of trace amount of Ni onto amorphous Si, enabling uniform MIC crystallization. Also, the operation without vacuum condition offers advantages such as easy maintenance, low cost production, and large glass processes.

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Preparation and Properties of in situ Polymerized Poly(ethylene terephthalate)/Fumed Silica Nanocomposites

  • Hahm, Wan-Gyu;Myung, Hee-Soo;Im, Seung-Soon
    • Macromolecular Research
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    • 제12권1호
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    • pp.85-93
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    • 2004
  • We have prepared poly(ethylene terephthalate) (PET) nanocomposites filled with two different types of fumed silicas, hydrophilic (FS) and hydrophobic (MFS) silicas of 7-nm diameter, by in situ polymerization. We then investigated the morphological changes, rheological properties, crystallization behavior, and mechanical properties of the PET nanocomposites. Transmission electron microscopy (TEM) images indicate that the dispersibility of the fumed silica was improved effectively by in situ polymerization; in particular, MFS had better dispersibility than FS on the non-polar PET polymer. The crystallization behavior of the nanocomposites revealed a peculiar tendency: all the fillers acted as retarding agents for the crystallization of the PET nanocomposites. The incorporation of fumed silicas increased the intrinsic viscosities (IV) of the PET matrix, and the strong particleparticle interactions of the filler led to an increased melt viscosity. Additionally, the mechanical properties, toughness, and modules of the nano-composites all increased, even at low filler content.

AMFC system에서의 비정질 실리콘 박막의 결정화 특성 (Crystallization characteristics of the amorphous Si thin films in the AMFC system)

  • 강구현;이승재;김선호;이수경;남승의;김형준
    • 한국진공학회지
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    • 제14권1호
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    • pp.24-28
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    • 2005
  • a-Si을 poly-Si으로 결정화하는 전형적인 방법으로는 고상결정화(Solid Phase Crystallization, SPC)가 있다[1-3]. 고상결정화는 균일한 공정특성과 생산비가 저렴하다는 장점이 있으나, 고상결정화 공정에서 높은 공정온도와 긴 공정 시간은 유리 기판의 손상으로 인해 적용되기 어렵다. 본 논문에서는 고상결정화의 저온공정과 짧은 공정시간을 위해 교번자장결정화(Alternating Magnetic Field Crystallization, AMFC) 시스템 내에서 결정화하는 동안 교번자장(Alternating Magnetic Field)을 적용하는 새로운 방법을 소개한다. 고상결정화의 경우, 열처리 시간은 570℃에서 24시간이 소요되었으나, 교번자장결정화의 경우, 같은 온도에서 20분이 소요되었다.